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公开(公告)号:US20240365544A1
公开(公告)日:2024-10-31
申请号:US18473896
申请日:2023-09-25
发明人: Quanshan Lv , Jie Yuan , YaLi Song
摘要: Examples of the present application provide a three-dimensional memory and manufacturing method thereof, and a memory system. The three-dimensional memory comprises: a stack structure comprising alternating stacked gate layers and dielectric layers; a plurality of channel columns penetrating the stack structure in a first direction and comprising: a barrier layer, a storage layer, a tunneling layer, and a channel layer arranged in sequence; and a plurality of isolation structures located between the dielectric layers and the tunneling layer in a second direction perpendicular to the first direction; wherein the isolation structures penetrating at least a portion of the storage layer in the second direction.