公开(公告)号：US20060011080A1

公开(公告)日：2006-01-19

申请号：US11179628

申请日：2005-07-13

申请人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

发明人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

IPC分类号： B41F33/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

摘要： The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

摘要翻译： 本发明是提供一种电子束光刻方法和电子束光刻设备，尽管大气压力发生变化，但能够高精度地绘制图案，可以确保令人满意的生产量，并且便宜。 在使用电子束在样品上绘制图案的电子束光刻方法中，确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。 当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时，校准绘制精度。

公开(公告)号：US07342241B2

公开(公告)日：2008-03-11

申请号：US11179628

申请日：2005-07-13

申请人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

发明人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

IPC分类号： G21K5/04 ,  H01J33/00

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

摘要： The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

摘要翻译： 本发明是提供一种电子束光刻方法和电子束光刻设备，尽管大气压力发生变化，但能够高精度地绘制图案，可以确保令人满意的生产量，并且便宜。 在使用电子束在样品上绘制图案的电子束光刻方法中，确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。 当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时，校准绘制精度。

公开(公告)号：US5214493A

公开(公告)日：1993-05-25

申请号：US746612

申请日：1991-08-19

申请人： Shuji Sugiyama ,  Yoshimitsu Saze ,  Katsunori Onuki

发明人： Shuji Sugiyama ,  Yoshimitsu Saze ,  Katsunori Onuki

IPC分类号： G01B11/00 ,  G02B5/18 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/70

摘要： A diffraction grating shaped reference pattern having the same grating pitch as diffraction grating shaped alignment pattern formed on a wafer is irradiated by alignment light, and the diffracted light signal obtained from the reference pattern is stored in a memory. The diffraction grating shaped alignment pattern formed on the wafer is irradiated by the alignment light, and the diffracted light signal from the alignment pattern is corrected based on the diffracted light signal stored in the memory.

摘要翻译： 具有与形成在晶片上的衍射光栅形状的取向图案相同的光栅间距的衍射光栅形参考图案被对准光照射，从参考图案获得的衍射光信号存储在存储器中。 通过对准光照射形成在晶片上的衍射光栅形状的取向图案，并且基于存储在存储器中的衍射光信号来校正来自对准图案的衍射光信号。

公开(公告)号：US5164789A

公开(公告)日：1992-11-17

申请号：US789006

申请日：1991-11-07

申请人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Soichi Katagiri ,  Shuji Sugiyama ,  Yoshimitsu Saze

发明人： Yasuhiro Yoshitake ,  Yoshitada Oshida ,  Soichi Katagiri ,  Shuji Sugiyama ,  Yoshimitsu Saze

IPC分类号： G01B9/02

CPC分类号： G01B9/02028 ,  G01B9/02002 ,  G01B9/02003 ,  G01B2290/30 ,  G01B2290/70

摘要： The present invention resides in method and apparatus for measuring a minute displacement, comprising applying a light of a first wavelength at a predetermined angle to a diffraction grating formed on an object whose position is to be detected, subjecting each of the resulting diffracted light and regular reflected light and a light of a second wavelength different from the first wavelength to heterodyne interference with each other to generate a measurement signal and a reference signal, and measuring a phase difference between the measurement signal and the reference signal to thereby determine a minute displacement of the object.

摘要翻译： 本发明在于用于测量微小位移的方法和装置，包括以预定角度将第一波长的光施加到形成在要检测的位置的物体上的衍射光栅，对所得衍射光和规则 反射光和不同于第一波长的第二波长的光与彼此的外差干涉产生测量信号和参考信号，并测量测量信号和参考信号之间的相位差，从而确定 物体。