利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

12 条记录 (耗时 0.018 秒)

    Method and apparatus for electron-beam lithography
    1.
    发明申请
    Method and apparatus for electron-beam lithography 失效
    电子束光刻的方法和装置

    公开(公告)号：US20060011080A1

    公开(公告)日：2006-01-19

    申请号：US11179628

    申请日：2005-07-13

    申请人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

    发明人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

    IPC分类号： B41F33/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

    摘要： The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

    摘要翻译： 本发明是提供一种电子束光刻方法和电子束光刻设备，尽管大气压力发生变化，但能够高精度地绘制图案，可以确保令人满意的生产量，并且便宜。 在使用电子束在样品上绘制图案的电子束光刻方法中，确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。 当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时，校准绘制精度。

    Method and apparatus for electron-beam lithography
    2.
    发明授权
    Method and apparatus for electron-beam lithography 失效
    电子束光刻的方法和装置

    公开(公告)号：US07342241B2

    公开(公告)日：2008-03-11

    申请号：US11179628

    申请日：2005-07-13

    申请人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

    发明人： Yasuko Aoki ,  Tsutomu Tawa ,  Yoshimitsu Saze

    IPC分类号： G21K5/04 ,  H01J33/00

    CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31793

    摘要： The present invention is to provide an electron-beam lithography method and an electron-beam lithography apparatus that can draw patterns with a high precision despite a change in barometric pressure, can ensure a satisfactory throughput, and are inexpensive. In the electron-beam lithography method that uses an electron beam to draw patterns on a sample, a difference between a current measured barometric pressure and a previous measured barometric pressure, and an elapsed time between their barometric pressure-measurement points in time are determined. When the rate of the difference of their barometric pressures with respect to the elapsed time is equal to or larger than a prescribed barometric pressure change rate value, a drawing precision is calibrated.

    摘要翻译： 本发明是提供一种电子束光刻方法和电子束光刻设备，尽管大气压力发生变化，但能够高精度地绘制图案，可以确保令人满意的生产量，并且便宜。 在使用电子束在样品上绘制图案的电子束光刻方法中，确定当前测量的大气压力与先前测量的大气压力之间的差异以及它们在大气压力测量点之间的经过时间。 当大气压力相对于经过时间的差异的比率等于或大于规定的气压变化率值时，校准绘制精度。

    Projection exposure apparatus
    4.
    发明授权
    Projection exposure apparatus 失效
    投影曝光装置

    公开(公告)号：US5323208A

    公开(公告)日：1994-06-21

    申请号：US27776

    申请日：1993-03-08

    申请人： Hiroshi Fukuda ,  Tsutomu Tawa ,  Toshihide Dohi

    发明人： Hiroshi Fukuda ,  Tsutomu Tawa ,  Toshihide Dohi

    IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/42

    CPC分类号： G03F7/70308

    摘要： In a reduction-type projection exposure apparatus provided by the present invention, a spatial filter having a predetermined complex amplitude-transmission distribution is fixed approximately at the pupil position of a projection lens thereof or at such a position that the spatial filter conjugates with the pupil. The complex amplitude transmittance of the spatial filter is controlled by a multiple-interference effect of the multi-layer coating forming the spatial filter or by the surface reflection occurring on the surface of the film which constitutes the spatial filter and has an index of refraction different from the air. The filter can thus be prevented from absorbing light, incurring neither thermal damage nor damage due to dissipated heat. As a result, the reduction-type projection exposure apparatus offers excellent resolution and an outstanding depth of focus.

    摘要翻译： 在由本发明提供的还原型投影曝光装置中，具有预定的复振幅传播分布的空间滤光器大致固定在其投影透镜的光瞳位置处或者在空间滤光器与瞳孔共轭的位置处固定 。 空间滤波器的复振幅透射率由形成空间滤波器的多层涂层或由构成空间滤波器的膜的表面上发生的表面反射的多干涉效应控制，并且具有不同的折射率 从空中 因此，可以防止过滤器吸收光，不会导致热损伤，也不会由于散热而损坏。 结果，还原型投影曝光装置具有优异的分辨率和优异的聚焦深度。

    Gas barrier polyurethane resin
    5.
    发明授权
    Gas barrier polyurethane resin 有权
    防气聚氨酯树脂

    公开(公告)号：US06569533B1

    公开(公告)日：2003-05-27

    申请号：US09619639

    申请日：2000-07-19

    申请人： Takashi Uchida ,  Tsutomu Tawa ,  Hiroyuki Shiraki

    发明人： Takashi Uchida ,  Tsutomu Tawa ,  Hiroyuki Shiraki

    IPC分类号： B32B2706

    CPC分类号： C08J5/18 ,  C08G18/0823 ,  C08G18/12 ,  C08G18/3206 ,  C08G18/758 ,  C08G18/7642 ,  C08J2375/04 ,  Y10T428/31551 ,  Y10T428/31591 ,  Y10T428/31598 ,  Y10T428/31605 ,  Y10T428/31609 ,  C08G18/3228

    摘要： A polyurethane resin having a total concentration of the urethane group and the urea group of not less than 15% by weight is prepared by reacting a diisocyanate component (e.g., an aromatic diisocyanate) with a diol component (e.g., a C2-8alkylene glycol). The repeating unit of the polyurethane resin may contain a constitutive unit of an aromatic or alicyclic compound. The polyurethane resin may be shaped into a film for use as a gas barrier film. The film may be a gas barrier composite film composed of a base film layer and a resin layer at least comprising the polyurethane resin. The present invention provides a polyurethane resin excellent in gas barrier properties against water vapor, oxygen, aromatics, and others, and a film containing the same.

    摘要翻译： 通过使二异氰酸酯成分（例如芳香族二异氰酸酯）与二醇成分（例如C 2-8亚烷基二醇）反应，制备氨基甲酸酯基和脲基的总浓度为15重量％以上的聚氨酯树脂， 。 聚氨酯树脂的重复单元可以含有芳族或脂环族化合物的组成单元。 聚氨酯树脂可以成形为用作阻气膜的膜。 该膜可以是由至少包含聚氨酯树脂的基膜层和树脂层构成的阻气性复合膜。 本发明提供了对水蒸气，氧气，芳烃等的阻气性优异的聚氨酯树脂和含有该聚氨酯树脂的膜。

    Projection exposure apparatus and pattern forming method for use therewith
    6.
    发明授权
    Projection exposure apparatus and pattern forming method for use therewith 失效
    投影曝光装置和图案形成方法

    公开(公告)号：US5348837A

    公开(公告)日：1994-09-20

    申请号：US12479

    申请日：1993-02-02

    申请人： Hiroshi Fukuda ,  Ryoko Yamanaka ,  Tsutomu Tawa ,  Tsuneo Terasawa ,  Seiji Yonezawa

    发明人： Hiroshi Fukuda ,  Ryoko Yamanaka ,  Tsutomu Tawa ,  Tsuneo Terasawa ,  Seiji Yonezawa

    IPC分类号： G03F7/20 ,  G03C5/00

    CPC分类号： G03F7/70066 ,  G03F7/2002 ,  G03F7/701 ,  G03F7/70191 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70333 ,  G03F7/70375 ,  G03F7/70891

    摘要： A projection exposure apparatus has an effective source, a mask, a projection lens and an optical filter. The mask is illuminated with the light from the effective source having a substantially annular illumination distribution. The optical filter is disposed in the approximate position of the pupil plane of the projection lens. On the pupil plane, the transmittance of a first region is made lower than that of a second region, the first region being inside of the periphery of an annular region substantially conjugate with the effective source having the annular illumination distribution, the second region being outside of the periphery. Built in this manner, the apparatus forms fine patterns whose unit size is at least as small as the wavelength of the light used while maintaining high values of contrast and deep levels of focal length.

    摘要翻译： 投影曝光装置具有有效的源，掩模，投影透镜和滤光器。 掩模被来自有源光的光线照射，具有大致环形的照明分布。 滤光器设置在投影透镜的光瞳面的近似位置。 在光瞳面上，使第一区域的透射率低于第二区域的透射率，第一区域在与具有环状照明分布的有效源基本共轭的环状区域的周围的内侧，第二区域在外部 的周边。 以这种方式构建，该装置形成精细图案，其单位尺寸至少与所使用的光的波长一样小，同时保持较高的对比度值和较高的焦距水平。

    Aqueous resin composition having gas barrier properties and laminated film using the same
    8.
    发明申请
    Aqueous resin composition having gas barrier properties and laminated film using the same 有权
    具有阻气性的水性树脂组合物和使用其的层压膜

    公开(公告)号：US20070031679A1

    公开(公告)日：2007-02-08

    申请号：US10575783

    申请日：2004-10-07

    申请人： Takashi Ushida ,  Tsutomu Tawa ,  Takuzo Imaizumi

    发明人： Takashi Ushida ,  Tsutomu Tawa ,  Takuzo Imaizumi

    IPC分类号： C08G18/00 ,  B32B27/40

    CPC分类号： C08G18/0823 ,  C08G18/12 ,  C08G18/3206 ,  C08G18/324 ,  C08G18/3271 ,  C08G18/329 ,  C08G18/348 ,  C08G18/3893 ,  C08G18/724 ,  C08G18/757 ,  C08G18/7642 ,  C08J7/047 ,  C08J2475/00 ,  C08K3/346 ,  C08K5/16 ,  C08K5/17 ,  C08K5/205 ,  C08K2201/008 ,  C08L75/02 ,  C08L75/04 ,  C09D175/02 ,  C09D175/04 ,  C09D175/12 ,  Y10T428/31551 ,  Y10T428/31591 ,  Y10T428/31605 ,  Y10T428/31609 ,  C08G18/3231 ,  C08L75/12

    摘要： An aqueous resin composition with gas barrier properties contains (i) polyurethane resin having aurethane group and a urea group in a total concentration of 25 to 60% by weight and having a acid value of 5 to 100 mgKOH/g, (ii) a swelling inorganic layered compound (e.g., a water-swelling mica, and a montmorillonite), and (iii) a polyamine compound having an amine value of 100 to 1900 mgKOH/g. The polyurethane resin (i) is obtained by a reaction of (A) an aromatic, araliphatic or alicyclic polyisocyanate, (B) a polyhydroxyalkanecarboxylic acid, and at least one component selected from (C) a C2-8alkylene glycol and (D) a chain-extension agent (e.g., diamine, hydrazine and a hydrazine derivative), and neutralized with a neutralizing agent. The proportion of the acid group of the polyurethane resin (i) relative to the basic nitrogen atom of the polyamine compound (iii) is 10/1 to 1/5 as the equivalent ratio. A laminated film with high gas barrier properties is obtainable by coating a base film with the aqueous resin composition. The present invention provides an aqueous resin composition with excellent gas barrier properties, and a laminated film using the same.

    摘要翻译： 具有阻气性的水性树脂组合物含有（i）总重量为25〜60重量％，酸值为5〜100mgKOH / g的氨基甲酸酯基和脲基的聚氨酯树脂，（ii） 无机层状化合物（例如水溶性云母，蒙脱石），（iii）胺值为100〜1900mgKOH / g的多胺化合物。 聚氨酯树脂（i）通过（A）芳族，芳脂族或脂环族多异氰酸酯，（B）聚羟基链烷羧酸和至少一种选自（C）C 2-8 - 亚烷基二醇和（D）扩链剂（例如二胺，肼和肼衍生物），并用中和剂中和。 聚氨酯树脂（i）的酸基相对于多胺化合物（iii）的碱性氮原子的比例为当量比为10/1〜1/5。 通过用水性树脂组合物涂布基膜可获得具有高阻气性的层压膜。 本发明提供阻气性优异的水性树脂组合物和使用其的层压膜。

    Surface-treated metal material and metal surface treatment agent
    10.
    发明授权
    Surface-treated metal material and metal surface treatment agent 有权
    表面处理金属材料和金属表面处理剂

    公开(公告)号：US08034456B2

    公开(公告)日：2011-10-11

    申请号：US12308538

    申请日：2007-06-22

    申请人： Atsushi Morishita ,  Masahiro Fuda ,  Hiroshi Kanai ,  Hiroshi Kosuge ,  Tsutomu Tawa

    发明人： Atsushi Morishita ,  Masahiro Fuda ,  Hiroshi Kanai ,  Hiroshi Kosuge ,  Tsutomu Tawa

    IPC分类号： B32B15/095 ,  C08L83/08

    CPC分类号： C09D175/12 ,  C08G18/0823 ,  C08G18/12 ,  C08G18/4238 ,  C08G18/44 ,  C08G18/6659 ,  C08G18/758 ,  C08G2150/90 ,  C09D5/08 ,  C09D175/06 ,  C23C26/00 ,  C23C30/00 ,  Y10T428/31605 ,  C08G18/3231 ,  C08G18/289 ,  C08L2666/06

    摘要： The present invention provides a surface-treated metal material having a film formed on at least a portion of a surface of a metal material, the film containing at least polyurethane resin and silicon oxide, and a metal surface treatment agent used to obtain the surface-treated metal material. The polyurethane resin contains one or more of siloxane bond, dehydration-condensation bond of silanol group and different functional group, and silanol moiety, and urea bond. The sum of the siloxane bond, the dehydration-condensation bond of silanol group and different functional group, total amount of the silanol moiety, and the silicon oxide falls within a range of equal to or more than 1.6 wt % to equal to or less than 25 wt % for solids of the film. The ratio of the total amount of urea bond and urethane bond to the total amount of resin components falls within a range of equal to or more than 0.1 wt % to equal to or less than 10 wt %.

    摘要翻译： 本发明提供了一种表面处理的金属材料，其具有形成在金属材料表面的至少一部分上的膜，所述膜至少含有聚氨酯树脂和氧化硅，以及用于获得表面处理金属的金属表面处理剂， 处理过的金属材料。 聚氨酯树脂含有一个或多个硅氧烷键，硅烷醇基和不同官能团的脱水缩合键，以及硅烷醇部分和脲键。 硅氧烷键，硅烷醇基和不同官能团的脱水缩合键，硅烷醇部分的总量和氧化硅的总和在1.6重量％以上的范围内，等于或小于 对于固体膜为25重量％。 脲键和氨基甲酸酯键的总量与树脂组分的总量的比例落入等于或大于0.1重量％至等于或小于10重量％的范围内。