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公开(公告)号：US09312102B2
公开(公告)日：2016-04-12
申请号：US13315567
申请日：2011-12-09
申请人： Yasushi Kamiya , Einstein Noel Abarra , Yuta Konno
发明人： Yasushi Kamiya , Einstein Noel Abarra , Yuta Konno
IPC分类号： H01J37/302 , H01J37/305
CPC分类号： H01J37/302 , G05B15/02 , H01J37/3053 , H01J2237/0044 , H01J2237/043 , H01J2237/334
摘要： A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.
摘要翻译： 一种在包括保持衬底的衬底保持器，发射离子束的离子源，发射电子的中和器和快门的设备中处理衬底的方法，该快门设置在离子源和中和器之间的空间中 布置有衬底保持器布置的空间，并且被构造成屏蔽朝向衬底行进的离子束，包括调节由中和器发射的电子的量并且在快门移动期间到达衬底保持器。
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公开(公告)号：US20120145535A1
公开(公告)日：2012-06-14
申请号：US13315567
申请日：2011-12-09
申请人： Yasushi KAMIYA , Einstein Noel Abarra , Yuta Konno
发明人： Yasushi KAMIYA , Einstein Noel Abarra , Yuta Konno
CPC分类号： H01J37/302 , G05B15/02 , H01J37/3053 , H01J2237/0044 , H01J2237/043 , H01J2237/334
摘要： A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.
摘要翻译： 一种在包括保持衬底的衬底保持器，发射离子束的离子源，发射电子的中和器和快门的设备中处理衬底的方法，该快门设置在离子源和中和器之间的空间中 布置有衬底保持器布置的空间，并且被构造成屏蔽朝向衬底行进的离子束，包括调节由中和器发射的电子的量并且在快门移动期间到达衬底保持器。
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