Method of making a metal to metal antifuse
    1.
    发明授权
    Method of making a metal to metal antifuse 失效
    制造金属对金属反熔丝的方法

    公开(公告)号:US6001693A

    公开(公告)日:1999-12-14

    申请号:US999970

    申请日:1995-09-01

    IPC分类号: H01L23/525 H01L21/82

    CPC分类号: H01L23/5252 H01L2924/0002

    摘要: The antifuse structure of the present invention includes a bottom planarized electrode, an ILD disposed over the bottom electrode, an antifuse cell opening in and through the ILD exposing the bottom electrode, a first barrier metal layer disposed in the antifuse cell opening to protect the antifuse material layer from diffusion from the bottom electrode and to form an effective bottom electrode of reduced area, hence reducing the capacitance of the device, an antifuse material layer disposed in the antifuse cell opening and over the first barrier metal layer, a second barrier metal layer disposed over the antifuse material layer, and a top electrode disposed over the second barrier metal layer.

    摘要翻译: 本发明的反熔丝结构包括底部平面化电极,设置在底部电极上的ILD,暴露底部电极的ILD中和穿过ILD的反熔丝电池;设置在反熔丝电池开口中的第一阻挡金属层,以保护反熔丝 材料层从底部电极扩散并形成减小面积的有效底部电极,因此降低了器件的电容,设置在反熔丝电池开口中并在第一阻挡金属层上方的反熔丝材料层,第二阻挡金属层 设置在反熔丝材料层之上,以及设置在第二阻挡金属层上的顶电极。

    Metal to metal antifuse
    2.
    发明授权
    Metal to metal antifuse 失效
    金属对金属反熔丝

    公开(公告)号:US5541441A

    公开(公告)日:1996-07-30

    申请号:US319170

    申请日:1994-10-06

    IPC分类号: H01L23/525 H01L29/08

    CPC分类号: H01L23/5252 H01L2924/0002

    摘要: The antifuse structure of the present invention includes a bottom planarized electrode, an ILD disposed over the bottom electrode, an antifuse cell opening in and through the ILD exposing the bottom electrode, a first barrier metal layer disposed in the antifuse cell opening to protect the antifuse material layer from diffusion from the bottom electrode and to form an effective bottom electrode of reduced area, hence reducing the capacitance of the device, an antifuse material layer disposed in the antifuse cell opening and over the first barrier metal layer, a second barrier metal layer disposed over the antifuse material layer, and a top electrode disposed over the second barrier metal layer.

    摘要翻译: 本发明的反熔丝结构包括底部平面化电极,设置在底部电极上的ILD,暴露底部电极的ILD中和穿过ILD的反熔丝电池;设置在反熔丝电池开口中的第一阻挡金属层,以保护反熔丝 材料层从底部电极扩散并形成减小面积的有效底部电极,因此降低了器件的电容,设置在反熔丝电池开口中并在第一阻挡金属层上方的反熔丝材料层,第二阻挡金属层 设置在反熔丝材料层之上,以及设置在第二阻挡金属层上的顶电极。