公开(公告)号：US6001693A

公开(公告)日：1999-12-14

申请号：US999970

申请日：1995-09-01

申请人： Yen Yeouchung ,  Shih-Oh Chen ,  Leuh Fang ,  Elaine K. Poon ,  James B. Kruger

发明人： Yen Yeouchung ,  Shih-Oh Chen ,  Leuh Fang ,  Elaine K. Poon ,  James B. Kruger

IPC分类号： H01L23/525 ,  H01L21/82

CPC分类号： H01L23/5252 ,  H01L2924/0002

摘要： The antifuse structure of the present invention includes a bottom planarized electrode, an ILD disposed over the bottom electrode, an antifuse cell opening in and through the ILD exposing the bottom electrode, a first barrier metal layer disposed in the antifuse cell opening to protect the antifuse material layer from diffusion from the bottom electrode and to form an effective bottom electrode of reduced area, hence reducing the capacitance of the device, an antifuse material layer disposed in the antifuse cell opening and over the first barrier metal layer, a second barrier metal layer disposed over the antifuse material layer, and a top electrode disposed over the second barrier metal layer.

摘要翻译： 本发明的反熔丝结构包括底部平面化电极，设置在底部电极上的ILD，暴露底部电极的ILD中和穿过ILD的反熔丝电池;设置在反熔丝电池开口中的第一阻挡金属层，以保护反熔丝 材料层从底部电极扩散并形成减小面积的有效底部电极，因此降低了器件的电容，设置在反熔丝电池开口中并在第一阻挡金属层上方的反熔丝材料层，第二阻挡金属层 设置在反熔丝材料层之上，以及设置在第二阻挡金属层上的顶电极。

公开(公告)号：US5541441A

公开(公告)日：1996-07-30

申请号：US319170

申请日：1994-10-06

申请人： Yen Yeuochung ,  Shih-Oh Chen ,  Leuh Fang ,  Elaine K. Poon ,  James B. Kruger

发明人： Yen Yeuochung ,  Shih-Oh Chen ,  Leuh Fang ,  Elaine K. Poon ,  James B. Kruger

IPC分类号： H01L23/525 ,  H01L29/08

CPC分类号： H01L23/5252 ,  H01L2924/0002

摘要： The antifuse structure of the present invention includes a bottom planarized electrode, an ILD disposed over the bottom electrode, an antifuse cell opening in and through the ILD exposing the bottom electrode, a first barrier metal layer disposed in the antifuse cell opening to protect the antifuse material layer from diffusion from the bottom electrode and to form an effective bottom electrode of reduced area, hence reducing the capacitance of the device, an antifuse material layer disposed in the antifuse cell opening and over the first barrier metal layer, a second barrier metal layer disposed over the antifuse material layer, and a top electrode disposed over the second barrier metal layer.

摘要翻译： 本发明的反熔丝结构包括底部平面化电极，设置在底部电极上的ILD，暴露底部电极的ILD中和穿过ILD的反熔丝电池;设置在反熔丝电池开口中的第一阻挡金属层，以保护反熔丝 材料层从底部电极扩散并形成减小面积的有效底部电极，因此降低了器件的电容，设置在反熔丝电池开口中并在第一阻挡金属层上方的反熔丝材料层，第二阻挡金属层 设置在反熔丝材料层之上，以及设置在第二阻挡金属层上的顶电极。

公开(公告)号：US06428160B2

公开(公告)日：2002-08-06

申请号：US09726100

申请日：2000-11-29

申请人： Joy Roy ,  Babur Hadimioglu ,  Richard N. Ellson ,  Robert Sprague ,  James B. Kruger ,  John Lennon

发明人： Joy Roy ,  Babur Hadimioglu ,  Richard N. Ellson ,  Robert Sprague ,  James B. Kruger ,  John Lennon

IPC分类号： B41J201

CPC分类号： B41J11/002

摘要： An apparatus and method for ink-jet printing on a recording medium is provided which includes the steps of jetting aqueous ink drops on paper in the form of an image. The aqueous ink used is a slow-drying (high-surface tension) ink which does not penetrate the paper/paper fibers for a relatively long time. Prior to penetration of the paper/paper fibers, the water in the droplet is quickly evaporated from the ink while still resident on the paper surface. The evaporation process is substantially completed prior to an additional liquid ink being jetted onto the same or adjoining location of the recording medium. The evaporation is rapid enough to prevent the resident ink from substantially migrating/wicking to any adjacent location or into the recording medium. Further the drying energy is transferred to the resident ink spots from the same direction as the printheads ensuring less energy requirement.

摘要翻译： 提供了一种用于在记录介质上进行喷墨印刷的设备和方法，其包括以图像形式将水性墨滴喷射在纸上的步骤。 使用的水性油墨是一种慢干（高表面张力）油墨，其不会在相对长的时间内渗透纸/纸纤维。 在纸/纸纤维渗透之前，液滴中的水从墨水中迅速蒸发，同时仍然驻留在纸张表面上。 在附加的液体墨水喷射到记录介质的相同或相邻位置之前，蒸发过程基本上完成。 蒸发速度足够快以防止驻留的墨水基本上迁移/吸附到任何相邻位置或记录介质中。 此外，干燥能量从与打印头相同的方向转移到驻留的墨点，确保较少的能量需求。

公开(公告)号：US5144524A

公开(公告)日：1992-09-01

申请号：US643863

申请日：1991-01-22

申请人： Barclay J. Tullis ,  James B. Kruger

发明人： Barclay J. Tullis ,  James B. Kruger

IPC分类号： G01N21/93 ,  G01N21/94 ,  G01N21/95 ,  H01L23/544

CPC分类号： H01L22/34 ,  G01N21/93 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9505

摘要： A surface analysis scanner system includes calibration targets, which include a target substrate and a film covering the surface of the target substrate which is scanned by the surface scanner. The film is antireflective to the particular scanned light. Particles which contaminate the antireflectance film on the substrate do not scatter sufficient light to be detected by the surface analysis scanner detectors and thus do not interfere with the calibration of the scanner. The calibration targets may include reference features which are etched into the substrate surface or deposited on the antireflectance coated substrate surface which scatter light in a manner similar to particles on a surface. The reference features may also be embedded in a transparent material supported by the antireflectance coated substrate with a second antireflectance film coating the upper surface of the transparent material. A surface analysis scanner system may also include a support structure for supporting an object to be scanned, an aperture structure, and a light trap structure for blocking the scanned light. Each structure includes a substrate having a coating of antireflectance film. A surface analysis scanner system may also include methods, utilizing antireflectance films, for reducing the amount of scanned light scattered by particles on a scanner system surface.

摘要翻译： 表面分析扫描仪系统包括校准目标，其包括目标衬底和覆盖由表面扫描器扫描的目标衬底的表面的膜。 该胶片对特定的扫描光具有抗反射性。 污染基板上的抗反射膜的颗粒不会散射足够的光以由表面分析扫描仪检测器检测，因此不会干扰扫描仪的校准。 校准目标可以包括蚀刻到衬底表面中或沉积在抗反射涂层衬底表面上的参考特征，其以类似于表面上的颗粒的方式散射光。 参考特征也可以嵌入由抗反射涂层基板支撑的透明材料中，其中第二抗反射膜涂覆在透明材料的上表面上。 表面分析扫描仪系统还可以包括用于支撑待扫描物体的支撑结构，孔结构和用于阻挡扫描光的光阱结构。 每个结构包括具有抗反射膜涂层的基板。 表面分析扫描仪系统还可以包括利用抗反射膜的方法，以减少由扫描仪系统表面上的颗粒散射的扫描光的量。

公开(公告)号：US5205142A

公开(公告)日：1993-04-27

申请号：US871004

申请日：1992-04-20

申请人： James B. Kruger ,  John T. Fitzpatrick

发明人： James B. Kruger ,  John T. Fitzpatrick

IPC分类号： E05B75/00

CPC分类号： E05B75/00 ,  Y10T16/546 ,  Y10T70/404

摘要： Disclosed is a handcuff device for restraining the wrists of a detainee. The device comprises a pair of handcuff members and a link member of unitary construction. Each of the handcuff members have one or more integrally formed mounting posts. The link member is configured to hingedly interconnect the handcuff members about the posts. The unitary construction of the link member, combined with the integrally formed posts of the handcuff members, provide a handcuff device which is strong and durable and which does not require the use of multiple components, such as a pivot pin, and substantially limits the movement of the detainees hands.

摘要翻译： 公开了一种用于限制被拘留者的手腕的手铐装置。 该装置包括一对手铐构件和一体构造的连杆构件。 每个手铐构件具有一个或多个一体形成的安装柱。 连接构件被构造成围绕支柱铰接地连接手铐构件。 联结构件的整体构造与手铐构件的整体形成的支柱结合，提供了坚固耐用的手铐装置，并且不需要使用诸如枢轴销的多个部件，并且基本上限制了移动 的被拘留者的手。

公开(公告)号：US5004340A

公开(公告)日：1991-04-02

申请号：US186879

申请日：1988-04-27

申请人： Barclay J. Tullis ,  James B. Kruger

发明人： Barclay J. Tullis ,  James B. Kruger

IPC分类号： G01N21/88 ,  G01N21/93 ,  G01N21/94 ,  G01N21/95 ,  G01N21/956 ,  H01L21/66 ,  H01L23/544

CPC分类号： H01L22/34 ,  G01N21/93 ,  G01N21/94 ,  G01N21/9501

摘要： A surface analysis scanner system includes calibration targets, which include a target substrate and a film covering the surface of the target substrate which is scanned by the surface scanner. The film is antireflective to the particular scanned light. Particles which contaminate the antireflectance film on the substrate do not scatter sufficient light to be detected by the surface analysis scanner detectors and thus do not interfere with the calibration of the scanner. The calibration targets may include reference features which are etched into the substrate surface or deposited on the antireflectance coated substrate surface which scatter light in a manner similar to particles on a surface. The reference features may also be imbedded in a transparent material supported by the antireflectance coated substrate with a second antireflectance film coating the upper surface of the transparent material. A surface analysis scanner system may also include a support structure for supporting an object to be scanned, an aperture structure, and a light trap structure for blocking the scanned light. Each structure includes a substrate having a coating of antireflectance film. A surface analysis scanner system may also include methods, utilizing antireflectance films, for reducing the amount of scanned light scattered by particles on a scanner system surface.

摘要翻译： 表面分析扫描仪系统包括校准目标，其包括目标衬底和覆盖由表面扫描器扫描的目标衬底的表面的膜。 该胶片对特定的扫描光具有抗反射性。 污染基板上的抗反射膜的颗粒不会散射足够的光以由表面分析扫描仪检测器检测，因此不会干扰扫描仪的校准。 校准目标可以包括蚀刻到衬底表面中或沉积在抗反射涂层衬底表面上的参考特征，其以类似于表面上的颗粒的方式散射光。 参考特征也可以嵌入由抗反射涂层基材支撑的透明材料中，其中涂覆有透明材料的上表面的第二抗反射膜。 表面分析扫描仪系统还可以包括用于支撑待扫描物体的支撑结构，孔结构和用于阻挡扫描光的光阱结构。 每个结构包括具有抗反射膜涂层的基板。 表面分析扫描仪系统还可以包括利用抗反射膜的方法，以减少由扫描仪系统表面上的颗粒散射的扫描光的量。

公开(公告)号：US5076691A

公开(公告)日：1991-12-31

申请号：US644059

申请日：1991-01-22

申请人： Barclay J. Tullis ,  James B. Kruger

发明人： Barclay J. Tullis ,  James B. Kruger

IPC分类号： G01N21/93 ,  G01N21/94 ,  G01N21/95 ,  H01L23/544

CPC分类号： H01L22/34 ,  G01N21/93 ,  G01N21/94 ,  G01N21/9501

摘要： A surface analysis scanner system includes calibration targets, which include a target substrate and a film covering the surface of the target substrate which is scanned by the surface scanner. The film is antireflective to the particular scanned light. Particles which contaminate the antireflectance film on the substrate do not scatter sufficient light to be detected by the surface analysis scanner detectors and thus do not interfere with the calibration of the scanner. The calibration targets may include reference features which are etched into the substrate surface or deposited on the antireflectance coated substrate surface which scatter light in a manner similar to particles on a surface. The reference features may also be imbedded in a transparent material supported by the antireflectance coated substrate with a second antireflectance film coating the upper surface of the transparent material. A surface analysis scanner system may also include a support structure for supporting an object to be scanned, an aperture structure, and a light trap structure for blocking the scanned light. Each structure includes a substrate having a coating of antireflectance film. A surface analysis scanner system may also include methods, utilizing antireflectance films, for reducing the amount of scanned light scattered by particles on a scanner system surface.

摘要翻译： 表面分析扫描仪系统包括校准目标，其包括目标衬底和覆盖由表面扫描器扫描的目标衬底的表面的膜。 该胶片对特定的扫描光具有抗反射性。 污染基板上的抗反射膜的颗粒不会散射足够的光以由表面分析扫描仪检测器检测，因此不会干扰扫描仪的校准。 校准目标可以包括蚀刻到衬底表面中或沉积在抗反射涂层衬底表面上的参考特征，其以类似于表面上的颗粒的方式散射光。 参考特征也可以嵌入由抗反射涂层基材支撑的透明材料中，其中涂覆有透明材料的上表面的第二抗反射膜。 表面分析扫描仪系统还可以包括用于支撑待扫描物体的支撑结构，孔结构和用于阻挡扫描光的光阱结构。 每个结构包括具有抗反射膜涂层的基板。 表面分析扫描仪系统还可以包括利用抗反射膜的方法，以减少由扫描仪系统表面上的颗粒散射的扫描光的量。

公开(公告)号：US4847183A

公开(公告)日：1989-07-11

申请号：US095389

申请日：1987-09-09

申请人： James B. Kruger

发明人： James B. Kruger

IPC分类号： H01L21/66 ,  G03F7/00 ,  H01L21/02 ,  H01L23/544

CPC分类号： G03F7/00 ,  H01L23/544 ,  H01L2223/54413 ,  H01L2223/54433 ,  H01L2223/54453 ,  H01L2924/0002 ,  Y10S430/143

摘要： Indicia, provided on a specularly reflective surface, are formed by a dot surface relief pattern featuring polygonal surfaces spaced apart to enhance scattering. The spacing of dots is characterized by a pitch in the range of 8 to 50 microns with a dot size of less than 50 microns and usually about one-half of the pitch dimension. In one embodiment, the dots may be anisotropically etched forming mesas, enhanced by gemlike polygonal facets which provide good optical contrast relative to the background surface.

摘要翻译： 在镜面反射表面上提供的标记由具有多边形表面间隔开以增强散射的点表面浮雕图案形成。 点的间距的特征在于在8至50微米范围内的间距，点尺寸小于50微米，通常约为螺距尺寸的一半。 在一个实施例中，点可以各向异性地蚀刻形成台面，通过提供相对于背景表面的良好光学对比度的像宝石般的多边形面增强。

公开(公告)号：US06428159B1

公开(公告)日：2002-08-06

申请号：US09357015

申请日：1999-07-19

申请人： Joy Roy ,  Babur Hadimioglu ,  Richard N. Ellson ,  Robert Sprague ,  James B. Kruger ,  John Lennon

发明人： Joy Roy ,  Babur Hadimioglu ,  Richard N. Ellson ,  Robert Sprague ,  James B. Kruger ,  John Lennon

IPC分类号： B41J201

CPC分类号： B41J11/002

摘要： An apparatus for ink-jet printing on a recording medium is provided which includes the steps of jetting aqueous ink drops on paper in the form of an image. The aqueous ink used is a slow-drying (high-surface tension) ink which does not penetrate the paper/paper fibers for a relatively long time. Prior to penetration of the paper/paper fibers, the water in the droplet is quickly evaporated from the ink while still resident on the paper surface. The evaporation process is substantially completed prior to an additional liquid ink being jetted onto the same or adjoining location of the recording medium. The evaporation is rapid enough to prevent the resident ink from substantially migrating/wicking to any adjacent location or into the recording medium. Further the drying energy is transferred to the resident ink spots from the same direction as the printheads ensuring less energy requirement.

摘要翻译： 提供了一种用于在记录介质上进行喷墨打印的设备，其包括以图像形式将水性墨滴喷射在纸上的步骤。 使用的水性油墨是一种慢干（高表面张力）油墨，其不会在相对长的时间内渗透纸/纸纤维。 在纸/纸纤维渗透之前，液滴中的水从墨水中迅速蒸发，同时仍然驻留在纸张表面上。 在附加的液体墨水喷射到记录介质的相同或相邻位置之前，蒸发过程基本上完成。 蒸发速度足够快以防止驻留的墨水基本上迁移/吸附到任何相邻位置或记录介质中。 此外，干燥能量从与打印头相同的方向转移到驻留的墨点，确保较少的能量需求。

公开(公告)号：US5670823A

公开(公告)日：1997-09-23

申请号：US671105

申请日：1996-06-28

申请人： James B. Kruger ,  S. Jeffrey Rosner ,  Iton Wang

发明人： James B. Kruger ,  S. Jeffrey Rosner ,  Iton Wang

IPC分类号： H01L23/52 ,  H01L21/28 ,  H01L21/3205 ,  H01L21/768 ,  H01L23/532 ,  H01L23/48 ,  H01L29/40 ,  H01L23/59

CPC分类号： H01L21/7685 ,  H01L21/76841 ,  H01L23/532 ,  H01L23/53223 ,  H01L23/53238 ,  H01L2924/0002 ,  Y10S257/915

摘要： A barrier metal integrated circuit structure, including relatively thin, highly nitrided layers of TiW (i.e., TiW:N) straddling a central conductor layer, and in turn each being straddled by adjacent layers of relatively thick substantially un-nitrided TiW material, and a method for its fabrication including deposition of layers of TiW and TiW:N, the latter in a N.sub.2 dominated atmosphere and/or under backbias conditions effective for establishing at least a saturated level of nitrogen into the TiW:N, resulting in an effective barrier to migration of conductor materials from the conductor layer.

摘要翻译： 一种阻挡金属集成电路结构，其包括跨越中心导体层的相对较薄的TiW（即TiW：N）的高度氮化层，并且反过来又由相对较厚的基本上未氮化的TiW材料的相邻层跨过， 其制造方法包括沉积TiW和TiW：N，后者在N2主导的气氛中和/或在有效用于在TiW：N中建立至少饱和的氮水平的回流条件下沉积，导致有效的屏障 导体材料从导体层的迁移。