Antenna unit for generating plasma and substrate processing apparatus including the same
    1.
    发明授权
    Antenna unit for generating plasma and substrate processing apparatus including the same 有权
    用于产生等离子体的天线单元和包括该天线单元的基板处理设备

    公开(公告)号:US09117634B2

    公开(公告)日:2015-08-25

    申请号:US13272235

    申请日:2011-10-13

    Applicant: Yong-Jun Jang

    Inventor: Yong-Jun Jang

    CPC classification number: H01J37/3211

    Abstract: An antenna unit for generating a plasma includes: a first antenna including a first incoming portion and a plurality of first sub-antennas divided from the first incoming portion; and a second antenna including a second incoming portion and a plurality of second sub-antennas divided from the second incoming portion, the first and second incoming portions constituting a coaxial line.

    Abstract translation: 用于产生等离子体的天线单元包括:第一天线,包括第一入射部分和从第一入射部分划分的多个第一子天线; 以及包括第二入射部分和从第二入射部分划分的多个第二子天线的第二天线,第一和第二入射部分构成同轴线。

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