公开(公告)号：US07549141B2

公开(公告)日：2009-06-16

申请号：US11222979

申请日：2005-09-12

申请人： Yoshiaki Ikuta ,  Hiroshi Kojima ,  Kouji Otsuka

发明人： Yoshiaki Ikuta ,  Hiroshi Kojima ,  Kouji Otsuka

IPC分类号： G06F17/50

CPC分类号： G03F7/707 ,  G03F1/60 ,  G03F7/703 ,  G03F7/70783

摘要： A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.

摘要翻译： 通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模，将基板定位在曝光工具中，以便获得由于施加在其上的外力而导致的表面的变形量 基板，基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓，以及当所述基板位于所述曝光工具中时，对所述基板的表面进行处理，以使所述表面基本上平坦。

公开(公告)号：US20070059608A1

公开(公告)日：2007-03-15

申请号：US11222979

申请日：2005-09-12

申请人： Yoshiaki Ikuta ,  Hiroshi Kojima ,  Kouji Otsuka

发明人： Yoshiaki Ikuta ,  Hiroshi Kojima ,  Kouji Otsuka

IPC分类号： G03B27/62 ,  G06F17/50 ,  G03F1/00

CPC分类号： G03F7/707 ,  G03F1/60 ,  G03F7/703 ,  G03F7/70783

摘要： A photomask is manufactured by a method including providing a substrate having a surface on which a predetermined pattern is to be formed, positioning the substrate in an exposure tool so as to obtain an amount of deformation of the surface due to an external force imposed on the substrate, calculating a target profile of the surface, based on the amount of deformation and a target flatness of the surface, and processing the surface of the substrate so as to make the surface substantially flat when the substrate is positioned in the exposure tool.

摘要翻译： 通过包括提供具有要在其上形成预定图案的表面的基板的方法制造光掩模，将基板定位在曝光工具中，以便获得由于施加在其上的外力而导致的表面的变形量 基板，基于所述表面的变形量和目标平面度来计算所述表面的目标轮廓，以及当所述基板位于所述曝光工具中时，对所述基板的表面进行处理，以使所述表面基本上平坦。