公开(公告)号：US07147731B2

公开(公告)日：2006-12-12

申请号：US10471517

申请日：2002-03-27

申请人： Yoshimasa Tanaka ,  Katsumi Ohmiya ,  Yoshiki Seto ,  Yoichi Mori

发明人： Yoshimasa Tanaka ,  Katsumi Ohmiya ,  Yoshiki Seto ,  Yoichi Mori

IPC分类号： C21D1/10

CPC分类号： B62D25/04 ,  B21D53/88 ,  C21D1/18 ,  C21D1/40 ,  C21D1/42 ,  C21D9/0068 ,  C21D2221/00 ,  Y02P10/253

摘要： A spacer 44 is inserted between an upper end face 44a of a contact column 40, and a lower face of a flange 14. The flange 14 is supported at plural positions by supporting columns 42. In heating a shoulder portion 16 to a hardening temperature, an electroconductive member 56 is placed close to the shoulder portion 16, and an AC current having a frequency which will cause mutual attraction between the current flowing through the elctroconductive member 56 and the current flowing through the shoulder portion 16 is applied to flow through the electroconductive member 56. The shoulder portion 16 having been heated to the hardening temperature is quenched by ejecting a liquid coolant through ejection outlets of a cooling jacket.

摘要翻译： 间隔件44插入在接触柱40的上端面44a和凸缘14的下表面之间。 凸缘14通过支撑柱42支撑在多个位置。 在将肩部16加热到硬化温度时，导电部件56靠近肩部16放置，并且具有频率将导致流过导电部件56的电流与流过导电部件56的电流之间引起相互吸引的交流电流 肩部16被施加以流过导电构件56。 已经加热到硬化温度的肩部16通过冷却套的喷射出口喷射液体冷却剂来淬火。

公开(公告)号：US20070264188A1

公开(公告)日：2007-11-15

申请号：US10593312

申请日：2005-03-18

申请人： Yoichi Mori ,  Tadakazu Nishikawa ,  Masaaki Osato ,  Saburou Nagano ,  Yoshihiro Tanabe

发明人： Yoichi Mori ,  Tadakazu Nishikawa ,  Masaaki Osato ,  Saburou Nagano ,  Yoshihiro Tanabe

IPC分类号： B01D53/68 ,  C01B7/20

CPC分类号： B01D53/685 ,  B01D2251/404 ,  B01D2257/2047 ,  B01D2258/0216 ,  Y02C20/30

摘要： To provide a method and apparatus for treating a waste gas containing fluorine-containing compounds, according to which PFCs can be decomposed efficiently even at low temperature, and moreover fluorine from the product of the decomposition can be recovered for reuse efficiently. An embodiment of the present invention relates to a method of treating a gas containing a fluorine-containing compound, comprising contacting the gas with a treatment agent comprising a mixture of aluminum hydroxide and calcium hydroxide. Moreover, another embodiment of the present invention relates to an apparatus for treating a gas containing a fluorine-containing compound, comprising a treatment column comprising a hollow interior that is packed with a treatment agent comprising a mixture of aluminum hydroxide and calcium hydroxide and through which the gas can pass, heating means capable of heating the hollow interior to a prescribed temperature, a gas introduction port for introducing the gas to be treated into the hollow interior, and an exhaust pipe for discharging gas produced from the hollow interior.

摘要翻译： 为了提供一种用于处理含氟化合物废气的方法和装置，根据该方法和装置，PFCs即使在低温下也能有效地分解，而且从分解产物中还可以有效地回收氟。 本发明的一个实施方案涉及一种处理包含含氟化合物的气体的方法，包括使气体与包含氢氧化铝和氢氧化钙的混合物的处理剂接触。 此外，本发明的另一个实施方案涉及用于处理含有含氟化合物的气体的设备，其包括处理塔，该处理塔包括中空的内部，该中空内部填充有包含氢氧化铝和氢氧化钙的混合物的处理剂， 气体可以通过，能够将中空内部加热到规定温度的加热装置，用于将待处理气体引入中空内部的气体导入口，以及用于排出由中空内部产生的气体的排气管。

公开(公告)号：US06602480B1

公开(公告)日：2003-08-05

申请号：US09763126

申请日：2001-02-20

申请人： Yoichi Mori

发明人： Yoichi Mori

IPC分类号： C01B719

CPC分类号： B01J21/04 ,  B01D53/8659 ,  Y02C20/30

摘要： A method for decomposing a fluorine-containing compound by contacting an exhaust gas 1 containing a fluorine-containing compound, such as C2F6, with aluminum oxide 3, such as &ggr;-alumina, which has been heated to a high temperature of, for example, 800° C. to 900° C. There may be such a necessary or larger number of moles of H2 that the fluorine atoms in the fluorine-containing compound become HF. The method has a high decomposition rate of a fluorine-containing compound, a long life, and involves minimal occurrence of CO.

摘要翻译： 通过将含有含氟化合物（例如C 2 F 6）的废气1与已加热至例如高温的高温氧化铝3，例如γ-氧化铝接触来分解含氟化合物的方法， 800℃至900℃。含氟化合物中的氟原子可能具有必需或较多摩尔数的H 2。 该方法含氟化合物的分解速度高，使用寿命长，CO含量少。

公开(公告)号：US06764666B2

公开(公告)日：2004-07-20

申请号：US10060224

申请日：2002-02-01

申请人： Yoichi Mori

发明人： Yoichi Mori

IPC分类号： B01J2104

CPC分类号： B01D53/8659 ,  B01D53/86 ,  B01D53/864 ,  B01D2251/00 ,  B01D2251/102 ,  B01D2257/2027 ,  B01D2257/502

摘要： The purpose of the present invention is to provide a process and an apparatus for efficiently treating a gas containing fluorine-containing compounds and CO to be discharged, for example, from the step of dry cleaning the inner surfaces and the like of a semiconductor manufacturing apparatus or the step of etching various types of formed films such as oxide films in the semiconductor industry. In order to accomplish the above-mentioned purpose, the gas treating process according to the present invention is a process for treating a gas containing fluorine-containing compounds and CO which comprises contacting the above described gas with O2 and H2O at a temperature of 850° C. or higher to oxidize the CO to CO2; and then contacting the gas with &ggr;-alumina at a temperature of 600 to 900° C. to decompose the fluorine-containing compounds.

摘要翻译： 本发明的目的是提供一种用于有效处理含氟化合物和待排出的CO的气体的方法和装置，例如，从干燥半导体制造装置的内表面等的步骤 或在半导体工业中蚀刻各种类型的成膜（例如氧化物膜）的步骤。 为了实现上述目的，根据本发明的气体处理方法是一种处理含有氟化合物和CO的气体的方法，该方法包括使上述气体与O 2和H 2 O在850℃的温度下接触 C以上以将CO氧化成CO 2; 然后使气体与γ-氧化铝在600〜900℃的温度下接触，分解含氟化合物。

公开(公告)号：US06278284B1

公开(公告)日：2001-08-21

申请号：US09250260

申请日：1999-02-16

申请人： Yoichi Mori ,  Yoshihiro Aoki

发明人： Yoichi Mori ,  Yoshihiro Aoki

IPC分类号： G01R3100

CPC分类号： G01R1/0483

摘要： An IC socket for testing a grid array package, is configured to be fitted with an adapter socket mounted on a test board. The IC socket includes an IC socket body having a bottom plate formed with a number of contact holding holes penetrating through the bottom plate and arranged in the form of a matrix, and a number of contacts each having a contacting end, a spring portion, a fixing base portion and a contacting pin which are arranged in the named order, the fixing base portion of each of the contacts being inserted into a corresponding contact holding hole of the IC socket body from the upperside of the bottom plate. The IC socket also includes a fixing plate having a corresponding number of fixing apertures and fixed on an upper surface of the bottom plate of the IC socket body by passing the contacts through the fixing apertures, respectively, so that the fixing base portion of the contact is fixed between the bottom plate of the IC socket body and an edge portion of the fixing aperture of the fixing plate.

摘要翻译： 用于测试网格阵列封装的IC插座被配置为配有安装在测试板上的适配器插座。 IC插座包括具有底板的IC插座主体，该底板形成有穿过底板并以矩阵形式布置的多个触点保持孔，并且多个触点各自具有接触端，弹簧部分， 固定基部和接触销，其中每个触头的固定基部从底板的上侧插入到IC插座主体的相应触点保持孔中。 IC插座还包括固定板，该固定板具有相应数量的固定孔，并且通过使触头分别通过固定孔分别固定在IC插座主体的底板的上表面上，使得触头的固定底座部分 固定在IC插座主体的底板和固定板的固定孔的边缘部分之间。

公开(公告)号：US5094825A

公开(公告)日：1992-03-10

申请号：US647352

申请日：1991-01-29

申请人： Yoichi Mori

发明人： Yoichi Mori

IPC分类号： B01D53/68

CPC分类号： B01D53/68

摘要： Waste gases containing ClF.sub.3 are treated by bringing them into contact with iron oxide substantially composed of a ferric oxide (Fe.sub.2 O.sub.3) at a linear velocity of about 10-200 cm/min at ordinary temperatures, or further into contact with an alkali agent at the same linear velocity and temperatures as the above, whereby the content of ClF.sub.3 can be reduced below the permissible level despite simultaneous emission of acidic gases, and yet which is capable of removing the concomitant acidic gases in an effective manner.

公开(公告)号：US4853313A

公开(公告)日：1989-08-01

申请号：US37222

申请日：1987-04-10

申请人： Yoichi Mori ,  Shigeo Abiko ,  Mikio Tsuda ,  Chikara Ichijo

发明人： Yoichi Mori ,  Shigeo Abiko ,  Mikio Tsuda ,  Chikara Ichijo

IPC分类号： G03F7/075

CPC分类号： G03F7/0752

摘要： A printing plate formed of a substrate and laminated thereon in the following order a primer layer and a photosensitive layer containing a quinonediazide compound and a silicone rubber layer, wherein the primer layer contains 0.1 to 25% by weight of a quinonediazide group. The printing plate of the present invention is excellent in dot reproduction, hardly causes cracking in the photosensitive layer, and has a wide latitutde in production.

摘要翻译： 一种由基材形成的印刷板，其上依次层叠有底漆层和含有醌二叠氮化合物和硅橡胶层的感光层，其中底漆层含有0.1〜25重量％的醌二叠氮化物。 本发明的印刷版在点再现方面是优异的，在感光层中几乎不会发生开裂，并且在生产上具有广泛的应用。

公开(公告)号：US07556787B2

公开(公告)日：2009-07-07

申请号：US10483773

申请日：2002-10-09

申请人： Yoichi Mori

发明人： Yoichi Mori

IPC分类号： B01D53/68 ,  B01D53/70 ,  B01D53/14 ,  C01B31/18 ,  C10K1/00 ,  B01D50/00 ,  B01D53/34

CPC分类号： B01D53/8659 ,  B01D53/86 ,  B01D53/8662 ,  B01D2255/20715 ,  B01D2255/20776 ,  B01D2255/2092 ,  B01D2257/2066 ,  Y02C20/30

摘要： A method for treating exhaust gases containing fluorine-containing compounds which comprises the steps of bringing an exhaust gas containing fluorine-containing compounds into contact with a metal catalyst carrying a tungsten oxide on an alumina-zirconium composite oxide and then bringing the emission into contact with a γ-alumina catalyst.

摘要翻译： 一种处理含氟化合物废气的方法，包括以下步骤：将含有氟化合物的废气与氧化铝 - 锆复合氧化物上携带氧化钨的金属催化剂接触，然后使发射与 一种γ-氧化铝催化剂。

公开(公告)号：US20050271568A1

公开(公告)日：2005-12-08

申请号：US11202121

申请日：2005-08-12

申请人： Yoichi Mori ,  Takashi Kyotani ,  Toyoji Shinohara

发明人： Yoichi Mori ,  Takashi Kyotani ,  Toyoji Shinohara

IPC分类号： B01D53/34 ,  B01D53/68 ,  B01D53/70 ,  B01D53/86 ,  B01J21/04

CPC分类号： B01D53/70 ,  B01D53/685 ,  B01D53/8659 ,  B01D53/8662 ,  B01D2257/204 ,  B01D2257/2066 ,  Y02C20/30

摘要： An apparatus for treatment of a waste gas, containing fluorine-containing compounds, comprises: a solids treating device for separating solids from the waste gas; an addition device for adding H2 and/or H2O, or H2 and/or H2O and O2, as a decomposition assist gas to the waste gas leaving the solids treating device; a thermal decomposition device that is packed with γ-alumina heated at 600-900° C., and which thermally decomposes the waste gas to which the decomposition assist gas has been added; an acidic gas treating device for removing acidic gases from the thermally decomposed waste gas; and channels or lines for connecting these devices in sequence. The apparatus preferably includes an air ejector which is capable of adjusting an internal pressure of the apparatus.

摘要翻译： 一种用于处理含有氟化合物的废气的设备，包括：用于从废气中分离固体的固体处理装置; 用于加入H 2和/或H 2 O，或H 2 H 2和/或H 2 H 2的加成装置， O和O 2作为离开固体处理装置的废气的分解辅助气体; 热分解装置，其被加热至600-900℃的γ-氧化铝填充，并且将分解辅助气体的废气热分解; 用于从热分解废气中除去酸性气体的酸性气体处理装置; 以及用于连接这些设备的通道或线路。 该装置优选地包括能够调节装置的内部压力的空气喷射器。

公开(公告)号：US06790421B2

公开(公告)日：2004-09-14

申请号：US10257264

申请日：2002-10-10

申请人： Yoichi Mori

发明人： Yoichi Mori

IPC分类号： A62D300

CPC分类号： B01D53/8659 ,  B01J21/04 ,  Y02C20/30 ,  Y02P70/605

摘要： The present invention aims to provide exhaust gas treatment processes and systems capable of efficiently treating perfluoro-compounds (PFCs) for a long period. It also aims to provide exhaust gas treatment processes and systems capable of efficiently treating oxidizing gases such as F2, Cl2 and Br2; acidic gases such as HF, HCl, HBr, SiF4, SiCl4, SiBr4 and COF2; and CO in addition to PFCs. In order to attain these objects, an exhaust gas treatment process of the present invention is a process for treating an exhaust gas containing a fluorine-containing compound with a catalyst after solids in said exhaust gas have been separated, said catalyst being a &ggr;-alumina having a crystal structure showing diffraction lines having an intensity of 100 or more at the following five diffraction angles 2&thgr;: 33°±1°, 37°±1°, 40°±1°, 46°±1° and 67°±1° measured by an X-ray diffractometer. An exhaust gas treatment process according to a preferred embodiment of the present invention is characterized in that at least one decomposition-assisting gas selected from H2, O2 and H2O is further added to the exhaust gas.

摘要翻译： 本发明旨在提供能够长时间有效地处理全氟化合物（PFCs）的废气处理方法和系统。 它还旨在提供能够有效处理氧化气体如F2，Cl2和Br2的废气处理过程和系统; 酸性气体如HF，HCl，HBr，SiF4，SiCl4，SiBr4和COF2; 为了达到这些目的，本发明的废气处理方法是在废气中的固体分离后用催化剂处理含有含氟化合物的废气的方法， 所述催化剂是具有晶体结构的γ-氧化铝，该晶体结构显示在以下五个衍射角2θ：33°±1°，37°±1°，40°±1°，46°±±100°的强度为100以上的衍射线 1°和67°±1°由X射线衍射仪测量。 根据本发明优选实施方案的废气处理方法的特征在于，进一步向废气中加入至少一种选自H 2，O 2和H 2 O的分解助剂。