摘要:
According to one embodiment, gate electrodes of a multi-gate field effect transistors and methods of making a gate electrode of a multi-gate field effect transistor are provided. The gate electrode can contain a semiconductor substrate; a dielectric layer over the semiconductor substrate; a fin over the dielectric layer; a gate insulating layer over the side surfaces of the fin; a gate electrode layer over the fin; and a polysilicon layer over the fin. The gate electrode does not contain a gate insulating layer over the upper surface of the dielectric layer except portions of the upper surface of the dielectric layer that contact with the side surfaces of the gate insulating layer formed over the side surface of the fin. In another embodiment, the gate electrode can contain an oxygen diffusion barrier layer or a first oxygen diffusion layer over the upper surface of the dielectric layer.
摘要:
Semiconductor devices and methods of making semiconductor devices are provided. According to one embodiment, the field effect transistor can contain a semiconductor substrate containing shallow trench isolations; a p-FET and an n-FET; a silicon germanium layer in a recess in the upper surface of the p-FET; a pair of gate dielectrics including a hafnium compound and a rare earth compound disposed on the silicon germanium layer and the upper surface of the n-FET; and a pair of gate electrodes both including the same material disposed on the pair of gate dielectrics.
摘要:
Described herein are semiconductor devices with a threshold voltage (Vt) adjusted through back gate stack engineering to meet performance and power requirements and corresponding back gate stack engineering methods. The semiconductor devices can include a thin SOI region, a thin BOX region and a semiconductor substrate. The threshold voltage can be adjusted in the backside of the semiconductor device through implantation of one or more dopants into the BOX region such that the peak concentration of the one or more dopants is inside the BOX region.
摘要:
An apparatus for evaluating a field-effect transistor includes a pulse generator, a current/voltage converter, a switch and a first constant-voltage source. The pulse generator can be electrically connected to a gate electrode of a field-effect transistor. The current/voltage converter includes an input terminal. The input terminal can be electrically connected to a first source/drain region of the field-effect transistor. The switch can be electrically connected to a second source/drain region of the field-effect transistor. The switch switches between a connection state and a disconnection state. The first constant-voltage source can be electrically connected to the second source/drain region through the switch.
摘要:
Disclosed are methods of making and using a high-K dielectric liner to facilitate the lateral oxidation of a high-K gate dielectric, integrated circuit structures containing the high-K dielectric liner and/or oxidized high-K gate dielectric, and other associated methods.
摘要:
An apparatus for evaluating a field-effect transistor includes a pulse generator, a current/voltage converter, a switch and a first constant-voltage source. The pulse generator can be electrically connected to a gate electrode of a field-effect transistor. The current/voltage converter includes an input terminal. The input terminal can be electrically connected to a first source/drain region of the field-effect transistor. The switch can be electrically connected to a second source/drain region of the field-effect transistor. The switch switches between a connection state and a disconnection state. The first constant-voltage source can be electrically connected to the second source/drain region through the switch.
摘要:
Disclosed are methods of making and using a high-K dielectric liner to facilitate the lateral oxidation of a high-K gate dielectric, integrated circuit structures containing the high-K dielectric liner and/or oxidized high-K gate dielectric, and other associated methods.