SEMICONDUCTOR DEVICE WITH EFFECTIVE WORK FUNCTION CONTROLLED METAL GATE
    1.
    发明申请
    SEMICONDUCTOR DEVICE WITH EFFECTIVE WORK FUNCTION CONTROLLED METAL GATE 审中-公开
    具有有效工作功能的半导体器件控制金属栅

    公开(公告)号:US20120049281A1

    公开(公告)日:2012-03-01

    申请号:US12870011

    申请日:2010-08-27

    IPC分类号: H01L27/12 H01L21/762

    CPC分类号: H01L29/785 H01L29/66795

    摘要: According to one embodiment, gate electrodes of a multi-gate field effect transistors and methods of making a gate electrode of a multi-gate field effect transistor are provided. The gate electrode can contain a semiconductor substrate; a dielectric layer over the semiconductor substrate; a fin over the dielectric layer; a gate insulating layer over the side surfaces of the fin; a gate electrode layer over the fin; and a polysilicon layer over the fin. The gate electrode does not contain a gate insulating layer over the upper surface of the dielectric layer except portions of the upper surface of the dielectric layer that contact with the side surfaces of the gate insulating layer formed over the side surface of the fin. In another embodiment, the gate electrode can contain an oxygen diffusion barrier layer or a first oxygen diffusion layer over the upper surface of the dielectric layer.

    摘要翻译: 根据一个实施例,提供了多栅极场效应晶体管的栅极和制造多栅极场效应晶体管的栅电极的方法。 栅电极可以包含半导体衬底; 半导体衬底上的电介质层; 电介质层上的翅片; 在翅片的侧表面上的栅极绝缘层; 翅片上的栅极电极层; 和鳍上的多晶硅层。 栅电极除电介质层上表面的与栅极侧表面上形成的栅极绝缘层的侧面接触的部分以外,在电介质层的上表面上不包含栅极绝缘层。 在另一个实施例中,栅电极可以在电介质层的上表面上包含氧扩散阻挡层或第一氧扩散层。

    SEMICONDUCTOR DEVICE WITH THRESHOLD VOLTAGE CONTROL AND METHOD OF FABRICATING THE SAME
    2.
    发明申请
    SEMICONDUCTOR DEVICE WITH THRESHOLD VOLTAGE CONTROL AND METHOD OF FABRICATING THE SAME 审中-公开
    具有阈值电压控制的半导体器件及其制造方法

    公开(公告)号:US20120319207A1

    公开(公告)日:2012-12-20

    申请号:US13162825

    申请日:2011-06-17

    申请人: Ryosuke Iijima

    发明人: Ryosuke Iijima

    摘要: Semiconductor devices and methods of making semiconductor devices are provided. According to one embodiment, the field effect transistor can contain a semiconductor substrate containing shallow trench isolations; a p-FET and an n-FET; a silicon germanium layer in a recess in the upper surface of the p-FET; a pair of gate dielectrics including a hafnium compound and a rare earth compound disposed on the silicon germanium layer and the upper surface of the n-FET; and a pair of gate electrodes both including the same material disposed on the pair of gate dielectrics.

    摘要翻译: 提供了制造半导体器件的半导体器件和方法。 根据一个实施例,场效应晶体管可以包含含有浅沟槽隔离的半导体衬底; p-FET和n-FET; 在p-FET的上表面的凹部中的硅锗层; 包括设置在硅锗层和n-FET的上表面上的铪化合物和稀土化合物的一对栅极电介质; 以及一对栅电极,两者都包括设置在一对栅极电介质上的相同材料。

    SYSTEMS AND METHODS FOR BACKSIDE THRESHOLD VOLTAGE ADJUSTMENT
    3.
    发明申请
    SYSTEMS AND METHODS FOR BACKSIDE THRESHOLD VOLTAGE ADJUSTMENT 审中-公开
    用于后置电压调节的系统和方法

    公开(公告)号:US20130168823A1

    公开(公告)日:2013-07-04

    申请号:US13338478

    申请日:2011-12-28

    申请人: Ryosuke Iijima

    发明人: Ryosuke Iijima

    IPC分类号: H01L29/36 H01L21/265

    CPC分类号: H01L21/84 H01L27/1203

    摘要: Described herein are semiconductor devices with a threshold voltage (Vt) adjusted through back gate stack engineering to meet performance and power requirements and corresponding back gate stack engineering methods. The semiconductor devices can include a thin SOI region, a thin BOX region and a semiconductor substrate. The threshold voltage can be adjusted in the backside of the semiconductor device through implantation of one or more dopants into the BOX region such that the peak concentration of the one or more dopants is inside the BOX region.

    摘要翻译: 这里描述的是具有通过背栅堆叠工程调整的阈值电压(Vt)以满足性能和功率需求以及相应的背栅堆栈工程方法的半导体器件。 半导体器件可以包括薄SOI区域,薄BOX区域和半导体衬底。 可以在半导体器件的背面通过将一个或多个掺杂剂注入BOX区域来调节阈值电压,使得一个或多个掺杂剂的峰值浓度在BOX区域内。

    Semiconductor device evaluation method
    4.
    发明授权
    Semiconductor device evaluation method 失效
    半导体器件评估方法

    公开(公告)号:US07573065B2

    公开(公告)日:2009-08-11

    申请号:US11472449

    申请日:2006-06-22

    IPC分类号: H01L23/58

    摘要: An apparatus for evaluating a field-effect transistor includes a pulse generator, a current/voltage converter, a switch and a first constant-voltage source. The pulse generator can be electrically connected to a gate electrode of a field-effect transistor. The current/voltage converter includes an input terminal. The input terminal can be electrically connected to a first source/drain region of the field-effect transistor. The switch can be electrically connected to a second source/drain region of the field-effect transistor. The switch switches between a connection state and a disconnection state. The first constant-voltage source can be electrically connected to the second source/drain region through the switch.

    摘要翻译: 用于评估场效应晶体管的装置包括脉冲发生器,电流/电压转换器,开关和第一恒压源。 脉冲发生器可以电连接到场效应晶体管的栅电极。 电流/电压转换器包括输入端子。 输入端子可以电连接到场效应晶体管的第一源极/漏极区域。 开关可以电连接到场效应晶体管的第二源/漏区。 交换机在连接状态和断开状态之间切换。 第一恒压源可以通过开关电连接到第二源极/漏极区域。

    Semiconductor device evaluation apparatus and semiconductor device evaluation method
    6.
    发明申请
    Semiconductor device evaluation apparatus and semiconductor device evaluation method 失效
    半导体装置评估装置及半导体装置的评价方法

    公开(公告)号:US20060289863A1

    公开(公告)日:2006-12-28

    申请号:US11472449

    申请日:2006-06-22

    IPC分类号: H01L23/58

    摘要: An apparatus for evaluating a field-effect transistor includes a pulse generator, a current/voltage converter, a switch and a first constant-voltage source. The pulse generator can be electrically connected to a gate electrode of a field-effect transistor. The current/voltage converter includes an input terminal. The input terminal can be electrically connected to a first source/drain region of the field-effect transistor. The switch can be electrically connected to a second source/drain region of the field-effect transistor. The switch switches between a connection state and a disconnection state. The first constant-voltage source can be electrically connected to the second source/drain region through the switch.

    摘要翻译: 用于评估场效应晶体管的装置包括脉冲发生器,电流/电压转换器,开关和第一恒压源。 脉冲发生器可以电连接到场效应晶体管的栅电极。 电流/电压转换器包括输入端子。 输入端子可以电连接到场效应晶体管的第一源极/漏极区域。 开关可以电连接到场效应晶体管的第二源/漏区。 交换机在连接状态和断开状态之间切换。 第一恒压源可以通过开关电连接到第二源极/漏极区域。