Electroless palladium plating solution
    3.
    发明授权
    Electroless palladium plating solution 有权
    无电镀钯溶液

    公开(公告)号:US08562727B2

    公开(公告)日:2013-10-22

    申请号:US13319194

    申请日:2010-05-07

    IPC分类号: C23C18/44

    摘要: Disclosed is an electroless palladium plating solution which can form a plating layer having excellent soldering properties onto electronic components and the like and excellent wire bonding properties. The electroless palladium plating solution comprises a palladium compound, an amine compound, an inorganic sulfur compound and a reducing agent, wherein a combination of hypophosphorous acid or a hypophosphorous acid compound and formic acid or a formic acid compound is used as the reducing agent, and wherein the palladium compound, the amine compound, the inorganic sulfur compound, the hypophosphorous acid compound, and formic acid or the formic acid compound are contained in amounts of 0.001 to 0.1 mole/l, 0.05 to 5 mole/l, 0.01 to 0.1 mole/l, 0.05 to 1.0 mole/l and 0.001 to 0.1 mole/l, respectively. The electroless palladium plating solution is characterized by having excellent soldering properties and excellent wire bonding properties.

    摘要翻译: 公开了一种化学镀钯溶液,其可以形成对电子部件等具有优异的焊接性质的镀层,并且具有优异的引线接合性能。 化学镀钯溶液包括钯化合物,胺化合物,无机硫化合物和还原剂,其中使用次磷酸或次磷酸化合物与甲酸或甲酸化合物的组合作为还原剂,以及 其中钯化合物,胺化合物,无机硫化合物,次磷酸化合物,甲酸或甲酸化合物的含量为0.001至0.1摩尔/升0.05至5摩尔/升0.01至0.1摩尔 分别为0.05〜1.0摩尔/升和0.001〜0.1摩尔/升。 无电镀钯溶液的特征在于具有优异的焊接性能和优良的引线接合性能。

    ELECTROLESS PALLADIUM PLATING SOLUTION
    4.
    发明申请
    ELECTROLESS PALLADIUM PLATING SOLUTION 有权
    电镀磷酸盐溶液

    公开(公告)号:US20120118196A1

    公开(公告)日:2012-05-17

    申请号:US13319194

    申请日:2010-05-07

    IPC分类号: C09D1/00

    摘要: Disclosed is an electroless palladium plating solution which can form a plating layer having excellent soldering properties onto electronic components and the like and excellent wire bonding properties. The electroless palladium plating solution comprises a palladium compound, an amine compound, an inorganic sulfur compound and a reducing agent, wherein a combination of hypophosphorous acid or a hypophosphorous acid compound and formic acid or a formic acid compound is used as the reducing agent, and wherein the palladium compound, the amine compound, the inorganic sulfur compound, the hypophosphorous acid compound, and formic acid or the formic acid compound are contained in amounts of 0.001 to 0.1 mole/l, 0.05 to 5 mole/l, 0.01 to 0.1 mole/l, 0.05 to 1.0 mole/l and 0.001 to 0.1 mole/l, respectively. The electroless palladium plating solution is characterized by having excellent soldering properties and excellent wire bonding properties.

    摘要翻译: 公开了一种化学镀钯溶液,其可以形成对电子部件等具有优异的焊接性质的镀层,并且具有优异的引线接合性能。 化学镀钯溶液包括钯化合物,胺化合物,无机硫化合物和还原剂,其中使用次磷酸或次磷酸化合物与甲酸或甲酸化合物的组合作为还原剂,以及 其中钯化合物,胺化合物,无机硫化合物,次磷酸化合物,甲酸或甲酸化合物的含量为0.001至0.1摩尔/升0.05至5摩尔/升0.01至0.1摩尔 分别为0.05〜1.0摩尔/升和0.001〜0.1摩尔/升。 无电镀钯溶液的特征在于具有优异的焊接性能和优良的引线接合性能。

    Frequency and current control for fluid machinery
    5.
    发明授权
    Frequency and current control for fluid machinery 失效
    流体机械的频率和电流控制

    公开(公告)号:US06350105B1

    公开(公告)日:2002-02-26

    申请号:US09402617

    申请日:1999-10-25

    IPC分类号: F04B4906

    CPC分类号: F04D15/0066

    摘要: A fluid machinery for generating a pressure by rotating an impeller with a motor has a frequency converter (F) for supplying electric power to the motor, a detector for detecting a frequency and a current value, and a program for specifying in advance the relationship between the frequency and the current value. A frequency and a current value in an actual operation are compared with the specified program, and the frequency generated by the frequency converter (F) is varied so that an operating point of the fluid machinery approaches the specified program.

    摘要翻译: 用于通过用电动机旋转叶轮产生压力的流体机械具有用于向电动机供电的变频器(F),用于检测频率和电流值的检测器,以及用于预先指定 频率和当前值。 将实际操作中的频率和当前值与指定的程序进行比较,并且变频器(F)产生的频率被改变,使得流体机械的操作点接近指定的程序。