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公开(公告)号：US20100215989A1
公开(公告)日：2010-08-26
申请号：US12705456
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，对暴露于凹部中的磁记录层进行修改处理以改变蚀刻速率，以及使在凹部中暴露的磁记录层失活。
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公开(公告)号：US20100214694A1
公开(公告)日：2010-08-26
申请号：US12705421
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，去除残留在第一硬掩模的突起上的第二硬掩模，以及通过离子束照射去除在凹部中暴露的磁记录层。
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公开(公告)号：US20100147791A1
公开(公告)日：2010-06-17
申请号：US12636610
申请日：2009-12-11
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂膜，在抗蚀剂膜上压印印模以转印凹凸图案，去除 残留物保留在图案化抗蚀剂膜的凹部中，使用图案化的抗蚀剂膜作为掩模蚀刻第二硬掩模以转移凹凸和突起的图案，使用图案化的第二硬掩模作为掩模蚀刻第一硬掩模以转移凹槽的图案 和突起，并且通过离子束蚀刻去除第二硬掩模，使暴露于凹部中的磁记录层的磁性失活。
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4.发明申请公开(公告)号：US20100047625A1
公开(公告)日：2010-02-25
申请号：US12544606
申请日：2009-08-20
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成抗蚀剂，将压模压印到抗蚀剂上以转印突起和凹陷的图案，以及在不覆盖图案的区域中部分蚀刻磁记录层 通过使用He和N2的混合气体的离子束蚀刻用作掩模的抗蚀剂以及修改磁记录层的剩余部分留下厚度减小的非磁性层。
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公开(公告)号：US20110014496A1
公开(公告)日：2011-01-20
申请号：US12838349
申请日：2010-07-16
摘要： According to one embodiment, there is provided a method of manufacturing a magnetic recording medium, including forming a first hard mask including carbon as a main component, a second hard mask including a main component other than carbon and a resist on a magnetic recording layer, contacting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues in the recesses of the patterned resist, etching the second hard mask, etching the first hard mask, patterning the magnetic recording layer, and removing the first hard mask, the method further including, between etching the first hard mask and removing the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and removing a contaminating layer on a surface of the first hard mask by a mixed gas of oxygen-based gas and a fluorine compound.
摘要翻译： 根据一个实施例，提供了一种制造磁记录介质的方法，包括形成包括碳作为主要成分的第一硬掩模，包括除碳以外的主要成分的第二硬掩模和在磁记录层上的抗蚀剂， 将压模接触抗蚀剂以将突起和凹陷的图案转移到抗蚀剂，去除图案化抗蚀剂的凹部中的残留物，蚀刻第二硬掩模，蚀刻第一硬掩模，图案化磁记录层，以及去除第一硬 掩模，所述方法还包括在蚀刻所述第一硬掩模和去除所述第一硬掩模之间，去除残留在所述第一硬掩模的突起上的所述第二硬掩模，以及通过所述第一硬掩模的表面去除所述第一硬掩模的表面上的污染层 氧基气体和氟化合物的混合气体。
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6.发明申请公开(公告)号：US20150221327A1
公开(公告)日：2015-08-06
申请号：US14171959
申请日：2014-02-04
IPC分类号： G11B5/39
CPC分类号： G11B5/3912 , G01R33/098 , G11B5/1272 , G11B5/3163 , G11B5/3932 , G11B5/398 , G11B2005/3996 , H01L43/08 , H01L43/12 , Y10T29/49826
摘要： According to one embodiment, a magnetoresistance effect element includes first and second shields, first and second side magnetic units, a stacked body, and a hard bias unit. The first side magnetic unit includes a first soft magnetic layer, a first nonmagnetic intermediate layer, and a second soft magnetic layer. The second side magnetic unit includes a third soft magnetic layer, a second nonmagnetic intermediate layer, and a fourth soft magnetic layer. The stacked body includes a fifth ferromagnetic layer, a third nonmagnetic intermediate layer, and a sixth ferromagnetic layer. The hard bias unit is provided between the first and second shields. A first distance between the first and fifth magnetic layers is shorter than a second distance between the second and sixth magnetic layers. A third distance between the third and fifth magnetic layers is shorter than a fourth distance between the fourth and sixth magnetic layers.
摘要翻译： 根据一个实施例，磁阻效应元件包括第一和第二屏蔽，第一和第二侧磁单元，堆叠体和硬偏置单元。 第一侧磁性单元包括第一软磁性层，第一非磁性中间层和第二软磁性层。 第二侧磁性单元包括第三软磁层，第二非磁性中间层和第四软磁层。 层叠体包括第五铁磁层，第三非磁性中间层和第六铁磁层。 硬偏置单元设置在第一和第二屏蔽之间。 第一和第五磁性层之间的第一距离比第二和第六磁性层之间的第二距离短。 第三和第五磁性层之间的第三距离比第四和第六磁性层之间的第四距离短。
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7.发明申请MAGNETIC RECORDING MEDIUM, MAGNETIC RECORDING/REPRODUCING APPARATUS, AND METHOD OF MANUFACTURING MAGNETIC RECORDING MEDIUM 审中-公开磁记录介质，磁记录/再现装置以及制造磁记录介质的方法公开(公告)号：US20130258523A1
公开(公告)日：2013-10-03
申请号：US13723725
申请日：2012-12-21
IPC分类号： G11B5/667
CPC分类号： G11B5/667 , G11B5/7325 , G11B5/855
摘要： A magnetic recording medium of an embodiment includes: a substrate; a nonmagnetic base layer disposed on the substrate; a perpendicular magnetic recording layer disposed on the nonmagnetic base layer, having a hard magnetic recording layer, a nonmagnetic intermediate layer, and a soft magnetic recording layer, and divided into mutually separated plural regions; and a protective layer disposed on the perpendicular magnetic recording layer. The hard magnetic recording layer has an easy magnetization axis directed to a stack direction of the hard magnetic recording layer. The nonmagnetic intermediate layer contains one of C, ZnO, a carbide of Si, Ti, Ta or W, and a nitride of Si, Ti, Ta or W.
摘要翻译： 实施例的磁记录介质包括：基板; 设置在基板上的非磁性基层; 设置在非磁性基底层上的垂直磁记录层，具有硬磁记录层，非磁性中间层和软磁记录层，并分成相互分开的多个区域; 以及设置在垂直磁记录层上的保护层。 硬磁记录层具有指向硬磁记录层的堆叠方向的容易的磁化轴。 非磁性中间层包含C，ZnO，Si，Ti，Ta或W的碳化物和Si，Ti，Ta或W的氮化物中的一种。
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8.发明申请公开(公告)号：US20120276414A1
公开(公告)日：2012-11-01
申请号：US13350652
申请日：2012-01-13
申请人： Tomoyuki MAEDA , Yousuke ISOWAKI , Akira WATANABE , Akihiko TAKEO
发明人： Tomoyuki MAEDA , Yousuke ISOWAKI , Akira WATANABE , Akihiko TAKEO
IPC分类号： G11B5/66
CPC分类号： G11B5/746 , G11B5/65 , G11B5/66 , G11B5/7325 , G11B5/855
摘要： According to one embodiment, a perpendicular magnetic recording medium includes a nonmagnetic interlayer formed on a nonmagnetic substrate, an antiferromagnetic layer having a thickness of 2 to 30 nm, a first nonmagnetic underlayer having a thickness of 0.2 to 5 nm, a first bit patterned ferromagnetic layer, a first bit patterned nonmagnetic layer, and a second bit patterned ferromagnetic layer.
摘要翻译： 根据一个实施例，垂直磁记录介质包括形成在非磁性基板上的非磁性中间层，厚度为2至30nm的反铁磁层，厚度为0.2至5nm的第一非磁性底层，第一位图案化铁磁体 层，第一位图案非磁性层和第二位图案化铁磁层。
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