公开(公告)号：US09134634B2

公开(公告)日：2015-09-15

申请号：US13452828

申请日：2012-04-21

申请人： Young Geun Yoon ,  Il Woo Park ,  Yong Hwan Kim ,  Bong Jin Choi

发明人： Young Geun Yoon ,  Il Woo Park ,  Yong Hwan Kim ,  Bong Jin Choi

IPC分类号： G06F19/00 ,  G03F9/00 ,  B65H23/02

CPC分类号： G03F9/7088 ,  B41P2233/52 ,  B65H23/0216 ,  B65H2301/5111 ,  B65H2553/42 ,  B65H2801/61

摘要： A control device for preventing meandering of patterns for use in a patterned film manufacturing device which includes a film transferring equipment and a pattern forming equipment, includes a marking unit that forms markings on a predetermined reference position on the film, a recognizing unit that is located at the rear of the marking unit and recognizes positions of the markings on the film, a computing unit that computes an amount of meandering based on differences between the reference position and the recognized positions of the markings, a control unit that generates a correction signal for correcting positions of the marking unit and the pattern forming equipment corresponding to the computed the amount of meandering, and a correction unit that receives the correction signal and corrects positions of the marking unit and the pattern forming equipment based on the received correction signal.

摘要翻译： 一种用于防止在包括胶片转印设备和图案形成设备的图案化胶片制造装置中使用的图案曲折的控制装置，包括在胶片上的预定基准位置上形成标记的标记单元，位于 在所述标记单元的后部识别所述胶片上的标记的位置，计算单元，其基于所述基准位置与所述识别的识别位置之间的差异来计算曲折量;控制单元，其生成用于 校正与计算出的蜿蜒量对应的标记单元和图案形成设备的位置;以及校正单元，接收校正信号，并且基于接收的校正信号来校正标记单元和图案形成设备的位置。

公开(公告)号：US20110284038A1

公开(公告)日：2011-11-24

申请号：US13012571

申请日：2011-01-24

申请人： In Ho Bang ,  Bum Sun Park ,  Bong Jin Choi

发明人： In Ho Bang ,  Bum Sun Park ,  Bong Jin Choi

IPC分类号： B08B9/00

CPC分类号： B08B3/022 ,  B08B9/00 ,  H01L21/67051 ,  H01L21/6735

摘要： A wafer container cleaning device for cleaning container bodies and container covers of wafer containers includes a housing having a cleaning chamber defined therein, a rotor rotatably installed within the cleaning chamber of the housing, a plurality of container holders mounted to the rotor to removably hold the container bodies and the container covers, and a cleaning solution sprayer nozzle for spraying a cleaning solution toward the container bodies and the container covers held by the container holders. Each of the container holders includes a support tray having a body support portion for supporting each of the container bodies in an upside down state and a cover support portion for supporting each of the container covers.

摘要翻译： 用于清洁容器主体和晶片容器的容器盖的晶片容器清洁装置包括具有限定在其中的清洁室的壳体，可旋转地安装在壳体的清洁室内的转子，多个容器保持器，其安装到转子上以可拆卸地保持 容器主体和容器盖，以及用于将清洁溶液朝向容器保持体保持的容器主体和容器盖喷射的清洁溶液喷雾器喷嘴。 每个容器保持器包括支撑托盘，其具有用于支撑处于倒置状态的每个容器主体的主体支撑部分和用于支撑每个容器盖的盖支撑部分。

公开(公告)号：US08968487B2

公开(公告)日：2015-03-03

申请号：US13012571

申请日：2011-01-24

申请人： In Ho Bang ,  Bum Sun Park ,  Bong Jin Choi

发明人： In Ho Bang ,  Bum Sun Park ,  Bong Jin Choi

IPC分类号： B08B3/02 ,  B08B9/00 ,  H01L21/67 ,  H01L21/673

CPC分类号： B08B3/022 ,  B08B9/00 ,  H01L21/67051 ,  H01L21/6735

摘要： A wafer container cleaning device for cleaning container bodies and container covers of wafer containers includes a housing having a cleaning chamber defined therein, a rotor rotatably installed within the cleaning chamber of the housing, a plurality of container holders mounted to the rotor to removably hold the container bodies and the container covers, and a cleaning solution sprayer nozzle for spraying a cleaning solution toward the container bodies and the container covers held by the container holders. Each of the container holders includes a support tray having a body support portion for supporting each of the container bodies in an upside down state and a cover support portion for supporting each of the container covers.

摘要翻译： 用于清洁容器主体和晶片容器的容器盖的晶片容器清洁装置包括具有限定在其中的清洁室的壳体，可旋转地安装在壳体的清洁室内的转子，多个容器保持器，其安装到转子上以可拆卸地保持 容器主体和容器盖，以及用于将清洁溶液朝向容器保持体保持的容器主体和容器盖喷射的清洁溶液喷雾器喷嘴。 每个容器保持器包括支撑托盘，其具有用于支撑处于倒置状态的每个容器主体的主体支撑部分和用于支撑每个容器盖的盖支撑部分。