公开(公告)号：US20090263230A1

公开(公告)日：2009-10-22

申请号：US12257628

申请日：2008-10-24

申请人： Young Joo HWANG

发明人： Young Joo HWANG

IPC分类号： H01L21/677

CPC分类号： H01L21/67201 ,  H01L21/68742 ,  H01L21/6875

摘要： A cluster apparatus for processing a substrate includes a load-lock chamber to receive a substrate, a transfer chamber adjacent to the load-lock chamber, one or more processing chambers each having a side facing the transfer chamber, and a robot in the transfer chamber to unload the substrate from or load the substrate into at least one of the one or more processing chambers or the load-lock chamber. A rotating stage is included in the load-lock chamber to support and rotate the substrate to a desired orientation.

摘要翻译： 用于处理基板的集群装置包括：接收基板的负载锁定室，与装载锁定室相邻的传送室，各自具有面向传送室的一侧的一个或多个处理室，以及传送室中的机器人 将基板卸载或者将基板装载到一个或多个处理室或装载锁定室中的至少一个中。 旋转台被包括在加载锁定室中以支撑和旋转基板到期望的取向。

公开(公告)号：US20080138535A1

公开(公告)日：2008-06-12

申请号：US11874365

申请日：2007-10-18

申请人： Young Joo HWANG

发明人： Young Joo HWANG

IPC分类号： C23C16/00 ,  H05H1/24

CPC分类号： H01J37/32788 ,  H01J37/3244 ,  H01L21/6831 ,  H01L21/68742

摘要： A substrate damage prevention system and method for a plasma treating apparatus are provided. The system may include a lower electrode on which a substrate may be mounted, an inert gas supply unit which may supply an inert gas to an upper surface of the lower electrode on which the substrate is mounted, and an air supply unit which may supply air to the upper surface of the lower electrode. An inert gas may be supplied between the lower electrode and the substrate in order to control the temperature of the substrate during the chucking. Air may be supplied between the lower electrode and the substrate during dechucking in order to allow the substrate to be easily separated from the lower electrode.

摘要翻译： 提供了一种用于等离子体处理装置的基板损伤预防系统和方法。 该系统可以包括可以在其上安装基板的下电极，可以向安装有基板的下电极的上表面供应惰性气体的惰性气体供应单元和可供应空气的空气供应单元 到下电极的上表面。 可以在下电极和基板之间供应惰性气体，以便在卡盘期间控制基板的温度。 在脱扣时可以在下电极和基板之间供应空气，以便允许基板容易地与下电极分离。

公开(公告)号：US20090025877A1

公开(公告)日：2009-01-29

申请号：US12246563

申请日：2008-10-07

申请人： Gwang Ho HUR ,  Jun Young CHOI ,  Cheol Won LEE ,  Hyun Hwan AHN ,  Young Joo HWANG ,  Chun Sik KIM

发明人： Gwang Ho HUR ,  Jun Young CHOI ,  Cheol Won LEE ,  Hyun Hwan AHN ,  Young Joo HWANG ,  Chun Sik KIM

IPC分类号： H01L21/3065

CPC分类号： H01J37/3244

摘要： Disclosed herein is a flat panel display manufacturing apparatus in a predetermined process is performed using plasma generated therein. In such a flat panel display manufacturing apparatus, a process gas is supplied into a chamber in an evenly diffused state to generate even plasma inside a symmetrical interior space of the chamber. Consequently, the flat panel display manufacturing apparatus can appropriately control flow rate of the plasma, thereby being capable of performing even processing on a large-scale substrate. In the flat panel display manufacturing apparatus, a substrate pedestal thereof is provided with a combination of vertical and horizontal shielding members, thereby being entirely protected from attack of the plasma, resulting in an increased life-span.

摘要翻译： 这里公开了使用其中产生的等离子体进行预定处理的平板显示器制造装置。 在这种平板显示器制造装置中，处理气体以均匀扩散的状态供应到室中，以在室的对称内部空间内产生均匀的等离子体。 因此，平板显示器制造装置可以适当地控制等离子体的流量，从而能够对大规模基板进行均匀的处理。 在平板显示器制造装置中，其基板基座设置有垂直和水平屏蔽构件的组合，从而完全防止等离子体的侵蚀，从而延长使用寿命。