Method for manufacturing metallic microstructure
    1.
    发明申请
    Method for manufacturing metallic microstructure 审中-公开
    制造金属微观结构的方法

    公开(公告)号:US20060228489A1

    公开(公告)日:2006-10-12

    申请号:US11246174

    申请日:2005-10-11

    IPC分类号: B05D1/18 B05D3/02

    摘要: The present invention discloses a method for forming a metallic microstructure on a patterned surface of a substrate by a nonisothermal deposition (NTID) in an electroless plating solution. The substrate is immersed in the solution being heated by a heating device mounted on a bottom of an electroless plating reactor while the heated solution being cooled by a cooling device provided in the reactor, and thus a seed layer is formed the patterned surface of the substrate. The substrate is then immersed in an electroless plating solution with a back surface of the substrate lying on the bottom of the reactor, so that the exposed seed layer is thickened to form the metallic microstructure.

    摘要翻译: 本发明公开了一种在化学镀溶液中通过非等温沉积(NTID)在衬底的图案化表面上形成金属微结构的方法。 将衬底浸入被安装在化学镀电镀反应器底部的加热装置加热的溶液中,同时通过设置在反应器中的冷却装置冷却加热的溶液,从而种子层形成衬底的图案化表面 。 然后将衬底浸入无碱电解溶液中,其中衬底的背面位于反应器的底部,使得暴露的种子层变厚以形成金属微结构。

    Method for preparing copper interconnectors of an ULSI
    2.
    发明申请
    Method for preparing copper interconnectors of an ULSI 审中-公开
    制造ULSI铜连接器的方法

    公开(公告)号:US20060228488A1

    公开(公告)日:2006-10-12

    申请号:US11171215

    申请日:2005-07-01

    IPC分类号: B05D1/18 B05D5/12 B05D3/02

    摘要: A method for depositing a copper layer on a substrate is disclosed. The method is achieved by heating a plating solution located between a heating device and a target substrate. Through the process illustrated above, metal nano-particles come out from the plating solution and deposit on a substrate with high aspect ratio. Surfactant can be selectively added for obtaining ultra-thin continuous film, void-free copper connectors. Furthermore, a copper film would achieve a preferred (111) crystallization orientation.

    摘要翻译: 公开了一种在衬底上沉积铜层的方法。 该方法通过加热位于加热装置和靶基板之间的电镀液来实现。 通过上述过程,金属纳米粒子从电镀液中出来,沉积在具有高纵横比的基底上。 可以选择性地添加表面活性剂以获得超薄连续膜,无空隙的铜连接器。 此外,铜膜将获得优选的(111)结晶取向。

    Method for metallizing surfaces of substrates
    3.
    发明授权
    Method for metallizing surfaces of substrates 失效
    金属化基板表面的方法

    公开(公告)号:US06773760B1

    公开(公告)日:2004-08-10

    申请号:US10423935

    申请日:2003-04-28

    IPC分类号: B05D310

    摘要: A method for metallizing a surface of substrates is disclosed. Particularly, nonhomogeneous heating deposition occurs by setting the surface and the heater in an electroless plating reactor at different temperatures. Moreover, an adjustable gap is defined between the substrate being metalized and heating source board. The deposit can securely adhere to the surface of the substrate for gap creates and activates metallic nanoparticles, which possess higher activity and bonding strength to the surface. Accordingly, metallization of the surface of the substrate can be easily achieved without using precious metals and carcinogenic materials.

    摘要翻译: 公开了一种金属化基片表面的方法。 特别地,通过将​​表面和加热器设置在不同温度下的化学镀电镀反应器中,发生非均匀的加热沉积。 此外,在金属化的基板和加热源板之间限定可调节的间隙。 沉积物可以牢固地粘附到基底的表面上,用于间隙产生并激活金属纳米颗粒,其对表面具有更高的活性和结合强度。 因此,可以容易地实现基板的表面的金属化,而不使用贵金属和致癌材料。

    Process for preparing a nano-carbon material field emission cathode plate
    4.
    发明申请
    Process for preparing a nano-carbon material field emission cathode plate 审中-公开
    制备纳米碳材料场发射阴极板的方法

    公开(公告)号:US20080248430A1

    公开(公告)日:2008-10-09

    申请号:US11826791

    申请日:2007-07-18

    IPC分类号: B05D5/12 C23C14/34 G03F7/20

    摘要: A nano-carbon material field emission cathode plate is prepared by an oxidation-reduction reaction, which includes immersing a substrate having a first metal layer thereon in a solution of a second metal salt with a nano-carbon material dispersed therein. A difference between the two standard redox potentials of the first metal and the second metal is so great that ions of the second metal in the solution are reduced to elemental metal while the first metal is oxidized, and thus a layer of the second metal is formed on the first metal layer with the nano-carbon material partially embedded in the second metal layer.

    摘要翻译: 通过氧化还原反应制备纳米碳材料场致发射阴极板,其包括将其上具有第一金属层的基板浸渍在第二金属盐与分散在其中的纳米碳材料的溶液中。 第一金属和第二金属的两种标准氧化还原电位之间的差异非常大,使得第一金属被氧化时溶液中的第二金属的离子被还原为元素金属,因此形成第二金属层 在第一金属层上,其中纳米碳材料部分地嵌入第二金属层。