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公开(公告)号：US4933715A
公开(公告)日：1990-06-12
申请号：US301366
申请日：1989-01-25
申请人： Yuichi Yamada , Naoki Ayata , Hiroki Suzukawa , Hideki Nogawa
发明人： Yuichi Yamada , Naoki Ayata , Hiroki Suzukawa , Hideki Nogawa
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68
CPC分类号： G03F9/70
摘要： A mark detecting method and device suitably applicable to the alignment of a reticle in a semiconductor device manufacturing exposure apparatus, called a stepper, is disclosed. A mark is provided by repeated patterns having specific pitches. These patterns are set so that at least one pitch of the patterns differs, on a light-receiving surface of an image sensor which receives an image of the mark, from a multiple, by an integral number, of the sampling pitch (pitch of picture elements) of the image sensor. In one preferred form, the mark is formed by repeated patterns of a number N (.gtoreq.2), wherein at least one pitch Pp of the patterns satisfies, on the light-receiving surface of the image sensor, a relationship Pp=(m+n/N).times.Pix where m is an arbitrary number, n is an integral number which satisfies 1.ltoreq.n.ltoreq.N, and Pix is the sampling pitch of the image sensor. The image of such a mark is photoelectrically converted to thereby determine the position of the mark. With the proposed concept, any error which might be caused upon quantization of the mark image by the picture elements of the image sensor can be canceled or compensated at the time of calculation of the mark center. Therefore, the precision of the mark center detection can be improved.
摘要翻译： 公开了适用于半导体装置制造用曝光装置（称为步进机）中的掩模版的取向的标记检测方法和装置。 通过具有特定间距的重复图案提供标记。 这些图案被设置为使得图案的至少一个间距在从接收标记的图像的图像传感器的光接收表面上的不同之处，取决于采样间距（图像的间距） 元素）。 在一个优选形式中，标记由数目N（> / = 2）的重复图案形成，其中图案的至少一个间距Pp在图像传感器的光接收表面上满足关系Pp =（ m + n / N）xPix其中m是任意数，n是满足1≤n≤N的整数，并且Pix是图像传感器的采样间距。 这样的标记的图像被光电转换，从而确定标记的位置。 利用所提出的概念，可以在计算标记中心时消除或补偿由图像传感器的图像元素对标记图像进行量化时可能引起的任何错误。 因此，可以提高标记中心检测的精度。
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公开(公告)号：US4962423A
公开(公告)日：1990-10-09
申请号：US301367
申请日：1989-01-25
申请人： Yuichi Yamada , Naoki Ayata , Hiroki Suzukawa , Hideki Nogawa
发明人： Yuichi Yamada , Naoki Ayata , Hiroki Suzukawa , Hideki Nogawa
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/68
CPC分类号： G03F9/70
摘要： Mark detecting method and apparatus usable, for example, in a semiconductor exposure apparatus such as a stepper for printing a pattern of a reticle upon a semiconductor wafer, for detecting, by using an image sensor, an alignment mark provided on a reticle or wafer for alignment of the same. Plural search marks are provided two-dimensionally around the alignment mark, each search mark having a first pattern and one or more second patterns indicative of the position of the alignment mark. When at least one first pattern of the search mark is caught by an image pickup device, the reticle is displaced in accordance with the positional information as indicated by the second pattern of the search mark. This brings the alignment mark within the image pickup region of the image sensor. The alignment mark is subsequenlty used to accurately align the reticle with a predetermined position. Thus, the time required for completing the reticle alignment can be reduced remarkably.
摘要翻译： 标记检测方法和装置，例如可用于半导体曝光装置，例如用于在半导体晶片上印刷掩模版图案的步进器，用于通过使用图像传感器检测设置在掩模版或晶片上的对准标记 对齐一样。 多个搜索标记在对准标记周围二维地设置，每个搜索标记具有第一图案和指示对准标记的位置的一个或多个第二图案。 当搜索标记的至少一个第一图案被图像拾取装置捕获时，根据搜索标记的第二图案所示的位置信息来移动掩模版。 这使得图像传感器的图像拾取区域内的对准标记。 对准标记是用于将掩模版准确地对准预定位置的子序列。 因此，完成掩模版校准所需的时间可以显着降低。
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公开(公告)号：US08248584B2
公开(公告)日：2012-08-21
申请号：US12395487
申请日：2009-02-27
申请人： Masataro Shiroiwa , Hiroki Suzukawa
发明人： Masataro Shiroiwa , Hiroki Suzukawa
CPC分类号： G03F7/7085 , G03B27/42 , G03F7/70525 , G03F7/7075 , G03F7/70991 , G03F9/7003
摘要： An apparatus comprises a grouping unit dividing substrates into groups, and determining reference and non-reference substrates for each group, a measurement unit measuring a first number of points for the reference substrate, and measuring a second number, smaller than the first number, of points for the non-reference substrate, a correction value determining unit determining a first correction value to position the reference substrate, and a second correction value to position the non-reference substrate, and an exposure unit exposing the reference substrate by positioning it based on the first correction value, and exposing the non-reference substrate by positioning it based on the second correction value, the correction value determining unit determining the first correction value based on the measurement of the reference substrate, and determining the second correction value based on the measurement of the non-reference substrate, and the measurement of the reference substrate or the first correction value.
摘要翻译： 一种设备包括分组单元，将基板分成组，并且为每个组确定参考和非参考基板;测量单元，测量参考基板的第一数量的点，并测量小于第一数量的第二数量 用于非参考基板的点，校正值确定单元确定用于定位参考基板的第一校正值，以及第二校正值以定位非参考基板;以及曝光单元，其基于 所述第一校正值，并且通过基于所述第二校正值对所述非参考衬底进行定位来曝光所述非参考衬底，所述校正值确定单元基于所述参考衬底的测量来确定所述第一校正值，并且基于所述第二校正值 非参考基板的测量以及参考基板或t的测量 他第一次修正值。
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公开(公告)号：US20120274916A1
公开(公告)日：2012-11-01
申请号：US13544790
申请日：2012-07-09
申请人： Masataro Shiroiwa , Hiroki Suzukawa
发明人： Masataro Shiroiwa , Hiroki Suzukawa
CPC分类号： G03F7/7085 , G03B27/42 , G03F7/70525 , G03F7/7075 , G03F7/70991 , G03F9/7003
摘要： An apparatus comprises a grouping unit dividing substrates into groups, and determining reference and non-reference substrates for each group, a measurement unit measuring a first number of points for the reference substrate, and measuring a second number, smaller than the first number, of points for the non-reference substrate, a correction value determining unit determining a first correction value to position the reference substrate, and a second correction value to position the non-reference substrate, and an exposure unit exposing the reference substrate by positioning it based on the first correction value, and exposing the non-reference substrate by positioning it based on the second correction value, the correction value determining unit determining the first correction value based on the measurement of the reference substrate, and determining the second correction value based on the measurement of the non-reference substrate, and the measurement of the reference substrate or the first correction value.
摘要翻译： 一种设备包括分组单元，将基板分成组，并且为每个组确定参考和非参考基板;测量单元，测量参考基板的第一数量的点，并测量小于第一数量的第二数量 用于非参考基板的点，校正值确定单元确定用于定位参考基板的第一校正值，以及第二校正值以定位非参考基板;以及曝光单元，其基于 所述第一校正值，并且通过基于所述第二校正值对所述非参考衬底进行定位来曝光所述非参考衬底，所述校正值确定单元基于所述参考衬底的测量来确定所述第一校正值，并且基于所述第二校正值 非参考基板的测量以及参考基板或t的测量 他第一次修正值。
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公开(公告)号：US20090225292A1
公开(公告)日：2009-09-10
申请号：US12395487
申请日：2009-02-27
申请人： Masataro Shiroiwa , Hiroki Suzukawa
发明人： Masataro Shiroiwa , Hiroki Suzukawa
CPC分类号： G03F7/7085 , G03B27/42 , G03F7/70525 , G03F7/7075 , G03F7/70991 , G03F9/7003
摘要： An apparatus comprises a grouping unit dividing substrates into groups, and determining reference and non-reference substrates for each group, a measurement unit measuring a first number of points for the reference substrate, and measuring a second number, smaller than the first number, of points for the non-reference substrate, a correction value determining unit determining a first correction value to position the reference substrate, and a second correction value to position the non-reference substrate, and an exposure unit exposing the reference substrate by positioning it based on the first correction value, and exposing the non-reference substrate by positioning it based on the second correction value, the correction value determining unit determining the first correction value based on the measurement of the reference substrate, and determining the second correction value based on the measurement of the non-reference substrate, and the measurement of the reference substrate or the first correction value.
摘要翻译： 一种设备包括分组单元，将基板分成组，并且为每个组确定参考和非参考基板;测量单元，测量参考基板的第一数量的点，并测量小于第一数量的第二数量 用于非参考基板的点，校正值确定单元确定用于定位参考基板的第一校正值，以及第二校正值以定位非参考基板;以及曝光单元，其基于 所述第一校正值，并且通过基于所述第二校正值对所述非参考衬底进行定位来曝光所述非参考衬底，所述校正值确定单元基于所述参考衬底的测量来确定所述第一校正值，并且基于所述第二校正值 非参考基板的测量以及参考基板或t的测量 他第一次修正值。
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公开(公告)号：US06784974B1
公开(公告)日：2004-08-31
申请号：US09668064
申请日：2000-09-25
申请人： Hiroki Suzukawa
发明人： Hiroki Suzukawa
IPC分类号： G03B2742
CPC分类号： G03F9/7003 , G03F9/7034
摘要： An exposure method and an exposure apparatus in which one or more plural sample shot processes are made to a substrate and an exposure process is made to the substrate after completion of the sample shot process or processes. The procedure includes a first determining step for determining the processing order in a first sample shot process, of the plural sample shot processes, and a second determining step for determining the processing order in a second sample shot process to be made after the first sample shot process. In at least one of the first and second determining steps, the determination is made under a condition that an interval between a shot to be processed last in the first sample shot process and a shot to be processed first in the second sample shot process is shortened.
摘要翻译： 一种曝光方法和曝光装置，其中在样品射出处理或处理完成之后，对基板进行一次或多次多次样品投射处理并进行曝光处理。 该程序包括：第一确定步骤，用于确定多个采样拍摄处理中的第一采样拍摄处理中的处理顺序;以及第二确定步骤，用于确定在第一次采样拍摄之后进行的第二次采样拍摄处理中的处理顺序 处理。 在第一判定步骤和第二判定步骤中的至少一个中，判定是在第一取样拍摄处理中的最后处理的拍摄时刻与第二拍摄拍摄处理中的处理的拍摄之间的间隔缩短的情况下进行的 。
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公开(公告)号：US06499007B1
公开(公告)日：2002-12-24
申请号：US09351902
申请日：1999-07-14
IPC分类号： G06F945
CPC分类号： G03F7/70525
摘要： In editing of a job parameter in a semiconductor exposure apparatus controlled by the job parameter, which is a collection of parameters, a first parameter set independent of the model of the semiconductor exposure apparatus and a second parameter set dependent upon the model are edited and saved independently. This makes it possible to improve operability of parameter editing and management in the semiconductor exposure apparatus, ease of maintenance thereof and the ability to use job parameters among various models of apparatus.
摘要翻译： 在由作为参数的集合的作业参数控制的半导体曝光装置中的作业参数的编辑中，编辑并保存与半导体曝光装置的模型无关的第一参数集和依赖于模型的第二参数集 独立。 这使得可以提高半导体曝光装置中的参数编辑和管理的可操作性，易于维护以及在各种型号的装置中使用作业参数的能力。
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