SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    1.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    基板加工装置及制造半导体装置的方法

    公开(公告)号:US20110170989A1

    公开(公告)日:2011-07-14

    申请号:US13004495

    申请日:2011-01-11

    IPC分类号: H01L21/673

    CPC分类号: H01L21/67109

    摘要: Provided is a substrate processing apparatus suppressing the vibration of a cover in an initial stage of unloading a boat from a process pipe. The substrate processing apparatus comprises: a boat for placing a substrate; a process pipe receiving the boat; a cover on which the boat is placed, the cover opening and closing a furnace port installed on a lower end of the process pipe; an elevation mechanism moving the cover upward and downward; a motor driving the elevation mechanism; a sealing member sealing a space between the cover and a lower end surface of the process pipe; and a controller controlling torque of the motor such that the substrate is maintained a rest position within the boat in a deformation recovery period of the cover occurring when the sealing member is removed from a surface of the cover or the lower end surface of the process pipe.

    摘要翻译: 提供一种在从处理管卸载船的初始阶段抑制盖的振动的基板处理装置。 基板处理装置包括:用于放置基板的船; 接收船的加工管; 其上放置船的盖,盖打开和关闭安装在处理管的下端的炉口; 升降机构向上和向下移动盖子; 驱动升降机构的电机; 密封构件,其密封所述盖和所述处理管的下端面之间的空间; 以及控制器,其控制所述马达的扭矩,使得当所述密封构件从所述盖的表面或所述处理管的下端表面移除时,在所述盖的变形恢复期间,所述基板保持在所述船内的静止位置 。

    SUBSTRATE PROCESSING APPARATUS AND METHOD OF DISPLAYING ABNORMAL STATE OF SUBSTRATE PROCESSING APPARATUS
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS AND METHOD OF DISPLAYING ABNORMAL STATE OF SUBSTRATE PROCESSING APPARATUS 有权
    基板加工装置及显示基板加工装置异常状态的方法

    公开(公告)号:US20100211216A1

    公开(公告)日:2010-08-19

    申请号:US12704910

    申请日:2010-02-12

    申请人: Osamu MORITA

    发明人: Osamu MORITA

    IPC分类号: H01L21/677

    摘要: Provided are a substrate processing apparatus and a method of displaying an abnormal state of the substrate processing apparatus. The substrate processing apparatus comprising: a manipulation unit comprising a manipulation screen displaying a state of at least one of a substrate carrying mechanism and a substrate processing mechanism; and a control unit comprising a carrying system controller controlling the substrate carrying mechanism. The manipulation unit comprises a setting screen through which detection conditions of sensors configured to detect states of the substrate carrying mechanism and the substrate processing mechanism, and information about a torque limitation including the enabling or disabling of the torque control and a torque control value are set for the substrate carrying mechanism. The carrying system controller assigns a motion of the substrate carrying mechanism to a carrying control module based on an instruction from the manipulation unit, and the carrying control module controls the substrate carrying mechanism according to the instruction and the information.

    摘要翻译: 提供了一种基板处理装置和显示基板处理装置的异常状态的方法。 该基板处理装置包括:操作单元,包括显示基板输送机构和基板处理机构中的至少一个的状态的操作画面; 以及控制单元,其包括控制所述基板承载机构的承载系统控制器。 操作单元包括设定画面,通过该设定画面设定检测基板搬送机构的状态的传感器和基板处理机构的检测条件,以及关于包含使能或禁止转矩控制的转矩限制以及转矩控制值的信息 用于基板承载机构。 承载系统控制器基于来自操作单元的指令将基板承载机构的运动分配到承载控制模块,并且承载控制模块根据指示和信息来控制基板承载机构。

    SUBSTRATE PROCESSING APPARATUS, METHOD OF DISPLAYING ERROR OF SUBSTRATE PROCESSING APPARATUS AND TRANSFER CONTROL METHOD
    3.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, METHOD OF DISPLAYING ERROR OF SUBSTRATE PROCESSING APPARATUS AND TRANSFER CONTROL METHOD 有权
    基板处理装置,显示基板处理装置的错误的方法和传送控制方法

    公开(公告)号:US20110160900A1

    公开(公告)日:2011-06-30

    申请号:US12976108

    申请日:2010-12-22

    申请人: Osamu MORITA

    发明人: Osamu MORITA

    IPC分类号: G06F7/00 H01L21/677

    摘要: A substrate processing apparatus capable of easily checking a state of a transfer mechanism when an error occurs and readily determining a cause of the error is provided. The substrate processing apparatus includes at least one sensor provided in a transfer mechanism for transferring a substrate, a transfer control module for receiving sensing data transmitted by the at least one sensor, a transfer system controller for controlling the transfer control module, and a manipulation unit at least including a display unit for displaying a state of the transfer mechanism based on the sensed data. Therefore, when an error occurs, at least the sensed data transmitted by the at least one sensor is displayed on the display unit.

    摘要翻译: 提供了一种能够容易地在发生错误时检查传送机构的状态并容易地确定错误原因的基板处理装置。 基板处理装置包括设置在传送机构中的至少一个传感器,用于传送基板;传送控制模块,用于接收由至少一个传感器发送的传感数据;传送系统控制器,用于控制传送控制模块;以及操纵单元 至少包括用于基于所感测的数据显示传送机构的状态的显示单元。 因此,当发生错误时,至少一个传感器发送的感测数据至少显示在显示单元上。

    ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
    4.
    发明申请
    ANTENNA, DIELECTRIC WINDOW, PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD 有权
    天线,电介质窗,等离子体加工设备和等离子体处理方法

    公开(公告)号:US20130008607A1

    公开(公告)日:2013-01-10

    申请号:US13541940

    申请日:2012-07-05

    IPC分类号: H01Q13/10 B05C11/00

    CPC分类号: H01J37/32238

    摘要: An antenna, a dielectric window, a plasma processing apparatus and a plasma processing method are capable of improving uniformity of a substrate surface processing amount in the surface of the substrate. The antenna includes the dielectric window 16; and a slot plate 20, provided on one side of the dielectric window 16, having a plurality of slots 133. The dielectric window 16 has a flat surface 146 surrounded by a ring-shaped first recess; and a plurality of second recesses 153 formed on the flat surface 146 so as to surround a center of the flat surface 146. Here, the flat surface 146 is formed on the other side of the dielectric window 16. When viewed from a thickness direction of the slot plate, a center of each second recess 153 is located within each slot 133 of the slot plate.

    摘要翻译: 天线,电介质窗,等离子体处理装置和等离子体处理方法能够提高基板表面的基板表面处理量的均匀性。 天线包括电介质窗16; 以及设置在电介质窗口16的一侧上的槽板20,具有多个狭槽133.介电窗口16具有由环形的第一凹部包围的平坦表面146; 以及形成在平坦表面146上以围绕平坦表面146的中心的多个第二凹部153.这里,平坦表面146形成在电介质窗口16的另一侧。当从厚度方向 槽板,每个第二凹槽153的中心位于槽板的每个槽133内。

    FIXING DEVICE AND IMAGE FORMING DEVICE
    5.
    发明申请
    FIXING DEVICE AND IMAGE FORMING DEVICE 失效
    固定装置和图像形成装置

    公开(公告)号:US20110033197A1

    公开(公告)日:2011-02-10

    申请号:US12849287

    申请日:2010-08-03

    申请人: Osamu MORITA

    发明人: Osamu MORITA

    IPC分类号: G03G15/20

    CPC分类号: G03G15/2039

    摘要: A fixing device including a heating roller; a pressure roller forming a nip section by making contact with the heating roller; a controller for controlling the surface temperature of the heating roller so that it becomes a predetermined set temperature; an amount of decrease detector for detecting an amount of decrease in the surface temperature of the pressure roller between before and after the passing of the paper sheet through the nip section; a determiner for specifying a required temperature required to perform the fixing for the paper sheet on the basis of the amount of decrease and for determining whether the set temperature is acceptable as the required temperature; and a temperature compensator for correcting the set temperature so that the set temperature is acceptable as the required temperature in the case that the determiner has determined that the set temperature is not acceptable as the required temperature.

    摘要翻译: 一种包括加热辊的定影装置; 压辊,通过与加热辊接触而形成压区部; 用于控制加热辊的表面温度使其变为预定设定温度的控制器; 用于检测纸张通过辊隙部分之前和之后压力辊表面温度降低量的减少量检测器; 确定器,用于根据减少量来确定执行纸张的固定所需的温度,并确定设定温度是否可接受为所需温度; 以及用于校正设定温度的温度补偿器,使得在确定器已经确定设定温度不能接受作为所需温度的情况下,设定温度作为所需温度可接受。