公开(公告)号：US20130008607A1

公开(公告)日：2013-01-10

申请号：US13541940

申请日：2012-07-05

申请人： Naoki MATSUMOTO ,  Wataru YOSHIKAWA ,  Jun YOSHIKAWA ,  Kazuki MOYAMA ,  Kiyotaka ISHIBASHI ,  Osamu MORITA ,  Takehiro TANIKAWA

发明人： Naoki MATSUMOTO ,  Wataru YOSHIKAWA ,  Jun YOSHIKAWA ,  Kazuki MOYAMA ,  Kiyotaka ISHIBASHI ,  Osamu MORITA ,  Takehiro TANIKAWA

IPC分类号： H01Q13/10 ,  B05C11/00

CPC分类号： H01J37/32238

摘要： An antenna, a dielectric window, a plasma processing apparatus and a plasma processing method are capable of improving uniformity of a substrate surface processing amount in the surface of the substrate. The antenna includes the dielectric window 16; and a slot plate 20, provided on one side of the dielectric window 16, having a plurality of slots 133. The dielectric window 16 has a flat surface 146 surrounded by a ring-shaped first recess; and a plurality of second recesses 153 formed on the flat surface 146 so as to surround a center of the flat surface 146. Here, the flat surface 146 is formed on the other side of the dielectric window 16. When viewed from a thickness direction of the slot plate, a center of each second recess 153 is located within each slot 133 of the slot plate.

摘要翻译： 天线，电介质窗，等离子体处理装置和等离子体处理方法能够提高基板表面的基板表面处理量的均匀性。 天线包括电介质窗16; 以及设置在电介质窗口16的一侧上的槽板20，具有多个狭槽133.介电窗口16具有由环形的第一凹部包围的平坦表面146; 以及形成在平坦表面146上以围绕平坦表面146的中心的多个第二凹部153.这里，平坦表面146形成在电介质窗口16的另一侧。当从厚度方向 槽板，每个第二凹槽153的中心位于槽板的每个槽133内。

公开(公告)号：US20110048642A1

公开(公告)日：2011-03-03

申请号：US12862915

申请日：2010-08-25

申请人： Naoki MIHARA ,  Naoki MATSUMOTO ,  Jun YOSHIKAWA ,  Kazuo MURAKAMI

发明人： Naoki MIHARA ,  Naoki MATSUMOTO ,  Jun YOSHIKAWA ,  Kazuo MURAKAMI

IPC分类号： H01L21/465

CPC分类号： H01J37/32192 ,  C23C16/513 ,  H01J37/3244 ,  H01J37/32449

摘要： In a plasma processing apparatus for processing a substrate by plasmatizing a process gas introduced into a processing container, an introducing unit which introduces the process gas is formed on a ceiling surface of the processing container; a gas retention portion which gathers the process gas supplied from the outside of the processing container through a supply passage, and a plurality of gas ejection holes which allow communication between the gas retention portion and the inside of the processing container are formed in the introducing unit; a gas ejection hole is not formed in a location of the gas retention portion that faces an opening of the supply passage; and a cross section of each of the gas ejection holes has a flat shape.

摘要翻译： 在通过对引入到处理容器中的处理气体进行等离子体处理衬底的等离子体处理装置中，在处理容器的顶表面上形成引入处理气体的引入单元; 气体保持部，其通过供给通路收集从处理容器的外部供给的处理气体，并且在导入单元中形成有能够使气体保持部与处理容器内部连通的多个气体喷出孔 ; 在气体保持部的与供给通道的开口相对的位置处不形成气体喷出孔; 并且每个气体喷射孔的横截面具有扁平形状。

公开(公告)号：US20120213999A1

公开(公告)日：2012-08-23

申请号：US13204495

申请日：2011-08-05

申请人： Katsuki IDE ,  Tsuyoshi NOMA ,  Kazutaka KOJO ,  Tetsuya MINE ,  Masao KON ,  Jun YOSHIKAWA

发明人： Katsuki IDE ,  Tsuyoshi NOMA ,  Kazutaka KOJO ,  Tetsuya MINE ,  Masao KON ,  Jun YOSHIKAWA

IPC分类号： D01F9/12 ,  B82Y40/00 ,  B82Y30/00

CPC分类号： B82Y30/00 ,  B82Y40/00 ,  D01F9/133 ,  Y10T428/298

摘要： According to one embodiment, there is provided a graphite nano-carbon fiber provided by using an apparatus having a reactor capable of keeping a reducing atmosphere inside thereof, a metal substrate arranged as a catalyst in the reactor, a heater heating the metal substrate, a hydrocarbon source supplying hydrocarbon to the reactor, a scraper scraping carbon fibers produced on the metal substrate, a recovery container recovering the scraped carbon fibers, and an exhaust pump discharging exhaust gas from the reactor. The carbon fibers are linear carbon fibers with a diameter of 80 to 470 nm formed with layers of graphenes stacked in a longitudinal direction.

摘要翻译： 根据一个实施方案，提供一种石墨纳米碳纤维，其通过使用具有能够保持其内部还原气氛的反应器的装置，在反应器中作为催化剂排列的金属基材，加热金属基材的加热器， 向反应器供应烃的烃源，在金属基底上产生的刮擦碳纤维的刮刀，回收刮去的碳纤维的回收容器以及从反应器排出废气的排气泵。 碳纤维是直径为80至470nm的直线碳纤维，其形成有沿纵向层叠的石墨烯层。