-
公开(公告)号:US20060122728A1
公开(公告)日:2006-06-08
申请号:US11001767
申请日:2004-12-02
申请人: Yung-Chih Chang , Cheng-I Sun , Chun-I Kuo , Fu-Kun Yeh , Hsueh-Chi Shen
发明人: Yung-Chih Chang , Cheng-I Sun , Chun-I Kuo , Fu-Kun Yeh , Hsueh-Chi Shen
IPC分类号: G06F19/00
CPC分类号: G05B17/02 , H01L21/67248
摘要: A thermal process system. The thermal process system comprises a thermal processor, a metrology tool, and a controller. The thermal processor performs a thermal process as defined by a heating model to form a film on a wafer surface. The metrology tool, interfaced with the thermal processor, inspects thickness of the film. The controller, coupled with the thermal processor and the metrology tool, generates the heating model of the thermal processor and calibrates the heating model according to a preset slope coefficient matrix and the measured thickness.
摘要翻译: 热处理系统。 热处理系统包括热处理器,计量工具和控制器。 热处理器执行由加热模型定义的热处理,以在晶片表面上形成膜。 与热处理器接口的计量工具检查胶片的厚度。 控制器与热处理器和计量工具相结合,产生热处理器的加热模型,并根据预设的斜率系数矩阵和测量厚度校准加热模型。
-
公开(公告)号:US07751908B2
公开(公告)日:2010-07-06
申请号:US11001767
申请日:2004-12-02
申请人: Yung-Chih Chang , Cheng-I Sun , Chun-I Kuo , Fu-Kun Yeh , Hsueh-Chi Shen
发明人: Yung-Chih Chang , Cheng-I Sun , Chun-I Kuo , Fu-Kun Yeh , Hsueh-Chi Shen
CPC分类号: G05B17/02 , H01L21/67248
摘要: A thermal process system. The thermal process system comprises a thermal processor, a metrology tool, and a controller. The thermal processor performs a thermal process as defined by a heating model to form a film on a wafer surface. The metrology tool, interfaced with the thermal processor, inspects thickness of the film. The controller, coupled with the thermal processor and the metrology tool, generates the heating model of the thermal processor and calibrates the heating model according to a preset slope coefficient matrix and the measured thickness.
摘要翻译: 热处理系统。 热处理系统包括热处理器,计量工具和控制器。 热处理器执行由加热模型定义的热处理,以在晶片表面上形成膜。 与热处理器接口的计量工具检查胶片的厚度。 控制器与热处理器和计量工具相结合,产生热处理器的加热模型,并根据预设的斜率系数矩阵和测量厚度校准加热模型。
-
公开(公告)号:US06898471B1
公开(公告)日:2005-05-24
申请号:US10749698
申请日:2003-12-31
申请人: Cheng-I Sun , Yu Pen Fun , Yi-Chuan Lo , Wei-Hsuang Huang , Hsiang-Ming Lin
发明人: Cheng-I Sun , Yu Pen Fun , Yi-Chuan Lo , Wei-Hsuang Huang , Hsiang-Ming Lin
IPC分类号: G05B19/418 , G06F19/00
CPC分类号: G05B19/41865 , G05B2219/32097 , G05B2219/32182 , G05B2219/45031 , Y02P90/20 , Y02P90/22
摘要: A multiple run by run process is described. A plurality of tools and a plurality of products to be run on the tools are provided. A desired recipe is calculated for each product on each tool based on a previous recipe used for each product on each tool and deviation of a parameter from a target value. Thereafter, the plurality of products is run on the plurality of tools. The desired recipe is updated after each run of each tool.
摘要翻译: 描述了运行过程的多次运行。 提供要在工具上运行的多个工具和多个产品。 基于每个工具上每个产品使用的先前配方以及参数与目标值的偏差,为每个工具上的每个产品计算所需的配方。 此后,多个产品在多个工具上运行。 每次运行每个工具后,更新所需的配方。
-
公开(公告)号:US06893882B2
公开(公告)日:2005-05-17
申请号:US10313501
申请日:2002-12-06
申请人: Cheng-I Sun , Ben Fung , Yi-Chuan Lo , Wei-Hsuang Huang , Hsiang-Min Lin
发明人: Cheng-I Sun , Ben Fung , Yi-Chuan Lo , Wei-Hsuang Huang , Hsiang-Min Lin
CPC分类号: G03F7/70533 , G03F7/70625 , H01L22/20
摘要: A multiple run by run process is described. A plurality of tools and a plurality of products to be run on the tools are provided. Tool effects and product effects on a parameter are identified for each tool and each product. A desired recipe is calculated for each product on each tool based on the tool effects and product effects identified. Thereafter, the plurality of products is run on the plurality of tools. The desired recipe is updated after each run of each tool. Tool aging is calculated after each run of each tool based on the desired recipe used.
摘要翻译: 描述了运行过程的多次运行。 提供要在工具上运行的多个工具和多个产品。 针对每个工具和每个产品都会识别参数的刀具效应和产品效果。 基于所确定的工具效应和产品效应,为每个工具上的每个产品计算所需的配方。 此后,多个产品在多个工具上运行。 每次运行每个工具后,更新所需的配方。 根据所使用的所需配方,在每个工具运行后计算刀具老化。
-
-
-