公开(公告)号：US06893882B2

公开(公告)日：2005-05-17

申请号：US10313501

申请日：2002-12-06

申请人： Cheng-I Sun ,  Ben Fung ,  Yi-Chuan Lo ,  Wei-Hsuang Huang ,  Hsiang-Min Lin

发明人： Cheng-I Sun ,  Ben Fung ,  Yi-Chuan Lo ,  Wei-Hsuang Huang ,  Hsiang-Min Lin

IPC分类号： G03F7/20 ,  H01L21/66

CPC分类号： G03F7/70533 ,  G03F7/70625 ,  H01L22/20

摘要： A multiple run by run process is described. A plurality of tools and a plurality of products to be run on the tools are provided. Tool effects and product effects on a parameter are identified for each tool and each product. A desired recipe is calculated for each product on each tool based on the tool effects and product effects identified. Thereafter, the plurality of products is run on the plurality of tools. The desired recipe is updated after each run of each tool. Tool aging is calculated after each run of each tool based on the desired recipe used.

摘要翻译： 描述了运行过程的多次运行。 提供要在工具上运行的多个工具和多个产品。 针对每个工具和每个产品都会识别参数的刀具效应和产品效果。 基于所确定的工具效应和产品效应，为每个工具上的每个产品计算所需的配方。 此后，多个产品在多个工具上运行。 每次运行每个工具后，更新所需的配方。 根据所使用的所需配方，在每个工具运行后计算刀具老化。

公开(公告)号：US06898471B1

公开(公告)日：2005-05-24

申请号：US10749698

申请日：2003-12-31

申请人： Cheng-I Sun ,  Yu Pen Fun ,  Yi-Chuan Lo ,  Wei-Hsuang Huang ,  Hsiang-Ming Lin

发明人： Cheng-I Sun ,  Yu Pen Fun ,  Yi-Chuan Lo ,  Wei-Hsuang Huang ,  Hsiang-Ming Lin

IPC分类号： G05B19/418 ,  G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/32097 ,  G05B2219/32182 ,  G05B2219/45031 ,  Y02P90/20 ,  Y02P90/22

摘要： A multiple run by run process is described. A plurality of tools and a plurality of products to be run on the tools are provided. A desired recipe is calculated for each product on each tool based on a previous recipe used for each product on each tool and deviation of a parameter from a target value. Thereafter, the plurality of products is run on the plurality of tools. The desired recipe is updated after each run of each tool.

摘要翻译： 描述了运行过程的多次运行。 提供要在工具上运行的多个工具和多个产品。 基于每个工具上每个产品使用的先前配方以及参数与目标值的偏差，为每个工具上的每个产品计算所需的配方。 此后，多个产品在多个工具上运行。 每次运行每个工具后，更新所需的配方。

公开(公告)号：US08361830B2

公开(公告)日：2013-01-29

申请号：US12757228

申请日：2010-04-09

申请人： Chuan-Hui Yang ,  Hsin-Chang Hsiung ,  Yi-Chuan Lo ,  Han-Yi Kuo

发明人： Chuan-Hui Yang ,  Hsin-Chang Hsiung ,  Yi-Chuan Lo ,  Han-Yi Kuo

IPC分类号： H01L21/00

CPC分类号： H04N5/2254 ,  H04N5/2257

摘要： An image sensor module having a light gathering region and a light non-gathering region includes an image sensor, a light blocking spacer, a lens layer and a fixing shell. The light blocking spacer is disposed on the image sensor and located in the light non-gathering region. The light blocking spacer has a through hole exposing a portion of the image sensor in the light gathering region. The lens layer is disposed on the light blocking spacer and covers the through hole. The lens layer includes a transparent substrate and a lens disposed on the transparent substrate and located in the light gathering region. The fixing shell located in the light non-gathering region wraps the sidewalls of the image sensor, the light blocking spacer and the lens layer continuously. The material of the fixing shell includes a thermosetting material. A method for manufacturing the image sensor module is also provided.

摘要翻译： 具有聚光区域和光非聚集区域的图像传感器模块包括图像传感器，遮光间隔物，透镜层和固定壳体。 遮光间隔件设置在图像传感器上并且位于光非聚集区域中。 遮光间隔物具有在光聚集区域中暴露图像传感器的一部分的通孔。 透镜层设置在遮光隔离物上并覆盖通孔。 透镜层包括透明基板和设置在透明基板上并位于聚光区域中的透镜。 位于光非聚集区域中的固定壳体连续地包裹图像传感器的侧壁，遮光间隔物和透镜层。 固定壳的材料包括热固性材料。 还提供了一种用于制造图像传感器模块的方法。

公开(公告)号：US20060228865A1

公开(公告)日：2006-10-12

申请号：US11193126

申请日：2005-07-29

申请人： Shui-Tien Lin ,  Shin-Rung Lu ,  Yi-Chuan Lo

发明人： Shui-Tien Lin ,  Shin-Rung Lu ,  Yi-Chuan Lo

IPC分类号： H01L21/76

CPC分类号： G03F7/70558 ,  G03F7/70533 ,  G03F7/70541

摘要： A method for photolithography in semiconductor device manufacturing comprises defining test critical dimension target for a photolithography mask, measuring a mask critical dimension, comparing mask critical dimension to the test critical dimension target and determining a critical dimension deviation, determining a photolithography light base energy in response to the critical dimension deviation, and exposing the wafer according to the photolithography light base energy.

摘要翻译： 半导体器件制造中的光刻方法包括定义光刻掩模的测试临界尺寸目标，测量掩模临界尺寸，将掩模临界尺寸与测试临界尺寸目标进行比较并确定临界尺寸偏差，确定响应中的光刻光源能量 到临界尺寸偏差，并且根据光刻光基能量暴露晶片。

公开(公告)号：US09117714B2

公开(公告)日：2015-08-25

申请号：US11976058

申请日：2007-10-19

申请人： Fu-Tien Weng ,  Yung-Shun Liao ,  Yi-Chuan Lo ,  Bii-Cheng Chang

发明人： Fu-Tien Weng ,  Yung-Shun Liao ,  Yi-Chuan Lo ,  Bii-Cheng Chang

IPC分类号： H01L27/00 ,  H01L27/146 ,  H01L23/10

CPC分类号： H01L27/14618 ,  H01L23/10 ,  H01L27/14683 ,  H01L2924/0002 ,  H01L2924/00

摘要： An exemplary wafer level package comprises a semiconductor wafer with a plurality of semiconductor chips of perfect polygonal shapes thereon. A circuit-free area is defined over the semiconductor wafer to electrically isolate the semiconductor chips. A dam structure is substantially formed over the circuit-free area, wherein a portion of the dam structure formed around an edge of the semiconductor wafer is formed with a plurality via holes therein. A transparent substrate is formed over the semiconductor wafer, defining a plurality of cavities between the semiconductor chips and the transparent substrate, wherein the transparent substrate is supported by the dam structure.

公开(公告)号：US07385596B2

公开(公告)日：2008-06-10

申请号：US11014179

申请日：2004-12-17

申请人： Shui-Yuan Lin ,  Yi-Chuan Lo ,  Chih-Kuang Chiang

发明人： Shui-Yuan Lin ,  Yi-Chuan Lo ,  Chih-Kuang Chiang

IPC分类号： G06F3/033

CPC分类号： G06F1/1613 ,  G06F2200/1632

摘要： In a stylus attachment structure for an IT product, the attachment structure formed on an IT product, such as, a laptop, a tablet PC and a PDA, comprises an attachment slot, a push-out member, a retaining member and an elastic part, wherein the push-out member is arranged in the attachment slot and the retaining member is slidably mounted at one end of the attachment slot for selectively retaining or releasing the stylus. In this way, when the stylus is not in use for a while, it can be obliquely plugged to one end of the attachment slot, it is easy for the user to pick up the stylus; alternatively, the stylus can be fully received in the attachment socket and further secured in place with a retaining member, thereby enabling the stylus to be attached properly so that it doesn't become loose.

摘要翻译： 在IT产品的触针附接结构中，形成在诸如膝上型计算机，平板PC和PDA的IT产品上的附接结构包括附接槽，推出构件，保持构件和弹性部分 其中所述推出构件布置在所述附接槽中，并且所述保持构件可滑动地安装在所述附接槽的一端，以选择性地保持或释放所述触针。 以这种方式，当笔不被使用一段时间时，它可以倾斜地插入到附接槽的一端，用户很容易拿起触针; 或者，触针可以完全容纳在附接插座中并且用固定构件进一步固定在适当的位置，从而能够使触针适当地附接，使得不会变得松动。

公开(公告)号：US06865438B1

公开(公告)日：2005-03-08

申请号：US10261301

申请日：2002-09-30

申请人： Shui-Tien Lin ,  Yi-Chuan Lo ,  Jimmy Hu ,  Chen-Yu Chang

发明人： Shui-Tien Lin ,  Yi-Chuan Lo ,  Jimmy Hu ,  Chen-Yu Chang

IPC分类号： G05B19/418 ,  G06F19/00

CPC分类号： G05B19/41865 ,  G05B2219/31265 ,  G05B2219/32076 ,  G05B2219/32297 ,  G05B2219/45031 ,  Y02P90/20

摘要： An advanced process control method using time interval between lots of a particular product to control the weighting of feedback data is described. A plurality of products are fabricated wherein the products are tracked by the process control method based on product type, for example. Variation in a parameter is detected. The adjustment speed of a process recipe is determined based on a time interval weighting wherein the time interval is defined as the time between processing of lots of the same product type. The process recipe is updated at the determined adjustment speed to decrease variation of the parameter.

摘要翻译： 描述了使用特定产品的批次之间的时间间隔来控制反馈数据的加权的高级过程控制方法。 制造多个产品，其中例如通过基于产品类型的过程控制方法跟踪产品。 检测到参数的变化。 基于时间间隔加权确定处理配方的调整速度，其中将时间间隔定义为处理相同产品类型的批次之间的时间。 以确定的调整速度更新过程配方，以减少参数的变化。

公开(公告)号：US06723168B2

公开(公告)日：2004-04-20

申请号：US09885715

申请日：2001-06-20

申请人： Yao-Hwan Kao ,  Yi-Chuan Lo

发明人： Yao-Hwan Kao ,  Yi-Chuan Lo

IPC分类号： B05C500

CPC分类号： H01L21/6715 ,  G03F7/162

摘要： A spin-coater for coating a liquid material on a wafer that is equipped with a self-cleaning coating cup and a method for self-cleaning a spin-coater are described. The spin-coater is constructed of a coating cup of circular shape, a wafer pedestal situated in the cup, a coating material dispensing nozzle over the pedestal, a motor means for rotating the pedestal, and a solvent dispensing means that is mounted juxtaposed to an upper rim of the sidewall of the cup for dispensing a cleaning solvent onto an interior surface of the sidewall to dissolve and rinse off any liquid coating material splattered thereon and to prevent the formation of solid contamination from the solidified coating material.

摘要翻译： 描述了用于在配备有自清洁涂层杯的晶片上涂覆液体材料的旋涂机和自清洁旋转涂布机的方法。 旋转涂布机由圆形的涂层杯，位于杯中的晶片基座，基座上的涂料分配喷嘴，用于旋转基座的马达装置，以及溶解剂分配装置构成，其与 杯的侧壁的上边缘，用于将清洁溶剂分配到侧壁的内表面上，以溶解和冲洗喷溅在其上的任何液体涂料并防止固化的涂层材料形成固体污染物。

公开(公告)号：US20060133015A1

公开(公告)日：2006-06-22

申请号：US11014179

申请日：2004-12-17

申请人： Shui-Yuan Lin ,  Yi-Chuan Lo ,  Chih-Kuang Chiang

发明人： Shui-Yuan Lin ,  Yi-Chuan Lo ,  Chih-Kuang Chiang

IPC分类号： G06F1/16 ,  G06F3/033 ,  G09G5/00 ,  H05K5/00 ,  H05K7/00 ,  G06K11/06 ,  G08C21/00

CPC分类号： G06F1/1613 ,  G06F2200/1632

摘要： In a stylus attachment structure for an IT product, the attachment structure formed on an IT product, such as, a laptop, a tablet PC and a PDA, comprises an attachment slot, a push-out member, a retaining member and an elastic part, wherein the push-out member is arranged in the attachment slot and the retaining member is slidably mounted at one end of the attachment slot for selectively retaining or releasing the stylus. In this way, when the stylus is not in use for a while, it can be obliquely plugged to one end of the attachment slot, it is easy for the user to pick up the stylus; alternatively, the stylus can be fully received in the attachment socket and further secured in place with a retaining member, thereby enabling the stylus to be attached properly so that it doesn't become loose.

摘要翻译： 在IT产品的触针附接结构中，形成在诸如膝上型计算机，平板PC和PDA的IT产品上的附接结构包括附接槽，推出构件，保持构件和弹性部分 其中所述推出构件布置在所述附接槽中，并且所述保持构件可滑动地安装在所述附接槽的一端，以选择性地保持或释放所述触针。 以这种方式，当笔不被使用一段时间时，它可以倾斜地插入到附接槽的一端，用户很容易拿起触针; 或者，触针可以完全容纳在附接插座中并且用固定构件进一步固定在适当的位置，从而能够使触针适当地附接，使得它不会松动。

公开(公告)号：US6043864A

公开(公告)日：2000-03-28

申请号：US263542

申请日：1999-03-08

申请人： Yi-Chuan Lo ,  Chih-hsiung Lee

发明人： Yi-Chuan Lo ,  Chih-hsiung Lee

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70541 ,  G03F9/7046

摘要： An method and apparatus for aligning a mask to a wafer for photolithographic processing steps which does not use optical alignment. Each wafer is provided a unique identification code, such as a bar code. As wafers are processed through photolithographic steps where optical detection of an alignment mark can be easily accomplished the alignment data for each wafer is stored in a memory unit. At the next photolithographic step a detector reads the identification code and identifies the wafer being processed. The wafer identification is fed to a data processing unit which retrieves the alignment data for that wafer fro the memory unit. The data processing unit then feed alignment data to a mechanical controller which positions the wafer relative to the mask image being used in the photolithographic step.

摘要翻译： 一种用于将掩模与用于不使用光学对准的光刻处理步骤的晶片对准的方法和装置。 每个晶片都提供了唯一的识别码，如条形码。 当通过光刻步骤处理晶片时，可以容易地实现对准标记的光学检测，每个晶片的对准数据被存储在存储器单元中。 在下一个光刻步骤中，检测器读取识别码并识别正在处理的晶片。 晶片识别被馈送到数据处理单元，该数据处理单元从存储器单元检索该晶片的对准数据。 数据处理单元然后将对准数据馈送到机械控制器，该机械控制器相对于在光刻步骤中使用的掩模图像定位晶片。