公开(公告)号：US08962650B2

公开(公告)日：2015-02-24

申请号：US14002018

申请日：2012-04-16

申请人： Yusuke Narita ,  Junji Matsui ,  Yasuhiro Funahashi

发明人： Yusuke Narita ,  Junji Matsui ,  Yasuhiro Funahashi

IPC分类号： A61K31/437 ,  A61K31/4353 ,  A61K31/47 ,  C07D215/48

CPC分类号： A61K31/47 ,  A61K31/437 ,  C07D215/48 ,  A61K2300/00

摘要： A therapeutic agent for tumor for combined use of a compound or pharmaceutically acceptable salt thereof represented by Formula (I) and a compound represented by Formula (II): wherein R1 is C1-6 alkyl or C3-8 cycloalkyl, R2 is a hydrogen atom or C1-6 alkoxy, and R3 is a hydrogen atom or a halogen atom, exhibits an excellent antitumor effect compared to cases where these are individually used.

摘要翻译： 用于组合使用由式（I）表示的化合物或其药学上可接受的盐和由式（II）表示的化合物的肿瘤治疗剂：其中R 1是C 1-6烷基或C 3-8环烷基，R 2是氢原子 或C 1-6烷氧基，并且R 3为氢原子或卤素原子，与单独使用它们的情况相比表现出优异的抗肿瘤效果。

公开(公告)号：US20140031384A1

公开(公告)日：2014-01-30

申请号：US14002018

申请日：2012-04-16

申请人： Yusuke Narita ,  Junji Matsui ,  Yasuhiro Funahashi

发明人： Yusuke Narita ,  Junji Matsui ,  Yasuhiro Funahashi

IPC分类号： A61K31/47 ,  A61K31/437

CPC分类号： A61K31/47 ,  A61K31/437 ,  C07D215/48 ,  A61K2300/00

摘要： A therapeutic agent for tumor for combined use of a compound or pharmaceutically acceptable salt thereof represented by Formula (I) and a compound represented by Formula (II): wherein R1 is C1-6 alkyl or C3-8 cycloalkyl, R2 is a hydrogen atom or C1-6 alkoxy, and R3 is a hydrogen atom or a halogen atom, exhibits an excellent antitumor effect compared to cases where these are individually used.

摘要翻译： 用于组合使用由式（I）表示的化合物或其药学上可接受的盐和由式（II）表示的化合物的肿瘤治疗剂：其中R 1是C 1-6烷基或C 3-8环烷基，R 2是氢原子 或C 1-6烷氧基，并且R 3为氢原子或卤素原子，与单独使用它们的情况相比表现出优异的抗肿瘤效果。

公开(公告)号：US06610987B2

公开(公告)日：2003-08-26

申请号：US10081179

申请日：2002-02-25

申请人： Yoshihiro Kimura ,  Ko Hisamoto ,  Takaharu Sugiura ,  Yusuke Narita

发明人： Yoshihiro Kimura ,  Ko Hisamoto ,  Takaharu Sugiura ,  Yusuke Narita

IPC分类号： H01J3708

CPC分类号： H01J37/3053 ,  H01J2237/0041

摘要： In order to suppress quick potential change on the surface of a process target when the shutter plate is opened and closed, when an ion beam IB from the ion source 10 is irradiated on a substrate 38 and the ion beam IB is neutralized by using neutralizing electrons e− generated by a microwave neutralizer 14, the shutter plate 62 shields the substrate 38 before and after the milling processing of the substrate 38, and the voltage of a power supply 34 is lowered when the shutter plate 62 is opened and closed so as to limit the amount of ion beam IB irradiation, thereby suppressing charge-up on the surface of the substrate 38.