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    Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target
    3.
    发明授权
    Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target 失效
    用于光学信息记录介质的半反射膜和反射膜，光学信息记录介质和溅射靶

    公开(公告)号：US07507458B2

    公开(公告)日：2009-03-24

    申请号：US11168497

    申请日：2005-06-29

    申请人： Katsutoshi Takagi ,  Yuuki Tauchi ,  Junichi Nakai

    发明人： Katsutoshi Takagi ,  Yuuki Tauchi ,  Junichi Nakai

    IPC分类号： B32B3/02

    CPC分类号： C22C5/06 ,  C23C14/205 ,  C23C14/3414 ,  G11B7/24038 ,  G11B7/258 ,  G11B7/259 ,  G11B7/266 ,  Y10T428/21

    摘要： Each of a semi-reflective film or reflective film for an optical information recording medium, and a Ag based alloy sputtering target includes a Ag based alloy containing 0.01 to 10 atomic percent of Li. The Ag based alloy exhibits high cohesion resistance, high light resistance, high heat resistance, high reflectivity, high transmissivity, low absorptivity, and high thermal conductivity of the level which had not been realized by the pure Ag or by the conventional Ag alloys. The resulting semi-reflective film and reflective film for an optical information recording medium containing the Ag based alloy exhibit excellent writing/reading properties and long term reliability. The sputtering target for an optical information recording medium is used in depositing the semi-reflective film and the reflective film. Using the semi-reflective film and/or the reflective film, an optical information recording medium is manufactured.

    摘要翻译： 用于光学信息记录介质的半反射膜或反射膜以及Ag基合金溅射靶包括含有0.01至10原子％的Li的Ag基合金。 Ag基合金表现出较高的内聚力，高耐光性，高耐热性，高反射率，高透射率，低吸收率和高纯度Ag或常规Ag合金所未能达到的高导热率。 所得的用于含有Ag基合金的光学信息记录介质的半反射膜和反射膜表现出优异的书写/读取性能和长期可靠性。 用于光学信息记录介质的溅射靶用于沉积半反射膜和反射膜。 使用半反射膜和/或反射膜，制造光学信息记录介质。

    Reflective Ag alloy film for reflectors and reflector provided with the same
    5.
    发明授权
    Reflective Ag alloy film for reflectors and reflector provided with the same 有权
    用于反射镜和反光镜的反射Ag合金薄膜

    公开(公告)号：US07203003B2

    公开(公告)日：2007-04-10

    申请号：US10870996

    申请日：2004-06-21

    申请人： Junichi Nakai ,  Toshiki Sato ,  Katsutoshi Takagi ,  Yuuki Tauchi

    发明人： Junichi Nakai ,  Toshiki Sato ,  Katsutoshi Takagi ,  Yuuki Tauchi

    IPC分类号： G02B1/10

    CPC分类号： G02B5/0858 ,  B60R1/08 ,  G02B5/08 ,  Y10S359/90

    摘要： A reflective Ag alloy film includes a Ag—Bi alloy thin film, and a Bi layer and/or a Bi oxide layer formed on the surface and/or between the Ag—Bi alloy thin film and another layer formed on the Ag—Bi alloy thin film. The thickness of the Bi layer and/or the Bi oxide layer is 2.0 nm or below. The Ag—Bi alloy thin film of the reflective Ag alloy film has a Bi content in the range of 0.01 to 3.0 at %. A reflector is formed by depositing the Ag—Bi alloy thin film on a base member.

    摘要翻译： 反应性Ag合金膜包括Ag-Bi合金薄膜，在Ag-Bi合金薄膜和形成在Ag-Bi合金上的另一层之间的表面上和/或之间形成的Bi层和/或Bi氧化物层 薄膜。 Bi层和/或Bi氧化物层的厚度为2.0nm以下。 反应性Ag合金膜的Ag-Bi合金薄膜的Bi含量为0.01〜3.0原子％。 通过将Ag-Bi合金薄膜沉积在基底构件上形成反射体。

    Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording
    6.
    发明申请
    Aluminum-alloy reflection film for optical information-recording, optical information-recording medium, and aluminum-alloy sputtering target for formation of the aluminum-alloy reflection film for optical information-recording 审中-公开
    用于光学信息记录的铝合金反射膜，光学信息记录介质和用于形成用于光学信息记录的铝合金反射膜的铝合金溅射靶

    公开(公告)号：US20050112019A1

    公开(公告)日：2005-05-26

    申请号：US10971142

    申请日：2004-10-25

    申请人： Junichi Nakai ,  Yuuki Tauchi ,  Katsutoshi Takagi

    发明人： Junichi Nakai ,  Yuuki Tauchi ,  Katsutoshi Takagi

    IPC分类号： C23C14/14 ,  C23C14/34 ,  G11B7/258 ,  C22C21/00

    CPC分类号： G11B7/258 ,  C23C14/14 ,  C23C14/3414 ,  G11B7/2585

    摘要： There are provided an aluminum-alloy reflection film for optical information-recording, having low thermal conductivity, low melting temperature, and high corrosion resistance, capable of coping with laser marking, an optical information-recording medium comprising the reflection film described, and an aluminum-alloy sputtering target for formation of the reflection film described. The invention includes (1) an aluminum-alloy reflection film for optical information-recording, containing an element Al as the main constituent, 1.0 to 10.0 at. % of at least one element selected from the group of rare earth elements, and 0.5 to 5.0 at. % of at least one element selected from the group consisting of elements Cr, Ta, Ti, Mo, V, W, Zr, Hf, Nb, and Ni, (2) an optical information-recording medium comprising any of the aluminum-alloy reflection films described as above, and (3) a sputtering target having the same composition as that for any of the aluminum-alloy reflection films described as above.

    摘要翻译： 提供了一种用于光学信息记录的铝合金反射膜，具有低热导率，低熔点温度和高耐腐蚀性，能够应对激光打标，包括所述反射膜的光学信息记录介质和 用于形成所述反射膜的铝合金溅射靶。 本发明包括（1）含有元素Al作为主要成分的用于光学信息记录的铝合金反射膜，1.0至10.0at。 ％的至少一种选自稀土元素的元素，和0.5至5.0at。 选自由元素Cr，Ta，Ti，Mo，V，W，Zr，Hf，Nb和Ni组成的组中的至少一种元素的％，（2）光学信息记录介质，其包含任何铝合金 如上所述的反射膜，以及（3）与上述铝合金反射膜相同组成的溅射靶。

    AG base sputtering target and process for producing the same
    7.
    发明授权
    AG base sputtering target and process for producing the same 有权
    AG基溅射靶及其制造方法

    公开(公告)号：US08123875B2

    公开(公告)日：2012-02-28

    申请号：US12793257

    申请日：2010-06-03

    申请人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Hitoshi Matsuzaki ,  Hideo Fujii

    发明人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi ,  Hitoshi Matsuzaki ,  Hideo Fujii

    IPC分类号： C23C14/34

    CPC分类号： C22C5/06 ,  C22F1/14 ,  C23C14/3414

    摘要： An Ag sputtering target 6 has three-dimensional fluctuation of grain sizes of not more than 18%. The fluctuation is determined by exposing plural sputtering surfaces by slicing the sputtering target 6 in planes to initial sputtering surface, selecting plural locations on each of the exposed sputtering surfaces, calculating values A1 and B1 using the formula below, and selecting larger one of the values A1 and B1 as the three-dimensional fluctuation of the grain sizes. A1=(Dmax−Dave)/Dave×100(%) B1=(Dave

    摘要翻译： Ag溅射靶6具有不大于18％的晶粒尺寸的三维波动。 通过将溅射靶6在平面内切割成初始溅射表面，在每个暴露的溅射表面上选择多个位置，使用下面的公式计算值A1和B1，并且选择较大值之一来确定多个溅射表面的波动 A1和B1作为晶粒尺寸的三维波动。 A1 =（Dmax-Dave）/ Dave×100（％）B1 =（Dave

    Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target
    8.
    发明授权
    Semi-reflective film and reflective film for optical information recording medium, optical information recording medium, and sputtering target 有权
    用于光学信息记录介质的半反射膜和反射膜，光学信息记录介质和溅射靶

    公开(公告)号：US07704581B2

    公开(公告)日：2010-04-27

    申请号：US11103615

    申请日：2005-04-12

    申请人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi

    发明人： Katsutoshi Takagi ,  Junichi Nakai ,  Yuuki Tauchi

    IPC分类号： B32B3/02

    CPC分类号： G11B7/258 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  Y10T428/21

    摘要： The present invention has been completed in view of such situation, and an object of the present invention is to find a Ag based alloy which exhibits high cohesion resistance, high light resistance, high heat resistance, high reflectivity, high transmissivity, low absorptivity, and high thermal conductivity of the level which had not been realized by the pure Ag or by the conventional Ag alloys, and on the bases of such alloy, to provide a semi-reflective film and a reflective film for an optical information recording medium provided with excellent writing/reading properties and long term reliability; sputtering target for an optical information recording medium used in depositing such semi-reflective film and the reflective film; and an optical information recording medium provided with such semi-reflective film or the reflective film.A semi-reflective film or reflective film for an optical information recording medium comprising a Ag based alloy, wherein the Ag based alloy comprises 0.005 to 0.40% (at % unless otherwise noted) of Bi and 0.05 to 5% in total of at least one element selected from Zn, Al, Ga, In, Si, Ge, and Sn.

    摘要翻译： 发明内容本发明是鉴于这种情况而完成的，其目的在于找到具有高内聚力，高耐光性，高耐热性，高反射率，高透射率，低吸收率的Ag系合金，以及 通过纯Ag或常规Ag合金未实现的水平的高导热性，并且在这种合金的基础上，提供半反射膜和用于光学信息记录介质的反射膜，其提供优异的光学信息记录介质 写/读性能和长期可靠性; 用于沉积这种半反射膜和反射膜的光学信息记录介质的溅射靶; 以及设置有这种半反射膜或反射膜的光学信息记录介质。 一种用于光学信息记录介质的半反射膜或反射膜，其包括Ag基合金，其中所述Ag基合金包含Bi的0.005至0.40％（除非另有说明）为0.005至0.40％，并且总共为至少一种为0.05至5％ 元素选自Zn，Al，Ga，In，Si，Ge和Sn。

    Reflective Ag alloy film for reflectors and reflector provided with the same
    9.
    发明授权
    Reflective Ag alloy film for reflectors and reflector provided with the same 有权
    用于反射镜和反光镜的反射Ag合金薄膜

    公开(公告)号：US07452604B2

    公开(公告)日：2008-11-18

    申请号：US10871493

    申请日：2004-06-21

    申请人： Katsutoshi Takagi ,  Toshiki Sato ,  Junichi Nakai ,  Yuuki Tauchi

    发明人： Katsutoshi Takagi ,  Toshiki Sato ,  Junichi Nakai ,  Yuuki Tauchi

    IPC分类号： B32B9/00

    CPC分类号： C23C14/024 ,  C23C14/185 ,  C23C14/3414 ,  C23C14/541 ,  G02B5/08 ,  Y10T428/12472 ,  Y10T428/12993

    摘要： A reflective Ag alloy film for reflectors, which has excellent surface flatness and shows high reflectivity even under a heating environment and a reflector.The reflective Ag alloy film for reflectors has an average surface roughness of 2.0 nm or less and contains a rare earth element (such as Nd) in a content in the range of 0.1 to 3.0 at %, or further at least one selected from Au, Pd, Cu and Pt in a content in the range of 0.5 to 5.0 at %. The reflector comprises the above reflective Ag alloy film formed on a substrate.

    摘要翻译： 用于反射器的反射型Ag合金膜，即使在加热环境下也具有优异的表面平坦度并显示高反射率和反射器。 反射器用反射型Ag合金膜的平均表面粗糙度为2.0nm以下，含有0.1〜3.0原子％的含量的稀土类元素（Nd），还含有选自Au， Pd，Cu和Pt的含量范围为0.5-5.0at％。 反射器包括形成在基板上的上述反射Ag合金膜。