公开(公告)号：US07928384B2

公开(公告)日：2011-04-19

申请号：US12222577

申请日：2008-08-12

申请人： Zhaohui Cheng ,  Tasuku Yano ,  Seiko Omori

发明人： Zhaohui Cheng ,  Tasuku Yano ,  Seiko Omori

IPC分类号： G01N23/00

CPC分类号： G01N23/04

摘要： A charged particle beam device including a function for measuring localized static charges on a sample. A primary charged particle beam scans a sample positioned in a mirror state to acquire an image. The acquired image may be an image of the sample or may be an image of a structural component in the charged particle optical system. The acquired image is compared with a standard sample image and the localized static charge is measured.

摘要翻译： 一种带电粒子束装置，包括用于测量样品上的局部静电荷的功能。 初级带电粒子束扫描以镜像状态定位的样本以获取图像。 所获取的图像可以是样本的图像，或者可以是带电粒子光学系统中的结构成分的图像。 将获取的图像与标准样品图像进行比较，并测量局部静电荷。

公开(公告)号：US20090057557A1

公开(公告)日：2009-03-05

申请号：US12222577

申请日：2008-08-12

申请人： Zhaohui Cheng ,  Tasuku Yano ,  Seiko Omori

发明人： Zhaohui Cheng ,  Tasuku Yano ,  Seiko Omori

IPC分类号： G01N23/00

CPC分类号： G01N23/04

摘要： A charged particle beam device including a function for measuring localized static charges on a sample. A primary charged particle beam scans a sample positioned in a mirror state to acquire an image. The acquired image may be an image of the sample or may be an image of a structural component in the charged particle optical system. The acquired image is compared with a standard sample image and the localized static charge is measured.

摘要翻译： 一种带电粒子束装置，包括用于测量样品上的局部静电荷的功能。 初级带电粒子束扫描以镜像状态定位的样本以获取图像。 所获取的图像可以是样本的图像，或者可以是带电粒子光学系统中的结构成分的图像。 将获取的图像与标准样品图像进行比较，并测量局部静电荷。

公开(公告)号：US07714288B2

公开(公告)日：2010-05-11

申请号：US12149218

申请日：2008-04-29

申请人： Tasuku Yano ,  Zhaohui Cheng ,  Takashi Furukawa ,  Osamu Nasu

发明人： Tasuku Yano ,  Zhaohui Cheng ,  Takashi Furukawa ,  Osamu Nasu

IPC分类号： G21K7/00 ,  G21G5/00 ,  G01N23/00 ,  H01J3/14

CPC分类号： G01N23/225 ,  H01J37/026 ,  H01J37/248 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/28

摘要： Electrification affected on a surface of a sample which is caused by irradiation of a primary charged particle beam is prevented when plural frames are integrated to obtain an image of a predetermined area of the sample in a charged particle beam apparatus. The predetermined area of the sample is scanned with a primary electron beam from an electron gun, and plural frames are generated and integrated while detecting generated secondary electrons with a detector to obtain the image of the predetermined area. If it is determined by a detection signal of the detector that an electrification amount at the predetermined area becomes a specified value when generating plural frames, an electricity removal voltage is applied to a boosting electrode to remove or reduce the electrification, prior to generation of the next frame. Accordingly, the signal-to-noise ratio of the image obtained by integrating plural frames can be improved.

摘要翻译： 当多个帧被一体化以防止在带电粒子束装置中的样品的预定区域的图像时，防止了由一次带电粒子束的照射引起的样品表面影响的电气化。 用来自电子枪的一次电子束扫描样品的预定区域，并且用检测器检测产生的二次电子并产生并整合多个帧以获得预定区域的图像。 如果通过检测器的检测信号确定当产生多个帧时，预定区域的通电量变为规定值，则在生成多个帧之前将电去除电压施加到升压电极以去除或减少通电， 下一帧。 因此，可以提高通过对多个帧进行积分而获得的图像的信噪比。

公开(公告)号：US20080277583A1

公开(公告)日：2008-11-13

申请号：US12149218

申请日：2008-04-29

申请人： Tasuku Yano ,  Zhaohui Cheng ,  Takashi Furukawa ,  Osamu Nasu

发明人： Tasuku Yano ,  Zhaohui Cheng ,  Takashi Furukawa ,  Osamu Nasu

IPC分类号： G01N23/00

CPC分类号： G01N23/225 ,  H01J37/026 ,  H01J37/248 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/004 ,  H01J2237/28

摘要： Electrification affected on a surface of a sample which is caused by irradiation of a primary charged particle beam is prevented when plural frames are integrated to obtain an image of a predetermined area of the sample in a charged particle beam apparatus. The predetermined area of the sample is scanned with a primary electron beam from an electron gun, and plural frames are generated and integrated while detecting generated secondary electrons with a detector to obtain the image of the predetermined area. If it is determined by a detection signal of the detector that an electrification amount at the predetermined area becomes a specified value when generating plural frames, an electricity removal voltage is applied to a boosting electrode to remove or reduce the electrification, prior to generation of the next frame. Accordingly, the signal-to-noise ratio of the image obtained by integrating plural frames can be improved.

摘要翻译： 当多个帧被一体化以防止在带电粒子束装置中的样品的预定区域的图像时，防止了由一次带电粒子束的照射引起的样品表面影响的电气化。 用来自电子枪的一次电子束扫描样品的预定区域，并且用检测器检测产生的二次电子并产生并整合多个帧以获得预定区域的图像。 如果通过检测器的检测信号确定当产生多个帧时，预定区域的通电量变为规定值，则在生成多个帧之前将电去除电压施加到升压电极以去除或减少通电， 下一帧。 因此，可以提高通过对多个帧进行积分而获得的图像的信噪比。

公开(公告)号：US20130270435A1

公开(公告)日：2013-10-17

申请号：US13879051

申请日：2011-10-05

申请人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Tasuku Yano ,  Muneyuki Fukuda ,  Noritsugu Takahashi

发明人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Tasuku Yano ,  Muneyuki Fukuda ,  Noritsugu Takahashi

IPC分类号： H01J37/02

CPC分类号： H01J37/023 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1534

摘要： The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.

摘要翻译： 电子束装置包括电子源和物镜偏转器。 电子束装置基于通过投射的电子束从材料发射的二次电子等的信号获得图像。 电子束装置还包括偏置色差校正元件，该偏置色差校正元件还包括位于比物镜偏转器更靠近电子源的电磁偏转器和具有比电磁偏转器更窄的内径的静电偏转器， 在电磁偏转器内，使得材料的高度位置与电磁偏转器重叠，并且能够施加偏移电压。 因此，可以提供一种电子束装置，通过该电子束装置可以减轻由偏转引起的几何像差（寄生像差），并且在高分辨率的宽视角上实现偏转。

公开(公告)号：US08735814B2

公开(公告)日：2014-05-27

申请号：US13879051

申请日：2011-10-05

申请人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Tasuku Yano ,  Muneyuki Fukuda ,  Noritsugu Takahashi

发明人： Yasunari Sohda ,  Takeyoshi Ohashi ,  Tasuku Yano ,  Muneyuki Fukuda ,  Noritsugu Takahashi

IPC分类号： G01N23/00 ,  G21K7/00

CPC分类号： H01J37/023 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1534

摘要： The electron beam device includes a source of electrons and an objective deflector. The electron beam device obtains an image on the basis of signals of secondary electrons, etc. which are emitted from a material by an electron beam being projected. The electron beam device further includes a bias chromatic aberration correction element, further including an electromagnetic deflector which is positioned closer to the source of the electrons than the objective deflector, and an electrostatic deflector which has a narrower interior diameter than the electromagnetic deflector, is positioned within the electromagnetic deflector such that the height-wise position from the material overlaps with the electromagnetic deflector, and is capable of applying an offset voltage. It is thus possible to provide an electron beam device with which it is possible to alleviate geometric aberration (parasitic aberration) caused by deflection and implement deflection over a wide field of view with high resolution.

摘要翻译： 电子束装置包括电子源和物镜偏转器。 电子束装置基于通过投射的电子束从材料发射的二次电子等的信号获得图像。 电子束装置还包括偏置色差校正元件，该偏置色差校正元件还包括位于比物镜偏转器更靠近电子源的电磁偏转器和具有比电磁偏转器更窄的内径的静电偏转器， 在电磁偏转器内，使得材料的高度位置与电磁偏转器重叠，并且能够施加偏移电压。 因此，可以提供一种电子束装置，通过该电子束装置可以减轻由偏转引起的几何像差（寄生像差），并且在高分辨率的宽视角上实现偏转。