公开(公告)号：US20230238736A1

公开(公告)日：2023-07-27

申请号：US18122601

申请日：2023-03-16

Applicant: ASML Netherlands B.V.

Inventor： Boudewijn Weijert Herman Jan VAN DER KROON ,  Jurgen VAN SOEST

IPC: H01R13/52 ,  H01J37/248 ,  H01J37/18

CPC classification number: H01R13/5221 ,  H01J37/248 ,  H01J37/18

Abstract: Disclosed herein is a connector for electrically connecting a feedthrough of a vacuum tool to a high voltage power source, the connector comprising: a connector wire assembly configured to be in electrical connection with a high voltage power source; and a connector insulator comprising a channel configured to extend into the connector insulator and to receive a feedthrough pin so as to electrically connect the connector wire assembly with the feedthrough pin; wherein the connector insulator is configured to engage with the feedthrough so that a boundary surface of the connector insulator extends substantially bi-directionally in the direction of the longitudinal axis of the channel.

公开(公告)号：US20180330911A1

公开(公告)日：2018-11-15

申请号：US16036663

申请日：2018-07-16

Applicant: Frederick A. Flitsch

Inventor： Frederick A. Flitsch

IPC: H01J37/06 ,  H01J37/317 ,  H01J37/20 ,  H01J37/08 ,  H01J37/244 ,  H01J9/02

CPC classification number: H01J37/06 ,  G03F7/0002 ,  G03F9/00 ,  H01J9/022 ,  H01J37/08 ,  H01J37/20 ,  H01J37/244 ,  H01J37/248 ,  H01J37/317 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/20 ,  H01J2237/303 ,  H01J2237/304 ,  H01J2237/3174 ,  H01J2237/31759 ,  H01J2237/31798 ,  Y10T29/49004

Abstract: The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.

公开(公告)号：US09911571B2

公开(公告)日：2018-03-06

申请号：US15486880

申请日：2017-04-13

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yosef Basson

IPC: G01F23/00 ,  H01J37/20 ,  H01J37/18 ,  H01J37/248 ,  H01J37/28

CPC classification number: H01J37/20 ,  H01J37/09 ,  H01J37/16 ,  H01J37/18 ,  H01J37/226 ,  H01J37/248 ,  H01J37/28 ,  H01J2237/0206 ,  H01J2237/0262 ,  H01J2237/038 ,  H01J2237/049 ,  H01J2237/20292 ,  H01J2237/2813

Abstract: A high voltage inspection system that includes a vacuum chamber; electron optics that is configured to direct an electron beam towards an upper surface of a substrate; a substrate support module that comprises a chuck and a housing; wherein the chuck is configured to support a substrate; wherein the housing is configured to surround the substrate without masking the electron beam, when the substrate is positioned on the chuck during a first operational mode of the high voltage inspection system; and wherein the substrate, the chuck and the housing are configured to (a) receive a high voltage bias signal of a high voltage level that exceeds ten thousand volts, and (b) to maintain at substantially the high voltage level during the first operational mode of the high voltage inspection system.

公开(公告)号：US09384932B2

公开(公告)日：2016-07-05

申请号：US13881347

申请日：2011-10-27

Applicant: Luke Perkins

Inventor： Luke Perkins

IPC: H01J29/02 ,  H01J3/02 ,  H01J29/48 ,  H01J29/96 ,  H01J31/50 ,  H01J37/248 ,  H05H3/06 ,  H01C3/14 ,  H01C17/065

CPC classification number: H01J29/02 ,  H01C3/14 ,  H01C17/06553 ,  H01J3/027 ,  H01J29/485 ,  H01J29/96 ,  H01J31/50 ,  H01J37/248 ,  H01J2235/02 ,  H05H3/06

Abstract: An annular ceramic washer has inner and outer cylindrical surfaces, first and second annular surfaces, and a winding path thick film resistor located on the inner surface. Metal washers are preferably brazed to the end ring surfaces. The annular ceramic washer is useful in vacuum tube applications in establishing a voltage on a target utilizing the voltage of an electrode coupled to the winding path thick film resistor.

Abstract translation: 环形陶瓷垫圈具有内圆柱形表面和外圆柱形表面，第一和第二环形表面以及位于内表面上的卷绕路径厚膜电阻器。 金属垫圈优选钎焊到端环表面。 环形陶瓷垫圈可用于使用耦合到绕组路径厚膜电阻器的电极的电压来建立目标上的电压的真空管应用中。

公开(公告)号：US09196459B2

公开(公告)日：2015-11-24

申请号：US14669568

申请日：2015-03-26

Applicant: Reno Technologies, Inc.

Inventor： Imran Ahmed Bhutta

IPC: H05H1/46 ,  C23C16/00 ,  H01J37/32 ,  H01J37/248 ,  H01J37/24 ,  H01J37/244 ,  H01L21/67

CPC classification number: H01J37/32183 ,  H01J37/241 ,  H01J37/244 ,  H01J37/248 ,  H01L21/67253 ,  H03H7/40 ,  H03H11/30

Abstract: An RF impedance matching network includes an RF input; an RF output configured to operably couple to a plasma chamber; a series electronically variable capacitor (“series EVC”), the series EVC electrically coupled in series between the RF input and the RF output; and a shunt electronically variable capacitor (“shunt EVC”), the shunt EVC electrically coupled in parallel between a ground and one of the RF input and the RF output; a control circuit to control the series variable capacitance and the shunt variable capacitance, wherein the control circuit is configured to determine the variable plasma impedance of the plasma chamber, determine a series capacitance value and a shunt capacitance value, and generate a control signal to alter at least one of the series variable capacitance and the shunt variable capacitance; wherein the alteration is caused by at least one of a plurality of switching circuits.

Abstract translation: RF阻抗匹配网络包括RF输入; 被配置为可操作地耦合到等离子体室的RF输出; 串联电可变电容器（“EVC”系列），串联EVC串联在RF输入和RF输出之间; 和分流电可变电容器（“并联EVC”），并联电气并联在地与RF输入和RF输出中的一个之间的并联EVC; 用于控制串联可变电容和分流可变电容的控制电路，其中控制电路被配置为确定等离子体室的可变等离子体阻抗，确定串联电容值和并联电容值，并产生控制信号以改变 串联可变电容和分流可变电容中的至少一个; 其中所述改变由多个开关电路中的至少一个引起。

公开(公告)号：US09117630B2

公开(公告)日：2015-08-25

申请号：US14229038

申请日：2014-03-28

Applicant: SEN Corporation

Inventor： Masateru Sato ,  Hiroshi Matsushita

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/248

CPC classification number: H01J37/3171 ,  H01J37/248 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2237/08

Abstract: An insulation structure of high voltage electrodes includes an insulator having an exposed surface and a conductor portion, which includes a joint region in contact with the insulator, and a heat-resistant portion provided, along at least part of an edge of the joint region, in such a manner as to be adjacent to the exposed surface of the insulator. The heat-resistant portion is formed of an electrically conductive material whose melting point is higher than that of the conductor portion. The heat-resistant portion may be so provided as to have a gap between the insulator and the exposed surface.

Abstract translation: 高电压电极的绝缘结构包括具有暴露表面的绝缘体和导体部分，导体部分包括与绝缘体接触的接合区域，以及沿着接合区域的边缘的至少一部分设置的耐热部分， 以与绝缘体的暴露表面相邻的方式。 耐热部由熔点高于导体部的导电性材料形成。 耐热部分可以设置成在绝缘体和暴露表面之间具有间隙。

公开(公告)号：US20140239175A1

公开(公告)日：2014-08-28

申请号：US13779142

申请日：2013-02-27

Applicant: FEI COMPANY

Inventor： Mostafa Maazouz

IPC: H01J3/02 ,  H01J37/04

CPC classification number: H01J37/07 ,  H01J3/026 ,  H01J37/04 ,  H01J37/06 ,  H01J37/10 ,  H01J37/1477 ,  H01J37/21 ,  H01J37/248 ,  H01J37/3056 ,  H01J37/3178 ,  H01J2237/0473 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/1518 ,  H01J2237/1534 ,  H01J2237/28 ,  H01J2237/31749

Abstract: The invention provides a charged particle beam system wherein the middle section of the focused ion beam column is biased to a high negative voltage allowing the beam to move at higher potential than the final beam energy inside that section of the column. At low kV potential, the aberrations and coulomb interactions are reduced, which results in significant improvements in spot size.

Abstract translation: 本发明提供了一种带电粒子束系统，其中聚焦离子束列的中间部分被偏压到高的负电压，允许光束以比该塔的该部分内的最终光束能量更高的电位移动。 在低kV电位下，像差和库仑相互作用减小，这导致光斑尺寸的显着改善。

公开(公告)号：US08759800B2

公开(公告)日：2014-06-24

申请号：US13523169

申请日：2012-06-14

Applicant: Joerg Fober ,  Martin Hugelmann

Inventor： Joerg Fober ,  Martin Hugelmann

IPC: G01R19/00 ,  G01R31/26 ,  G01R31/305

CPC classification number: H01J37/248

Abstract: A high-voltage supply unit is provided for a particle beam device. The high-voltage supply unit includes at least one high-voltage cable for feeding a high voltage, and at least one measuring device for measuring the high voltage. The measuring device has at least one first capacitor, and the first capacitor is formed by at least one first section of the high-voltage cable.

Abstract translation: 为粒子束装置提供高压供应装置。 高压供给单元包括至少一个用于馈送高电压的高压电缆和至少一个用于测量高电压的测量装置。 测量装置具有至少一个第一电容器，并且第一电容器由高压电缆的至少一个第一部分形成。

公开(公告)号：US20130140977A1

公开(公告)日：2013-06-06

申请号：US13812700

申请日：2011-06-15

Applicant: Shunichi Watanabe ,  Takashi Onishi ,  Minoru Kaneda ,  Hisaya Murakoshi

Inventor： Shunichi Watanabe ,  Takashi Onishi ,  Minoru Kaneda ,  Hisaya Murakoshi

IPC: H01J29/48

CPC classification number: H01J29/484 ,  H01J3/02 ,  H01J3/027 ,  H01J3/40 ,  H01J29/488 ,  H01J37/026 ,  H01J37/073 ,  H01J37/248 ,  H01J2237/038 ,  H01J2237/06341 ,  H01J2237/0802

Abstract: In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.

Abstract translation: 在使用导电绝缘体的加速管中，导电绝缘体的表面上的掺杂剂浓度有可能变得不均匀，使得导电绝缘体的表面电阻变得不均匀。 因此，在导电绝缘体加速管的内表面上形成有多个周向槽，并且金属沿着槽的内部被金属化。 当加速管表面上的特定部分的电阻与特定部分周围的区域的电阻不同时，加速管内表面上的金属化区域的电位变为固定值，因此电位分布 在加速管的内表面上，在垂直方向上可以保持基本上相等于圆周方向。

公开(公告)号：US20080238326A1

公开(公告)日：2008-10-02

申请号：US11693237

申请日：2007-03-29

Applicant: Kasegn D. Tekletsadik

Inventor： Kasegn D. Tekletsadik

IPC: H01J27/00

CPC classification number: H01J37/3171 ,  H01J5/46 ,  H01J37/248 ,  H01R13/53

Abstract: Ion accelerating devices including connection mechanisms with integrated shielding electrode and related methods are disclosed. According to an embodiment, an ion accelerating device of an ion implantation system comprises: a first element; a first connection system within the first element, the first connection system including a first connector and a first encapsulated shielding electrode around the first connector; and a second connection system within a second element other than the first element, the second connection system being coupled to the first connector; wherein the first encapsulated shielding electrode includes a first shielding portion adjacent to a first interface surface of the first element where the second connection system interfaces with the first element, in a cross-sectional view, the first shielding portion being substantially U-shaped.

Abstract translation: 公开了包括具有集成屏蔽电极的连接机构和相关方法的离子加速装置。 根据实施例，离子注入系统的离子加速装置包括：第一元件; 所述第一连接系统包括第一连接器和围绕所述第一连接器的第一封装屏蔽电极; 以及除了所述第一元件之外的第二元件内的第二连接系统，所述第二连接系统联接到所述第一连接器; 其中所述第一封装屏蔽电极包括与所述第一元件的第一接口表面相邻的第一屏蔽部分，其中所述第二连接系统与所述第一元件接合，在横截面图中，所述第一屏蔽部分基本上为U形。