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公开(公告)号：US09235060B2
公开(公告)日：2016-01-12
申请号：US13038622
申请日：2011-03-02
申请人： Zhaomin Tong , Wenhong Gao , Xuyuan Chen , Muhammad Nadeem Akram , Ouyang Guangmin , Kaiying Wang
发明人： Zhaomin Tong , Wenhong Gao , Xuyuan Chen , Muhammad Nadeem Akram , Ouyang Guangmin , Kaiying Wang
CPC分类号： G02B27/48 , G02B5/02 , G02F1/01 , G03F7/2008 , G03F7/70058 , G03F7/70116 , G03F7/70191 , G03F7/702 , G03F7/70258 , G03F7/70583 , G03F7/70758
摘要： Speckle reduction apparatus includes a radiation path and a mask arranged within the radiation path. The mask includes an array of electrically controllable cells configured to form a pattern on the mask that varies with time. The speckle reduction mask includes a first linear array including first parallel lines arranged to change the phase of incident radiation, and a second linear array including second parallel lines arranged to change the phase of incident radiation and further arranged such that cells are formed at the intersections of the first parallel lines and the second parallel lines. The speckle reduction mask includes a N1×N2 array of cells, A, formed according to: ATA=βδk,l, where AT is the transpose of A, β is a real and positive constant, dk,l is Kronecker delta and N1≠N2.
摘要翻译： 斑点减少装置包括布置在辐射路径内的辐射路径和掩模。 该掩模包括电控制单元的阵列，其被配置为形成随着时间变化的掩模上的图案。 散斑减少掩模包括第一线性阵列，其包括布置成改变入射辐射的相位的第一平行线，以及包括布置成改变入射辐射的相位的第二平行线的第二线性阵列，并且还布置成使得在交点处形成电池 的第一平行线和第二平行线。 斑点减少掩模包括根据下式形成的单元格N1×N2阵列：ATA =＆bgr;δk，l，其中AT是A，＆bgr的转置; 是一个真实和正的常数，dk，l是Kronecker delta，N1≠N2。
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公开(公告)号：US20110216390A1
公开(公告)日：2011-09-08
申请号：US13038622
申请日：2011-03-02
申请人： Zhaomin Tong , Wenhong Gao , Xuyuan Chen , Muhammad Nadeem Akram , Ouyang Guangmin , Kaiying Wang
发明人： Zhaomin Tong , Wenhong Gao , Xuyuan Chen , Muhammad Nadeem Akram , Ouyang Guangmin , Kaiying Wang
CPC分类号： G02B27/48 , G02B5/02 , G02F1/01 , G03F7/2008 , G03F7/70058 , G03F7/70116 , G03F7/70191 , G03F7/702 , G03F7/70258 , G03F7/70583 , G03F7/70758
摘要： Speckle reduction apparatus includes a radiation path and a mask arranged within the radiation path. The mask includes an array of electrically controllable cells configured to form a pattern on the mask that varies with time. The speckle reduction mask includes a first linear array including first parallel lines arranged to change the phase of incident radiation, and a second linear array including second parallel lines arranged to change the phase of incident radiation and further arranged such that cells are formed at the intersections of the first parallel lines and the second parallel lines. The speckle reduction mask includes a N1×N2 array of cells, A, formed according to: ATA=βδk,l, where AT is the transpose of A, β is a real and positive constant, dk,l is Kronecker delta and N1≠N2.
摘要翻译： 斑点减少装置包括布置在辐射路径内的辐射路径和掩模。 该掩模包括电控制单元的阵列，其被配置为形成随着时间变化的掩模上的图案。 散斑减少掩模包括第一线性阵列，其包括布置成改变入射辐射的相位的第一平行线，以及包括布置成改变入射辐射的相位的第二平行线的第二线性阵列，并且还布置成使得在交点处形成电池 的第一平行线和第二平行线。 斑点减少掩模包括根据下式形成的单元格N1×N2阵列：ATA =＆bgr;δk，l，其中AT是A，＆bgr的转置; 是一个真实和正的常数，dk，l是Kronecker delta，N1≠N2。
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