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公开(公告)号:US20060289799A1
公开(公告)日:2006-12-28
申请号:US11376522
申请日:2006-03-15
申请人: Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold Persing
发明人: Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold Persing
IPC分类号: H01J37/08
CPC分类号: H01J37/32412 , H01J37/3171 , H01J37/3299 , H01J2237/31705
摘要: A method and apparatus are directed to providing a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias ramp rate adjusting may be performed to achieve a desired dopant profile so that shallow and abrupt junctions in vertical and lateral directions are realized that are critical to device scaling in plasma doping systems.
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公开(公告)号:US20090061605A1
公开(公告)日:2009-03-05
申请号:US12267193
申请日:2008-11-07
申请人: Ludovic GODET , George D. Papasouliotis , Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold M. Persing
发明人: Ludovic GODET , George D. Papasouliotis , Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold M. Persing
IPC分类号: H01L21/265
CPC分类号: H01J37/3171 , H01J37/32412 , H01J37/32935 , H01J2237/31705 , H01L21/2236
摘要: A method to provide a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias ramp rate adjusting may be performed to achieve a desired dopant profile so that surface peak dopant profiles and retrograde dopant profiles are realized. The method may include an amorphization step in one embodiment.
摘要翻译: 在等离子体掺杂系统中提供掺杂剂分布调整溶液以满足浓度和结深度要求的方法。 可以执行偏置斜坡调整和偏置斜率调整以实现期望的掺杂剂分布,从而实现表面峰值掺杂剂分布和逆向掺杂剂分布。 该方法可以包括在一个实施方案中的非晶化步骤。
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公开(公告)号:US07687787B2
公开(公告)日:2010-03-30
申请号:US12267193
申请日:2008-11-07
申请人: Ludovic Godet , George D. Papasouliotis , Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold M. Persing
发明人: Ludovic Godet , George D. Papasouliotis , Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold M. Persing
IPC分类号: H01J37/317 , H01L21/265 , H05H1/24
CPC分类号: H01J37/3171 , H01J37/32412 , H01J37/32935 , H01J2237/31705 , H01L21/2236
摘要: A method to provide a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias ramp rate adjusting may be performed to achieve a desired dopant profile so that surface peak dopant profiles and retrograde dopant profiles are realized. The method may include an amorphization step in one embodiment.
摘要翻译: 在等离子体掺杂系统中提供掺杂剂分布调整溶液以满足浓度和结深度要求的方法。 可以执行偏置斜坡调整和偏置斜率调整以实现期望的掺杂剂分布,从而实现表面峰值掺杂剂分布和逆向掺杂剂分布。 该方法可以包括在一个实施方案中的非晶化步骤。
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公开(公告)号:US07528389B2
公开(公告)日:2009-05-05
申请号:US11376522
申请日:2006-03-15
申请人: Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold M. Persing
发明人: Ziwei Fang , Richard Appel , Vincent Deno , Vikram Singh , Harold M. Persing
IPC分类号: H01J37/244
CPC分类号: H01J37/32412 , H01J37/3171 , H01J37/3299 , H01J2237/31705
摘要: A method and apparatus are directed to providing a dopant profile adjustment solution in plasma doping systems for meeting both concentration and junction depth requirements. Bias ramping and bias ramp rate adjusting may be performed to achieve a desired dopant profile so that shallow and abrupt junctions in vertical and lateral directions are realized that are critical to device scaling in plasma doping systems.
摘要翻译: 一种方法和装置旨在在等离子体掺杂系统中提供掺杂剂分布调整解决方案,以满足浓度和结深度要求。 可以执行偏置斜坡调整和偏置斜率调整以实现期望的掺杂剂分布,使得在垂直和横向方向上的浅和突变结被实现,这对于等离子体掺杂系统中的器件缩放至关重要。
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公开(公告)号:US5628095A
公开(公告)日:1997-05-13
申请号:US411524
申请日:1995-03-28
申请人: Richard Appel , Eginhard Wichelhaus
发明人: Richard Appel , Eginhard Wichelhaus
CPC分类号: A44C5/2071 , A44D2200/12 , Y10S24/38 , Y10T24/45188 , Y10T24/47 , Y10T24/4745 , Y10T403/58
摘要: A jewelry clasp has a first and a second clasp member connected to one another for closing the clasp. At least the first clasp member has a spring-weighed element for achieving a fixation of a closed position of the clasp. The first clasp member has a first end portion with a first end face and further has a first receiving opening extending transverse to the longitudinal extension of the first clasp member. The second clasp member has a second end portion with a second end face and further has a second receiving opening extending transverse to a longitudinal extension of the second clasp member. The first receiving opening is oriented oppositely to the second receiving opening. The first and the second end portions are insertable into one another such that in a closed position of the clasp the spring-weighed element is forced against the second end face of the second clasp member.
摘要翻译: 珠宝扣具有彼此连接的第一和第二扣环构件,用于封闭扣环。 至少第一扣环构件具有弹簧加重元件,用于实现扣环的闭合位置的固定。 第一扣环构件具有第一端部,其具有第一端面并且还具有横向于第一扣环构件的纵向延伸部延伸的第一接收开口。 第二搭扣构件具有带有第二端面的第二端部,并且还具有横向于第二搭扣构件的纵向延伸部延伸的第二容纳开口。 第一接收开口与第二接收开口相反地定向。 第一和第二端部可彼此插入,使得在扣环的关闭位置,弹簧称重的元件被迫抵靠第二扣环构件的第二端面。
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