公开(公告)号：US20180090393A1

公开(公告)日：2018-03-29

申请号：US15826480

申请日：2017-11-29

Applicant: ams AG

Inventor： Helene GEHLES ,  Thomas BODNER ,  Joerg SIEGERT

IPC: H01L21/66 ,  G01N21/64 ,  G02B21/00 ,  H01L21/02 ,  H01L21/3065 ,  G01N21/91 ,  G01N21/94 ,  G01N21/88

CPC classification number: H01L22/12 ,  G01N21/643 ,  G01N21/6458 ,  G01N21/91 ,  G01N21/94 ,  G01N2021/646 ,  G01N2021/8864 ,  G01N2021/8877 ,  G02B21/00 ,  G02B21/0076 ,  H01L21/02057 ,  H01L21/3065 ,  H01L21/76898 ,  H01L22/10 ,  H01L22/24

Abstract: According to the improved concept, a method for analyzing a semiconductor element comprising polymer residues located on a surface of the semiconductor element is provided. The method comprises marking at least a fraction of the residues by exposing the semiconductor element to a fluorescent substance and detecting the marked residues by visualizing the marked residues on the surface of the semiconductor element using fluorescence microscopy.