公开(公告)号：US20240319159A1

公开(公告)日：2024-09-26

申请号：US18579727

申请日：2022-05-07

Applicant: REEMOON TECHNOLOGY CO., LTD.

Inventor： Er Zhu ,  Yi Zhu

IPC: G01N33/02 ,  G01N21/84 ,  G01N21/88 ,  G01N35/04 ,  G06T3/4038 ,  G06T7/00 ,  G06T7/11 ,  G06T7/73

CPC classification number: G01N33/025 ,  G01N21/8806 ,  G01N21/8851 ,  G01N35/04 ,  G06T3/4038 ,  G06T7/0004 ,  G06T7/11 ,  G06T7/74 ,  G01N2021/8466 ,  G01N2021/8809 ,  G01N2021/8864 ,  G01N2035/0406 ,  G01N2035/0441 ,  G06T2200/32 ,  G06T2207/10016

Abstract: Provided are detection system and method, computer device, and computer readable storage medium; the detection system includes laser, camera unit, and computer device; the camera unit is mounted in upper region of measured object; the laser is mounted directly above the measured object, and transmitting port of the laser is facing the measured object; the laser is configured for projecting a laser plane, the laser plane intersecting surface of the measured object to form laser line, and the laser line dividing the surface into multiple different regions of interest; the camera unit is configured for collecting images of the measured object from different shooting angles, each image including part or all of each region of interest; and the computer device is configured for cutting and splicing all of the images based on the region of interest contained in each image to obtain target image of the surface.

公开(公告)号：US20240264090A1

公开(公告)日：2024-08-08

申请号：US18427609

申请日：2024-01-30

Applicant: Robert Bosch GmbH

Inventor： Waldemar Smirnov ,  Ralf Augke ,  Michel Janus ,  Thomas Schnitzler

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8851 ,  G01N2021/8864

Abstract: A method for fault analysis in wafers includes determining multiple wafer maps comprising indications of anomalies of the wafers, performing an evaluation based on the determined wafer maps, and performing the fault analysis based on the evaluation performed. Performing the evaluation includes multiple execution of a cluster analysis based on the determined wafer maps using different parameters, and identifying distinct clusters determined by the differently parameterized cluster analyses.

公开(公告)号：US11927540B2

公开(公告)日：2024-03-12

申请号：US17683147

申请日：2022-02-28

Applicant: CANON KABUSHIKI KAISHA

Inventor： Shoichi Hoshino ,  Masakazu Matsugu ,  Yusuke Mitarai ,  Atsushi Nogami

IPC: G06T7/00 ,  G01N21/88 ,  G06F3/01

CPC classification number: G01N21/8851 ,  G01N21/8803 ,  G06F3/013 ,  G06T7/0004 ,  G01N2021/8864 ,  G01N2021/888 ,  G06T2207/30108

Abstract: An apparatus according to the present disclosure acquires a display condition for displaying at least a part of target data as a display image on a display device, determines, in a case where the display image is changed, whether to store the display condition according to a changed display image in a storage device, based on an index relating to the change of the display image, and stores, in a case where the display condition is determined to be stored, the display condition according to the changed display image in the storage device.

公开(公告)号：US20240027365A1

公开(公告)日：2024-01-25

申请号：US18479152

申请日：2023-10-02

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuya KIJIMA

IPC: G01N21/95 ,  G06T7/11

CPC classification number: G01N21/9501 ,  G06T7/11 ,  G01N2021/8864

Abstract: A detection apparatus that detects a mark formed on a substrate is provided. The detection apparatus comprises a detection optical system that irradiates light on the mark on the substrate held by a stage and detects an image of the mark, and a processor that performs a detection process of the mark based on the image of the mark. The processor finds a detection value indicating a position of the mark in an observation field of the detection optical system based on the image of the mark, finds a subregion in which the mark is located among a plurality of subregions in the observation field, and corrects the detection value based on a correction value corresponding to the found subregion among correction values predetermined for the plurality of subregions, respectively.

公开(公告)号：US09651472B2

公开(公告)日：2017-05-16

申请号：US15142842

申请日：2016-04-29

Applicant: The Charles Stark Draper Laboratory, Inc.

Inventor： Almir D. Davis ,  William J. Trinkle ,  Donald Gustafson ,  Philip S. Babcock, IV ,  Richard T. Berthold

IPC: G01N17/00 ,  G01N27/82 ,  G01N21/88

CPC classification number: G01N17/00 ,  G01N27/82 ,  G01N2021/8861 ,  G01N2021/8864

Abstract: Defects in ferromagnetic materials are detected and characterized by analyzing the items' magnetic fields to find portions of the magnetic fields that differ in characteristic ways from residual magnetic fields generated by non-defective portions of the items. The portions of the magnetic fields that differ in the characteristic ways correspond to locations of the defects. The residual magnetic fields correspond to portions of the items distant from the defects. The defect characterization may include volume of material lost due to each defect and/or width and/or depth of each defect.

公开(公告)号：US20170082554A1

公开(公告)日：2017-03-23

申请号：US14857272

申请日：2015-09-17

Applicant: FORD GLOBAL TECHNOLOGIES, LLC

Inventor： Thomas Dougan

IPC: G01N21/88

CPC classification number: G01N21/8851 ,  G01N21/8806 ,  G01N21/9515 ,  G01N2021/845 ,  G01N2021/8864

Abstract: An imaging system for detecting a defect on a workpiece surface includes one or more independently operating imaging modules and a control system including one or more processors having non-transitory computer-readable instructions for receiving and processing digital data of images captured by the one or more imaging modules to provide a combined image of a portion of the workpiece surface. The independently operating imaging modules each include a lighting unit having an adjustable support frame carrying a plurality of indexing light sources and an imaging unit including one or more imagers carried by the support frame. The imaging unit includes a pair of imagers disposed on the adjustable support frame to capture one or more images of a portion of the workpiece surface. Imaging modules for use in the imaging system, and methods for scanning a portion of a workpiece by the imaging system are described.

公开(公告)号：US09488593B2

公开(公告)日：2016-11-08

申请号：US14685899

申请日：2015-04-14

Applicant: Seagate Technology LLC

Inventor： Joachim W. Ahner ,  S. Keith McLaurin

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/17 ,  G01N21/47 ,  G01N21/94 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/47 ,  G01N21/8851 ,  G01N21/94 ,  G01N21/95 ,  G01N21/9501 ,  G01N21/9506 ,  G01N2021/8864 ,  G01N2201/061 ,  G01N2201/12

Abstract: Provided herein is an apparatus, including a light source configured to illuminate a surface of an article, wherein light incident upon the surface of the article is collimated light; a light detector array including a plurality of light sensors configured to receive scattered light from features about the surface of the article; and a processing means for mapping the features about the surface of the article, wherein the processing means is configured to map the features by analyzing the scattered light received at the light detector array.

Abstract translation: 本文提供了一种装置，包括被配置为照亮物品表面的光源，其中入射在物品表面上的光是准直的光; 光检测器阵列，包括多个光传感器，其被配置为从物体的表面附近的特征接收散射的光; 以及用于映射关于物品表面的特征的处理装置，其中处理装置被配置为通过分析在光检测器阵列处接收的散射光来映射特征。

公开(公告)号：US09219827B2

公开(公告)日：2015-12-22

申请号：US14031987

申请日：2013-09-19

Applicant: FUJI XEROX CO., LTD.

Inventor： Takashi Hiramatsu ,  Kiyofumi Aikawa ,  Michio Kikuchi

IPC: H04N1/00 ,  B41J29/46 ,  G01N21/88

CPC classification number: H04N1/00005 ,  B41F33/0036 ,  B41J29/46 ,  G01N2021/8864 ,  H04N1/00015 ,  H04N1/00042 ,  H04N1/0005 ,  H04N1/00076 ,  H04N1/00092

Abstract: There is provided an image inspection system. An image reading unit reads a formed image which is formed on a recording medium based on original image data to generate read image data. A determination unit compares the read image data and the original image data to determine whether or not the formed image includes a defective region. An extraction unit extracts an image of characters present around the defective region from the read image data. An image display device displays the image of the characters and an image of the defective region such that both the images overlap with each other.

Abstract translation: 提供了图像检查系统。 图像读取单元基于原始图像数据读取形成在记录介质上的形成图像，以生成读取的图像数据。 确定单元将读取的图像数据和原始图像数据进行比较，以确定形成的图像是否包括缺陷区域。 提取单元从读取的图像数据中提取出现在缺陷区周围的字符的图像。 图像显示装置显示字符的图像和缺陷区域的图像，使得两个图像彼此重叠。

公开(公告)号：US09110033B2

公开(公告)日：2015-08-18

申请号：US12570527

申请日：2009-09-30

Applicant: Richard E. Bills ,  Neil Judell ,  Klaus R. Freischlad ,  James P. McNiven

Inventor： Richard E. Bills ,  Neil Judell ,  Klaus R. Freischlad ,  James P. McNiven

IPC: G01N21/88 ,  G01N21/21 ,  G01N21/47 ,  G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G06T7/00

CPC classification number: G01N21/9501 ,  G01N21/21 ,  G01N21/47 ,  G01N21/4738 ,  G01N21/474 ,  G01N21/55 ,  G01N21/88 ,  G01N21/8806 ,  G01N21/95 ,  G01N21/956 ,  G01N2021/4707 ,  G01N2021/4711 ,  G01N2021/4792 ,  G01N2021/556 ,  G01N2021/8809 ,  G01N2021/8848 ,  G01N2021/8864 ,  G01N2021/8877 ,  G01N2021/8896 ,  G01N2201/0612 ,  G01N2201/105 ,  G06T7/0004 ,  G06T2207/30148 ,  Y10T29/49826

Abstract: A surface inspection system, as well as related components and methods, are provided. The surface inspection system includes a beam source subsystem, a beam scanning subsystem, a workpiece movement subsystem, an optical collection and detection subsystem, and a processing subsystem. The optical collection and detection system features, in the front quartersphere, a light channel assembly for collecting light reflected from the surface of the workpiece, and a front collector and wing collectors for collecting light scattered from the surface, to greatly improve the measurement capabilities of the system. The light channel assembly has a switchable edge exclusion mask and a reflected light detection system for improved detection of the reflected light.

Abstract translation: 提供了表面检查系统，以及相关的部件和方法。 表面检查系统包括光束源子系统，光束扫描子系统，工件运动子系统，光学收集和检测子系统以及处理子系统。 光学收集和检测系统在前四分之一区域中具有用于收集从工件表面反射的光的光通道组件，以及用于收集从表面散射的光的前收集器和翼收集器，以大大提高测量能力 系统。 光通道组件具有可切换的边缘排除掩模和用于改进反射光检测的反射光检测系统。

公开(公告)号：US09007581B2

公开(公告)日：2015-04-14

申请号：US13621121

申请日：2012-09-15

Applicant: Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

Inventor： Izuo Horai ,  Hirokazu Koyabu ,  Yuta Urano ,  Takahiro Jingu

IPC: G01J3/00 ,  G01N21/00 ,  G01N21/95 ,  G01N21/65 ,  G01N21/47 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/65 ,  G01N21/9505 ,  G01N2021/4711 ,  G01N2021/473 ,  G01N2021/8861 ,  G01N2021/8864

Abstract: An inspection method and an inspection device, or apparatus each capable of conducting composition analysis of a defect detected by elastic or stokes scattered light, an inspection surface or defect on the surface of the inspection surface, or a defect on the surface of the inspection object and its internal composition. A surface inspection method for optically detecting elastic or stokes scattering or inelastic or anti-stokes scattered light from inside the surface of the inspection object, for detecting existence of defects of the inspection object and features of the defects, for detecting positions of the detected defects on the surface of the inspection object, classifying and analyzing the detected defects in accordance with their features on the basis of the positions of the defects and the features of the defects or the classification result of the defects.

Abstract translation: 检查方法和检查装置或装置，其能够对由检查表面的弹性或sto kes散射光，检查面或缺陷检测到的缺陷或检​​查对象的表面上的缺陷进行组成分析 及其内在组成。 一种表面检查方法，用于光学检测来自检查对象的表面内的弹性或斯托克斯散射或非弹性或反射散射光，用于检测检查对象的缺陷的存在和缺陷的特征，用于检测检测到的缺陷的位置 在检查对象的表面上，根据缺陷的位置和缺陷的特征或缺陷的分类结果，根据其特征对检测到的缺陷进行分类和分析。