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公开(公告)号:US20170342543A1
公开(公告)日:2017-11-30
申请号:US15655544
申请日:2017-07-20
申请人: eMagin Corporation
发明人: Amalkumar P. GHOSH , Fridrich VAZAN , Munisamy ANANDAN , Evan DONOGHUE , Ilyas I. KHAYRULLIN , Tariq ALI , Kerry TICE
CPC分类号: G03F7/707 , C23C14/042 , C23C14/30 , C23C14/50 , C23C14/54
摘要: A direct-deposition system forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. Prior to reaching the shadow mask, vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. Vaporized atoms that pass through the shadow mask exhibit little or no lateral spread after passing through through-holes and the material deposits on the substrate in a pattern that has very high fidelity with the through-hole pattern of the shadow mask.
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公开(公告)号:US20210285087A1
公开(公告)日:2021-09-16
申请号:US17334248
申请日:2021-05-28
申请人: eMagin Corporation
发明人: Evan P. DONOGHUE , Fridrich VAZAN , Kerry TICE , Ilyas I. KHAYRULLIN , Tariq ALI , Qi WANG , Laurie SZIKLAS , Amalkumar P. GHOSH
摘要: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.
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公开(公告)号:US20180254438A1
公开(公告)日:2018-09-06
申请号:US15909434
申请日:2018-03-01
申请人: eMagin Corporation
发明人: Qi WANG , Evan P. DONOGHUE , Ilyas I. KHAYRULLIN , Tariq ALI , Kerry TICE , Amalkumar P. GHOSH
CPC分类号: H01L51/5275 , H01L51/0059 , H01L51/0081 , H01L51/5056 , H01L51/5072 , H01L51/5206 , H01L51/5234 , H01L51/56 , H01L2251/5315
摘要: A top emitting OLED includes two organic light-extraction layers on top of an at least partially transparent cathode. At least one of the light-extraction layers comprises an electron transport material and at least one of the light-extraction layers comprises a hole transport material. In some embodiments, the electron transport material is Alq3 and the hole transport material is a triaryl amine derivative.
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公开(公告)号:US20240130160A1
公开(公告)日:2024-04-18
申请号:US18378487
申请日:2023-10-10
申请人: eMagin Corporation
发明人: Fangchao ZHAO , Howard LIN , Ilyas I. KHAYRULLIN , Kerry TICE , Timothy CONSIDINE , Laurie SZIKLAS , Amalkumar P. GHOSH
IPC分类号: H10K59/121 , H10K50/19 , H10K59/12
CPC分类号: H10K59/121 , H10K50/19 , H10K59/1201 , H10K2102/351
摘要: A tandem OLED display is provided, including a substrate backplane, an anode layer, at least two stacked OLED layers, each OLED layer comprising a plurality of pixels, at least one charge generation layer (CGL), wherein each CGL is disposed between two adjacent stacked OLED layers, and a cathode layer. At least one of the CGLs is patterned wherein a pattern provides gaps between each of the plurality of pixels.
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公开(公告)号:US20240121977A1
公开(公告)日:2024-04-11
申请号:US18376959
申请日:2023-10-05
申请人: eMagin Corporation
发明人: Fangchao ZHAO , Howard LIN , Ilyas I. KHAYRULLIN , Kerry TICE , Timothy CONSIDINE , Laurie SZIKLAS , Amalkumar P. GHOSH
CPC分类号: H10K50/19 , H10K50/131 , H10K71/60
摘要: A tandem OLED device is provided, including an anode, a cathode, at least two electroluminescent units disposed between the anode and the cathode, and an alloy thin film disposed between the two electroluminescent units.
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公开(公告)号:US20240081136A1
公开(公告)日:2024-03-07
申请号:US18241730
申请日:2023-09-01
申请人: eMagin Corporation
发明人: Ilyas I. KHAYRULLIN , Howard LIN , Fangchao ZHAO , Timothy CONSIDINE , Laurie SZIKLAS , Kerry TICE , Amalkumar P. GHOSH
CPC分类号: H10K71/166 , C23C14/042 , C23C14/24 , C23C14/50 , H10K59/10
摘要: Systems and methods for performing direct patterning of a material on a substrate with high fidelity to a desired pattern are presented. A pattern of apertures of a shadow mask is compensated to accommodate a range of propagation angles in a vapor plume used to deposit material onto the substrate through the shadow mask. A shadow mask in accordance with the present disclosure includes an aperture pattern in which aperture position is shifted inward toward the center of the shadow mask by an amount based on the distance of the aperture from the center of the shadow mask. As a result, vaporized material passing through an aperture at a non-normal angle deposits onto the substrate at its proper desired location.
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公开(公告)号:US20190131528A1
公开(公告)日:2019-05-02
申请号:US16178388
申请日:2018-11-01
申请人: eMagin Corporation
发明人: Evan P. DONOGHUE , Ilyas I. KHAYRULLIN , Kerry TICE , Tariq ALI , Qi WANG , Fridrich VAZAN , Amalkumar P. GHOSH
摘要: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.
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公开(公告)号:US20240081135A1
公开(公告)日:2024-03-07
申请号:US18236243
申请日:2023-08-21
申请人: eMagin Corporation
发明人: Amalkumar P. GHOSH , Howard LIN , Fridrich VAZAN , Ilyas I. KHAYRULLIN , Fangchao ZHAO , Kerry TICE , Timothy CONSIDINE , Laurie SZIKLAS
IPC分类号: H10K71/16
CPC分类号: H10K71/166
摘要: A direct patterning deposition mask for OLED deposition is provided where the mask includes a sapphire substrate; and a Silicon Nitride (SiN) membrane. The sapphire substrate thickness may be between 0.7 and 2 mm. The sapphire substrate may have a diameter in the range of 200 mm diameter to 300 mm diameter. Warpage of the substrate is preferably less than
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公开(公告)号:US20240042482A1
公开(公告)日:2024-02-08
申请号:US18229676
申请日:2023-08-03
申请人: eMagin Corporation
发明人: Fridrich VAZAN , Ilyas I. KHAYRULLIN , Howard LIN , Fangchao ZHAO , Kerry TICE , Timothy CONSIDINE , Laurie SZIKLAS , Maxim FRAYER , Amalkumar P. GHOSH , Tim BRAUN
IPC分类号: B05D1/00
CPC分类号: B05D1/60
摘要: A system for deposition of evaporated material on a substrate is provided. The substrate has a central axis. The system includes an evaporation vacuum chamber, at least one nozzle assembly, and a shadow mask. The nozzle assembly has a three-point plurality of point evaporation sources disposed adjacent to the central axis of the substrate and at a distance from the substrate whereby the nozzle assembly provides for molecules of evaporated material to arrive at the substrate at an incident angle of less than or equal to 5 degrees.
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公开(公告)号:US20180315926A1
公开(公告)日:2018-11-01
申请号:US15968606
申请日:2018-05-01
申请人: eMagin Corporation
发明人: Evan P. DONOGHUE , Kerry TICE , Ilyas I. KHAYRULLIN , Fridrich VAZAN , Tariq ALI , Laurie SZIKLAS , Amalkumar P. GHOSH
摘要: An apparatus and method for performing material deposition on an active-matrix organic light emitting diode (AMOLED) display array on a substrate, includes aligning a shadow mask to a first position relative to the substrate; initially depositing a first material through the shadow mask onto the substrate at a first material deposition position relative to the first position of the aligned shadow mask and at a first deposition height; incrementing the position the shadow mask to a second position relative to the first material deposition position; and subsequently depositing one of the first material or a second material through the shadow mask onto the substrate at a second material deposition position relative to the first material deposition position, wherein the second material deposition position having an identical deposition pattern as the first material deposition position on account of the shadow mask.
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