-
公开(公告)号：US12084615B2
公开(公告)日：2024-09-10
申请号：US17943793
申请日：2022-09-13
申请人： GAPS Technology, LLC
发明人： Cliffton Lee Roe
CPC分类号： C09K8/532 , C09K8/03 , C10G27/10 , C10G29/00 , C09K2208/20 , C10G2300/1033 , C10G2300/4037
摘要： A treatment method for remediating various contaminants including H2S, CO2, NH3 and other contaminants contained in fluids being extracted from the earth comprises steps of: preparing an aqueous based treatment composition containing water and collectively 35-55 weight percent of one or more hydroxide compounds; injecting a dosage amount of the treatment composition into contaminated fluids located in a subterranean deposit under the earth's surface such that the treatment composition mixes with the fluids deep under the earth's surface; and extracting a mixture of the contaminated fluids and the treatment composition through a well such that the treatment compositions remediates contaminants in the fluids as the mixture passes through the well to the earth's surface, wherein a dosage amount of the treatment composition may be 0.010 to 10.0 ml of the aqueous based treatment composition/liter of the contaminated fluids being extracted from the subterranean deposit.
-
公开(公告)号：US20240067887A1
公开(公告)日：2024-02-29
申请号：US18382932
申请日：2023-10-23
申请人： GAPS Technology, LLC
发明人： Cliffton Lee ROE , Linda SCHWEITZER
CPC分类号： C10G29/22 , B01D53/526 , B01D53/62 , B01D53/78 , C10L3/103 , C10L3/104 , C10L3/106 , B01D2251/304 , B01D2251/306 , B01D2251/604 , B01D2251/90 , B01D2257/504 , C10G2300/202 , C10G2300/205 , C10G2300/207 , C10L2290/545
摘要： A treatment process for remediating contaminants in a mixture of contaminated fluids, including at least one liquid fluid and at least one gaseous fluid, includes the steps of: preparing a liquid treatment composition containing at least 80 volume % of an aqueous solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent, and at least one of fulvic acid and humic acid at a collective concentration of 0.1-5 wt % of the treatment composition; adding a dosage of the treatment composition to a mixture of contaminated fluids including a liquid portion and a gaseous portion; and allowing the treatment composition to react with the mixture of contaminated fluids for at least 10 minutes, wherein a pH of the treatment composition is at least 13.0 and the aqueous solution contains at least one of NaOH and KOH.
-
公开(公告)号：US11512258B2
公开(公告)日：2022-11-29
申请号：US17080209
申请日：2020-10-26
申请人： GAPS TECHNOLOGY, LLC
发明人： Cliffton Lee Roe , Linda Schweitzer
IPC分类号： C10G19/02 , C02F101/10 , C10G53/12 , C10G29/04 , C10G29/02 , C10G29/20 , C02F103/10 , C02F103/36 , C02F103/18
摘要： A treatment composition for remediating for remediating H2S and other contaminant(s) in contaminated liquids, comprising: 0.1-10.0 weight % collectively of at least one hydroxide compound; 0.01-3.0 weight % collectively of at least one organic acid selected from a group consisting of fulvic acid and humic acid; 0.01-10.0 wt % of a chelating agent; and at least 75% weight of water.
-
公开(公告)号：US20240166955A1
公开(公告)日：2024-05-23
申请号：US18515969
申请日：2023-11-21
申请人： GAPS TECHNOLOGY, LLC
发明人： Cliffton Lee ROE
IPC分类号： C10G19/02
CPC分类号： C10G19/02 , C10G2300/202
摘要： A treatment composition for being added to petroleum based liquids for reducing total sulfur content in the petroleum based liquids, comprising: sodium sulfide and at least one hydroxide compound. A dosage of the treatment composition may be added to liquids containing sulfur, including crude oil and distillates of crude oil and then allowed to react with such liquids over a period of time, e.g., hours or days. By such reaction total sulfur content of the liquids may be reduced by more than 50%.
-
公开(公告)号：US11549064B2
公开(公告)日：2023-01-10
申请号：US17170466
申请日：2021-02-08
申请人： GAPS Technology, LLC
摘要： A treatment composition for remediating for remediating H2S and other contaminant(s) in contaminated gasses comprising: an aqueous hydroxide solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent of the aqueous hydroxide solution; at least one organic acid selected from the group consisting of fulvic acid and humic acid; and a chelating agent, wherein the aqueous hydroxide solution constitutes at least 80 wt % of the treatment composition, the at least one organic acid constitutes 0.1-3 wt % of the treatment composition, the chelating agent constitutes 0.1-6 wt % of the treatment composition, and a pH of the treatment composition is at least 12.0.
-
公开(公告)号：US11286433B2
公开(公告)日：2022-03-29
申请号：US16732559
申请日：2020-01-02
申请人： GAPS TECHNOLOGY, LLC
发明人： Cliffton Lee Roe , Linda Schweitzer
IPC分类号： C10G53/12 , C10G19/02 , C10G29/04 , C10G29/02 , C10G29/20 , C02F1/50 , C02F1/66 , C02F103/36 , C02F101/10 , C02F103/18 , C02F103/10
摘要： A treatment process for preparing a remediated liquid from a contaminated liquid originally containing more than 5 ppm hydrogen sulfide (H2S) and substantially without formation of precipitate, includes steps of steps of adding an aqueous solution containing at least one hydroxide compound at a collective concentration of 35-55 wt % to the contaminated liquid to achieve a concentration of 125-5000 ppm of the hydroxide compounds in the contaminated liquid, adding a fulvic acid and/or a humic acid to the contaminated liquid to achieve a concentration of 0.01-10 ppm of the acid(s) in the contaminated liquid, and dispersing the aqueous solution and the at least one organic acid in the contaminated liquid and allowing the aqueous solution and the at least one organic acid to react with the contaminated liquid for a period of time until a concentration of hydrogen sulfide in the contaminated liquid is reduced to ≤5 ppm.
-
公开(公告)号：US10807021B2
公开(公告)日：2020-10-20
申请号：US15412684
申请日：2017-01-23
申请人： Cliffton Lee Roe
发明人： Cliffton Lee Roe
摘要： A system for treating liquids and solutions for separating components thereof, the system including a treatment vessel having a treatment chamber therein, a device for generating a gas-infused liquid under elevated pressure, and a device for stabilizing the gas-infused liquid such that most of the gas infused into the liquid by the device for generating a gas-infused liquid will remain in the liquid if pressure of the liquid is reduced to atmospheric pressure, and for flowing the stabilized gas-infused liquid into the treatment chamber so as to form a liquid layer including the stabilized, gas-infused liquid in the treatment chamber. The treatment vessel includes a discharge port through which some of the stabilized, gas-infused liquid in the liquid layer may be discharged from the treatment vessel, the withdrawn liquid is infused with an additional amount of the gas, again stabilized, and again flown the liquid into the treatment chamber.
-
公开(公告)号：US11613710B2
公开(公告)日：2023-03-28
申请号：US16851996
申请日：2020-04-17
申请人： GAPS Technology, LLC
发明人： Cliffton Lee Roe , Linda Schweitzer
IPC分类号： C10G53/12 , C10G19/02 , C10G29/04 , C10G29/02 , C10G29/20 , C02F1/50 , C02F1/66 , C02F103/10 , C02F103/36 , C02F101/10 , C02F103/18
摘要： A treatment process for remediating H2S and other contaminants in liquids includes: partially filling a closed vessel with a contaminated liquid containing ≥5 ppm H2S with a head space above the liquid within the vessel where gasses released from the liquid from the liquid collect; separately providing a treatment composition in the head space so that the gasses from the liquid may contact the treatment composition; and permitting the contact between the vapors from the liquid and the treatment composition to continue until a collective concentration of H2S in the liquid and in the head space is
-
公开(公告)号：US20220411701A1
公开(公告)日：2022-12-29
申请号：US17857084
申请日：2022-07-04
申请人： GAPS Technology, LLC
发明人： Cliffton Lee ROE , Linda SCHWEITZER
摘要： A treatment process for remediating; contaminants in a mixture of contaminated fluids, including at least one liquid fluid and at least one gaseous fluid, includes the steps of: preparing a treatment composition containing at least 80 volume % of an aqueous solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent, and at least one organic acid selected from the group consisting of fulvic acid and humic acid at a collective concentration of 0.1-5 wt % of the treatment composition; adding a dosage of the treatment composition to a mixture of contaminated fluids including a liquid portion and a gaseous portion; and allowing the treatment composition to react with the mixture of contaminated fluids for at least 10 minutes. A pH of the treatment composition is at least 12.0
-
公开(公告)号：US20210230487A1
公开(公告)日：2021-07-29
申请号：US17170466
申请日：2021-02-08
申请人： GAPS Technology, LLC
摘要： A treatment composition for remediating for remediating H2S and other contaminant(s) in contaminated gasses comprising: an aqueous hydroxide solution containing at least one hydroxide compound at a collective concentration of 35-55 weight percent of the aqueous hydroxide solution; at least one organic acid selected from the group consisting of fulvic acid and humic acid; and a chelating agent, wherein the aqueous hydroxide solution constitutes at least 80 wt % of the treatment composition, the at least one organic acid constitutes 0.1-3 wt % of the treatment composition, the chelating agent constitutes 0.1-6 wt % of the treatment composition, and a pH of the treatment composition is at least 12.0.
-
-
-
-
-
-
-
-
-
搜索结果
23 条记录 (耗时 0.013 秒)
