摘要:
A process resulting in enhanced pole performance, relative to permalloy poles, in narrow track magnetic devices. A preferred process includes increasing the anisotropy field of the pole material while maintaining an acceptable coercivity level and near zero magnetostriction. One embodiment utilizes a NiCoFe alloy containing 22% cobalt by weight, heat treated in an easy axis magnetic field in a non-oxidizing atmosphere. This process achieves favorable domain structures at narrow pole tip widths.
摘要:
A tool for batch processing the definition of air bearing surfaces on rows comprising a plurality of sliders is disclosed. The tool has a main body member having a length defining a y-axis direction, a width defining an x-axis direction, and a thickness defining a z-axis direction. The main body member has a top surface defining an upwardly facing z-axis base surface. The main body also defines a y-axis alignment reference surface, and an x-axis alignment reference surface. The rows are positioned on the tool for processing, where the upper surface of the platform engages the lower surface of the plurality of rows to provide proper z-axis positioning on the tool. The y-axis alignment reference engages one longitudinal side of an anchor row to provide proper y-axis positioning, and the x-axis alignment reference surface abuts the second end of the plurality of rows to provide proper x-axis positioning. The top surfaces of the rows lie in a common plane.
摘要:
A flux enhanced data transducer and method for producing the same in conjunction with shared shields on MR read heads in which substantially between 500-2500 .ANG. of a relatively higher magnetic moment material is added to the upper surface of the shared shield, or bottom write head pole, prior to a magnetic flux containment ion milling operation utilizing the upper pole as a mask. The relatively higher magnetic moment flux enhancement layer may comprise CoNiFe, FeN or similar material which is deposited prior to the formation of the dielectric gap layer. The flux enhancement layer may then be selectively removed substantially surrounding the upper pole by means of a relatively brief ion milling process in which only on the order of 1.0 k.ANG. of the layer need be removed and during which only an insignificant amount of the material removed might be re-deposited on the sides of the upper pole.