OPTICAL UNIT WITH ATTENUATING PORTION AND METHOD OF PRODUCING THE SAME

    公开(公告)号:US20240077687A1

    公开(公告)日:2024-03-07

    申请号:US18499482

    申请日:2023-11-01

    申请人: NALUX CO., LTD.

    IPC分类号: G02B6/42

    CPC分类号: G02B6/4206 G02B6/4296

    摘要: An optical unit of plastic provided with a surface for incident light and a surface for outgoing light, wherein the surface for incident light is designed to face a light source and the surface for outgoing light is designed to face an element for receiving light so as to optically connect the light source and the element for receiving light and wherein the optical unit is so shaped that light that comes from the light source and is incident on the surface for incident light forms a first image of the light source within the optical unit and a second image of the light source after having gone through the surface for outgoing light and the optical unit is provided with an attenuating portion for attenuating the quantity of light passing therethrough in the vicinity of the position where the first image is formed.

    Mold machining method using end mill

    公开(公告)号:US11697164B2

    公开(公告)日:2023-07-11

    申请号:US16784846

    申请日:2020-02-07

    申请人: NALUX CO., LTD.

    发明人: Yukinobu Nishio

    摘要: A mold machining method using an endmill, the contour of a cross section of the mold being concave and continuous in an area, a ratio of the maximum to the minimum of radius of curvature of the contour of a portion of the area (a first area) being 2 or greater, and a blade of the endmill having a second area where the contour of a cross section is similar to the contour of the first area, the method comprising the steps of determining a spiral path of the endmill such that each point of the first area is machined by a portion of the second area, corresponding to said each point in the similarity, and a radial interval between the spiral tool path is maximized while keeping surface roughness of the machined mold at or below a predetermined value; and machining the mold along the path.

    Diffuser
    3.
    发明授权
    Diffuser 有权

    公开(公告)号:US11327206B2

    公开(公告)日:2022-05-10

    申请号:US16531214

    申请日:2019-08-05

    申请人: NALUX CO., LTD.

    IPC分类号: G02B5/02 G02B27/00

    摘要: A diffuser provided with plural shapes obtained by translation on an xy plane of at least one of z=g(x, y) and z=−g(x, y), z=g(x, y) being a smooth function within a rectangle having sides of length of s in x direction and sides of length of t in y direction, the origin being the center of the rectangle, wherein on the sides of the rectangle, g ⁡ ( x , y ) = 0 , ⁢ ∂ g ⁡ ( x , y ) ∂ x = 0 , ⁢ ∂ g ⁡ ( x , y ) ∂ y = 0 , ⁢ ∂ 2 ⁢ g ⁡ ( x , y ) ∂ x 2 = 0 , and ∂ 2 ⁢ g ⁡ ( x , y ) ∂ y 2 = 0 , and wherein z=g(x, y) has a single vertex at (xv,yv) g(x,y)=h1(x)·h2(y), first derivative of z=h1(x) is continuous in ( - s 2 , s 2 ) , second derivative of z=h1(x) has a single point of discontinuity in ( - s 2 , x v ) and ⁢ ( x v , s 2 ) , first derivative of z=h2(y) is continuous in ( - t 2 , t 2 ) , and second derivative of z=h2(y) has a single point of discontinuity in ( - t 2 , y v ) and ⁢ ( y v , t 2 ) .

    REFLECTOR
    4.
    发明申请

    公开(公告)号:US20220075103A1

    公开(公告)日:2022-03-10

    申请号:US17528398

    申请日:2021-11-17

    申请人: NALUX CO., LTD.

    IPC分类号: G02B5/124 G02B5/04

    摘要: The reflector is provided with plural reflector units. Each reflector unit is shaped as a prism or a cylinder provided with a retroreflective structure at one end, the retroreflective structure is configured to reflect incident rays from the other end of the prism or the cylinder in a direction of incidence, and in a reference cross section of the reflector unit, the reference cross section containing the central axis of the prism or the cylinder and the reference cross section being determined such that the shape of the retroreflective structure is line-symmetric with respect to the central axis in the reference cross section, the shape of a light receiving surface at the other end is line-symmetric with respect to the central axis and has a portion inclined with respect to a direction perpendicular to the central axis in the reflector unit.

    Element provided with portion for position determination and measuring method

    公开(公告)号:US10458882B2

    公开(公告)日:2019-10-29

    申请号:US15664193

    申请日:2017-07-31

    申请人: NALUX CO., LTD.

    摘要: A method for measuring a position of a target surface provided with portions for position determination thereon, wherein a diffuse reflectance of the target surface is 0.1% or less, and a diffuse reflectance of the portions for position determination is 5% or more, and wherein the target surface is configured such that a tangential plane at any point on the target surface where each of the portions for position determination is installed forms an arbitrary angle between 15 degrees and 75 degrees inclusive with a certain direction, the method including the steps of illuminating the target surface with parallel light in the certain direction; determining positions of border lines of the plural portions for position determination from an image of the target surface; and determining the position of the target surface from the positions of the border lines of the plural portions for position determination.

    Optical imaging system
    6.
    发明授权

    公开(公告)号:US10365539B2

    公开(公告)日:2019-07-30

    申请号:US15204728

    申请日:2016-07-07

    申请人: NALUX CO., LTD.

    发明人: Norihisa Sakagami

    IPC分类号: G02B13/22 G02B13/04 G03B11/00

    摘要: An optical imaging system according to the present invention includes, in order from an object side to an image side, a first lens with negative refractive power, a second lens that is a meniscus lens having a convex image-side surface, an aperture stop, a third lens with positive refractive power, and a lens group with positive refractive power. When the center thickness of the first lens is represented as t1, the center thickness of the second lens is represented as t2 and the focal length of the whole system is represented as f, t1/f>1.2 and t2/f>1.2 are satisfied.

    Position determination method and element

    公开(公告)号:US10295754B2

    公开(公告)日:2019-05-21

    申请号:US15967974

    申请日:2018-05-01

    申请人: NALUX CO., LTD.

    IPC分类号: G02B6/38 G01B11/00 G01B11/14

    摘要: A position determination method for determining a position of a point on a flat surface by observing the position of the point and a position of a fiducial portion on the flat surface in an image of a measuring system provided with an imaging optical system using coaxial episcopic illumination is provided. The fiducial portion is in the shape of a pillar at least in the basal portion and provided with an inclined surface surrounding the foot of the pillar. The method includes the steps of determining a position of the outer boundary of the foot from the boundary between the inclined surface and the flat surface in the image; determining the position of the fiducial portion from the position of the outer boundary of the foot; and determining the position of the point with respect to the position of the fiducial portion.

    Lens, mold for lens and method for machining mold
    10.
    发明授权
    Lens, mold for lens and method for machining mold 有权
    透镜,镜片模具及加工模具的方法

    公开(公告)号:US08974086B2

    公开(公告)日:2015-03-10

    申请号:US13339556

    申请日:2011-12-29

    申请人: Masafumi Seigo

    发明人: Masafumi Seigo

    摘要: A lens used for a line generating optical system is provided, wherein X-axis is defined in longitudinal direction of the generated line, Y-axis is defined in width direction and Z-axis is defined in direction of the optical axis and wherein the lens has an optical surface which does not collimate the light in X-axis direction and which collimates or collects the light in Y-axis direction alone, inclination of direction of transferred tool mark with respect to X-axis being from 40 to 50 degrees in an area of 80% or more of the optical surface.

    摘要翻译: 提供了一种用于线生成光学系统的透镜,其中X轴被限定在所生成的线的纵向方向上,Y轴被限定在宽度方向上,Z轴在光轴方向上限定,并且其中透镜 具有不会使X轴方向上的光准直的光学面,并且仅在Y轴方向上准直或收集光,所以在X轴方向上的转印刀具的方向的倾斜度为40〜50度, 面积为80%以上的光学面。