METHOD AND APPARATUS FOR PLASMA-TREATING POROUS BODY
    2.
    发明申请
    METHOD AND APPARATUS FOR PLASMA-TREATING POROUS BODY 有权
    用于等离子体处理多孔体的方法和装置

    公开(公告)号:US20090277776A1

    公开(公告)日:2009-11-12

    申请号:US12066447

    申请日:2006-09-11

    IPC分类号: H05H1/24 B01J19/08

    摘要: A method for plasma-treating a porous body, comprising the steps of generating plasma using an inert gas or a mixed gas of an inert gas and a reactive gas, (a) blowing the resultant plasma gas to the porous body at a flow rate per a unit area of the porous body of 0.002 to 2 L/minute/cm2, (b) sucking the porous body in a plasma gas atmosphere, or (c) sucking the porous body while blowing the plasma gas to the porous body at said flow rate, thereby treating the plasma the surfaces and pores of said porous body with plasma.

    摘要翻译: 一种用于等离子体处理多孔体的方法,包括以下步骤:使用惰性气体或惰性气体和反应性气体的混合气体产生等离子体,(a)以所述流动速率将所产生的等离子体气体吹送至多孔体 多孔体的单位面积为0.002〜2L /分/ cm 2,(b)在等离子体气体气氛中吸附多孔体,或者(c)在所述流动下将等离子体气体吹送到多孔体的同时吸入多孔体 速率,从而用等离子体处理所述多孔体的表面和孔隙的等离子体。