Method and Apparatus for Continuous Coating
    3.
    发明申请
    Method and Apparatus for Continuous Coating 有权
    连续涂层的方法和装置

    公开(公告)号:US20130186328A1

    公开(公告)日:2013-07-25

    申请号:US13791126

    申请日:2013-03-08

    IPC分类号: B05C1/12

    摘要: Disclosed is a method and apparatus for continuous coating with a rotational die in which coating materials flow in a radial direction. The linear speed of a substrate in need of coating is identical to the tangential speed of the surface of the rotational die so that the coating material, which flows in a radial direction of the rotational die, flows onto the substrate perpendicularly. Therefore, the ingredients of coating materials overlap one another (or stand vertically as a layer), and the vertical sequence of the coating material is ensured. This method and apparatus can be used to make organic electronic devices, organic light-emitting diodes and organic photovoltaic devices. Particularly, this method and apparatus can be used in bulk-hetero-junction of mixed coating of P-type and N-type semiconductors.

    摘要翻译: 公开了一种用于连续涂覆旋转模头的方法和装置,其中涂层材料沿径向方向流动。 需要涂布的基板的线速度与旋转模具的表面的切线速度相同,使得沿旋转模头的径向流动的涂层材料垂直流动到基板上。 因此,涂层材料的成分彼此重叠(或者作为层垂直放置),并且确保了涂层材料的垂直顺序。 该方法和装置可用于制造有机电子器件,有机发光二极管和有机光伏器件。 特别地,该方法和装置可以用于P型和N型半导体的混合涂层的体异质结中。

    Apparatus for supplying source
    4.
    发明申请
    Apparatus for supplying source 审中-公开
    用于供应源的装置

    公开(公告)号:US20120018008A1

    公开(公告)日:2012-01-26

    申请号:US12926823

    申请日:2010-12-10

    IPC分类号: F99Z99/00

    摘要: Disclosed herein is an apparatus for supplying a source for constantly maintaining a film source water level in a source reservoir.The apparatus for supplying a source according to the present invention includes a source reservoir into which a liquid-phase film source is injected; a carrier film that is horizontally delivered from one side of the source reservoir; a casting roller that is rotated along the delivery direction of the carrier film and applies the liquid-phase film source injected into the source reservoir to the carrier film; a water level control plate that is vertically driven in the source reservoir to control the liquid-phase film source level; and a plate driving unit that moves the water level control plate up and down.

    摘要翻译: 本文公开了一种用于供应源以持续保持源储罐中的膜源水位的装置。 根据本发明的用于供应源的装置包括其中注入液相膜源的源储存器; 从源储存器的一侧水平地传送的载体膜; 沿着载体膜的传送方向旋转的浇铸辊,将注入到所述源容器中的液相膜源施加到载体膜上; 水位控制板,其在源储液器中垂直驱动以控制液相膜源水平; 以及上下移动水位控制板的板驱动单元。

    Method and Apparatus for Continuous Coating
    10.
    发明申请
    Method and Apparatus for Continuous Coating 有权
    连续涂层的方法和装置

    公开(公告)号:US20100285220A1

    公开(公告)日:2010-11-11

    申请号:US12637415

    申请日:2009-12-14

    IPC分类号: B05D5/00 B05C5/02

    摘要: Disclosed is a method and apparatus for continuous coating with a rotational die in which coating materials flow in a radial direction. The linear speed of a substrate in need of coating is identical to the tangential speed of the surface of the rotational die so that the coating material, which flows in a radial direction of the rotational die, flows onto the substrate perpendicularly. Therefore, the ingredients of coating materials overlap one another (or stand vertically as a layer), and the vertical sequence of the coating material is ensured. This method and apparatus can be used to make organic electronic devices, organic light-emitting diodes and organic photovoltaic devices. Particularly, this method and apparatus can be used in bulk-hetero-junction of mixed coating of P-type and N-type semiconductors.

    摘要翻译: 公开了一种用于连续涂覆旋转模头的方法和装置,其中涂层材料沿径向方向流动。 需要涂布的基板的线速度与旋转模具的表面的切线速度相同,使得沿旋转模头的径向流动的涂层材料垂直流动到基板上。 因此,涂层材料的成分彼此重叠(或者作为层垂直放置),并且确保了涂层材料的垂直顺序。 该方法和装置可用于制造有机电子器件,有机发光二极管和有机光伏器件。 特别地,该方法和装置可以用于P型和N型半导体的混合涂层的体异质结中。