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132 条记录 (耗时 0.019 秒)

    Method for utilizing sulfuric acid/peroxide liquid mixture
    1.
    发明授权
    Method for utilizing sulfuric acid/peroxide liquid mixture 有权
    利用硫酸/过氧化物液体混合物的方法

    公开(公告)号：US06649070B2

    公开(公告)日：2003-11-18

    申请号：US09203503

    申请日：1998-12-01

    申请人： Yasuhito Inagaki

    发明人： Yasuhito Inagaki

    IPC分类号： C01B1790

    CPC分类号： C01B17/90

    摘要： A technique of utilizing a sulfuric acid/peroxide liquid mixture, for example, its waste liquid material, is to be developed so that the waste liquid can be re-utilized and effectively applied to obviate the problem resulting from disposal. To this end, there is provided a method for utilizing a sulfuric acid/peroxide liquid mixture, for example, its waste liquid, in which peroxide in the sulfuric acid/peroxide liquid mixture is decomposed to render it possible to utilize the liquid mixture as sulfuric acid.

    摘要翻译： 要开发利用硫酸/过氧化物液体混合物（例如其废液材料）的技术，以便废液可被再利用和有效地应用以消除由处置产生的问题。 为此，提供了利用硫酸/过氧化物液体混合物（例如其废液）的方法，其中硫酸/过氧化物液体混合物中的过氧化物被分解，使得可以将液体混合物用作硫酸 酸。

    Method for producing high-purity sulphuric acid
    2.
    发明申请
    Method for producing high-purity sulphuric acid 有权
    生产高纯度硫酸的方法

    公开(公告)号：US20020192144A1

    公开(公告)日：2002-12-19

    申请号：US10168869

    申请日：2002-06-26

    发明人： Martin Hostalek ,  Werner Buttner ,  Rolf Hafner ,  Chih-Peng Lu ,  Ching-Jung Kan ,  Erkehart Seitz ,  Ernst Friedel

    IPC分类号： C01B017/69

    CPC分类号： C01B17/69 ,  C01B17/90 ,  C01P2006/80

    摘要： The invention relates to a novel method for producing high-purity sulfuric acid for use in the semiconductor industry. The method comprises the addition of a hydrogen peroxide solution to an engineered oelum in order to reduce the SO2 concentration, evaporation of the SO3 and separation of acid traces. The high-purity SO3 is then enriched with inert gas and the SO3 is absorbed into sulfuric acid.

    摘要翻译： 本发明涉及一种生产用于半导体工业的高纯度硫酸的新方法。 该方法包括向工程化的oelum中加入过氧化氢溶液以便降低SO 2浓度，SO 3的蒸发和酸痕迹的分离。 然后，高纯SO3富含惰性气体，SO3被​​吸收到硫酸中。

    Waste acid recovery
    3.
    发明授权
    Waste acid recovery 失效
    废酸回收

    公开(公告)号：US6159382A

    公开(公告)日：2000-12-12

    申请号：US167563

    申请日：1998-10-07

    申请人： Lawrence D. Conant ,  Arie Keus

    发明人： Lawrence D. Conant ,  Arie Keus

    IPC分类号： C01B17/90 ,  C01B17/92 ,  C07C2/54

    CPC分类号： F28F19/008 ,  C01B17/90 ,  C01B17/92 ,  C07C2/54 ,  C02F2101/10 ,  F28F27/02 ,  Y02P20/145

    摘要： A process for purifying a sulfuric acid solution such as by cooling a sulfuric acid solution to at or near its freezing point to form a slurry of a solid phase and a liquid phase. The slurry has an acid-rich region and an acid-poor region. The acid-rich region is separated from the acid-poor region on the basis of density.

    摘要翻译： 一种纯化硫酸溶液的方法，例如通过将硫酸溶液冷却至其冰点或其附近，形成固相和液相的浆液。 该浆液具有酸富集区域和酸性差的区域。 基于密度将酸富集区域与酸性贫乏区域分离。

    Sulfuric acid reprocessor with continuous purge of second distillation vessel
    5.
    发明授权
    Sulfuric acid reprocessor with continuous purge of second distillation vessel 失效
    连续吹扫第二蒸馏容器的硫酸再处理器

    公开(公告)号：US5061348A

    公开(公告)日：1991-10-29

    申请号：US481708

    申请日：1990-02-15

    申请人： Marshall W. McCormick ,  Jesse C. Dobson

    发明人： Marshall W. McCormick ,  Jesse C. Dobson

    IPC分类号： B01D3/00 ,  B01D3/10 ,  C01B17/90

    CPC分类号： B01D3/007 ,  B01D3/10 ,  C01B17/90 ,  C01B17/901 ,  Y10S159/19 ,  Y10S203/02 ,  Y10S203/09

    摘要： An apparatus and method for reprocessing waste piranha containing contaminated H.sub.2 SO.sub.4 from, for example, a semiconductor processing operation is described. The apparatus and method include a first distillation flask which is maintained under a substantial vacuum. The first distillation flask includes a first column packed with a column packing material and an input pipe for refluxing to retard loss of H.sub.2 SO.sub.4 in the first distillation. The second distillation flask boils off substantially pure H.sub.2 SO.sub.4 and provides for a continuous automatic purge of the contaminants from the second distillation flask thus improving the purity of the H.sub.2 SO.sub.4. The substantially pure H.sub.2 SO.sub.4 flows through a column which is coupled to a condenser which condenses substantially pure H.sub.2 SO.sub.4.

    摘要翻译： 描述了一种用于从例如半导体处理操作中再处理含有污染的H 2 SO 4的废弃食人鱼的设备和方法。 该装置和方法包括保持在基本上真空下的第一蒸馏烧瓶。 第一蒸馏瓶包括填充有柱填料的第一塔和用于回流以延迟第一蒸馏中H 2 SO 4的损失的输入管。 第二蒸馏瓶烧掉基本上纯的H 2 SO 4并提供从第二蒸馏瓶连续自动清除污染物，从而提高H 2 SO 4的纯度。 基本上纯的H 2 SO 4流过与冷凝器相连的塔，该冷凝器冷凝基本上纯的H 2 SO 4。

    Sulfuric acid reprocessor
    6.
    发明授权
    Sulfuric acid reprocessor 失效
    硫酸再处理器

    公开(公告)号：US5032218A

    公开(公告)日：1991-07-16

    申请号：US398074

    申请日：1989-08-24

    申请人： Jesse C. Dobson

    发明人： Jesse C. Dobson

    IPC分类号： C23F1/46 ,  B01D3/00 ,  B01D3/10 ,  C01B17/90

    CPC分类号： B01D3/10 ,  B01D3/007 ,  C01B17/90 ,  C01B17/901 ,  Y10S159/15 ,  Y10S159/19 ,  Y10S203/02 ,  Y10S203/09

    摘要： An apparatus and method for reprocessing waste oxidant solution containing contaminated H.sub.2 SO.sub.4 from, for example, a semiconductor processing operation to supply reprocessed ultrapure H.sub.2 SO.sub.4 and ozone is described. The apparatus and method include a two distillation flasks which are maintained under a substantial vacuum. The first distillation flask includes a first column with a column packing means and a reflux means to retard loss of H.sub.2 SO.sub.4 in the first distillation. The second distillation flask boils off substantially pure H.sub.2 SO.sub.4 through a column which is coupled to a condenser which condenses substantially pure H.sub.2 SO.sub.4. The apparatus and method further include an ozone generator and ozone addition module to saturate the substantially pure H.sub.2 SO.sub.4 with ozone to provide an oxidant solution for the semiconductor processing operation. The apparatus and method further includes an ozone destruction unit which destroys the ozone in the waste oxidant solution that is removed from the semiconductor processing operation.

    摘要翻译： 描述了一种用于再处理含有受污染的H 2 SO 4的废氧化剂溶液的设备和方法，例如从提供再加工的超纯H2SO4和臭氧的半导体加工操作。 该装置和方法包括保持在基本真空下的两个蒸馏瓶。 第一蒸馏瓶包括具有柱填充装置的第一塔和用于在第一蒸馏中延迟H 2 SO 4的损失的回流装置。 第二蒸馏瓶通过与冷凝器相连的柱子将基本上纯的H 2 SO 4烧掉，冷凝器冷凝基本上纯的H 2 SO 4。 该装置和方法还包括臭氧发生器和臭氧添加模块，用臭氧使基本上纯的H 2 SO 4饱和，以提供用于半导体加工操作的氧化剂溶液。 该装置和方法还包括臭氧破坏单元，其破坏从半导体处理操作中去除的废氧化剂溶液中的臭氧。

    Process for purifying sulfuric acid for the catalytic synthesis of hydroxylammonium sulfate
    7.
    发明授权
    Process for purifying sulfuric acid for the catalytic synthesis of hydroxylammonium sulfate 失效
    用于硫酸铵催化合成硫酸的方法

    公开(公告)号：US3787563A

    公开(公告)日：1974-01-22

    申请号：US3787563D

    申请日：1972-03-03

    申请人： BASF AG

    发明人： KARTTE K ,  TAGLINGER L ,  JOCKERS K ,  MEIER H

    IPC分类号： C01B17/90 ,  C01B21/14 ,  C01B31/02

    CPC分类号： C01B21/1418 ,  C01B17/90

    摘要： PROCESS FOR THE PURIFICATION OF SULFIRIC ACID TO BE USED IN THE MANUFACTURE OF HYDROXYLAMMONIUM SULFATE BY REDUCTION OF NITRIC OXIDE IN CONTACT WITH PLATNIUM CATALYSTS. THE PROCESS CONSISTS IN DILUTING THE SULFURIC ACID WITH WATER, ADDING SUCH AN AMOUNT OF SULFUR DIOXIDE THAT AFTER TREATMENT WITH ACTIVATED CARBON IN STILL HAS A CONTENT OF AT LEAST 5 MG. OF SO2 PER LITER OF DILUTE ACID AND THEN TREATING THE SULFURIC ACID TOGETHER WITH AIR, OXYGEN OR HYDROGEN PEROXIDE AGAIN WITH ACTIVATED CARBON. THE ACTIVATED CARBON CAN BE REGENERATED BY TREATMENT WITH ALKALINE SUBSTANCES SUCH AS CAUSTIC SODA SOLUTION, AQUEOUS AMMONIA SOLUTION OR SODIUM CARBONATE SOLUTION.