WAVELENGTH MEASUREMENT APPARATUS, NARROWED-LINE LASER APPARATUS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICES

    公开(公告)号:US20240044711A1

    公开(公告)日:2024-02-08

    申请号:US18487774

    申请日:2023-10-16

    Inventor: Takuma YAMANAKA

    CPC classification number: G01J3/45 H01S3/08086 G01J2003/003

    Abstract: A wavelength measurement apparatus includes a first spectrometer that has a first free spectral range and generates a first measured waveform from an interference pattern produced by a pulse laser beam, a second spectrometer that has a second free spectral range narrower than the first free spectral range and generates a second measured waveform from the interference pattern produced by the pulse laser beam, and a processor that reads data on a first measurement range of the first spectrometer, sets a second measurement range of the second spectrometer based on the data on the first measurement range, reads data on the second measurement range, and calculates a center wavelength of the pulse laser beam based on the data on the first measurement range and the data on the second measurement range.

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