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    Optical recording medium
    2.
    发明授权
    Optical recording medium 有权

    公开(公告)号：US11837265B2

    公开(公告)日：2023-12-05

    申请号：US17757482

    申请日：2020-12-23

    申请人： SONY GROUP CORPORATION

    发明人： Yasuhiro Sone

    IPC分类号： G11B5/62 ,  G11B7/24 ,  G11B7/24027 ,  G11B7/007 ,  G11B7/24056 ,  G11B7/243

    CPC分类号： G11B7/24027 ,  G11B7/00718 ,  G11B7/243 ,  G11B7/24056 ,  G11B2007/24302

    摘要： An optical recording medium includes a plurality of information signal layers. The plurality of information signal layers include a recording layer having a first surface that faces a light irradiation surface and a second surface on the side opposite to the first surface, a first dielectric layer that is provided on the side of the first surface, and a second dielectric layer that is provided on the side of the second surface. The second dielectric layer provided in the information signal layer positioned on the innermost side when viewed from the light irradiation surface contains indium oxide and tin oxide. The recording layer provided in the information signal layer positioned on the innermost side when viewed from the light irradiation surface contains an oxide of a metal MA, an oxide of a metal MB, an oxide of a metal MD, and an oxide of a metal ME, the metal MA is at least one selected from the group consisting of Mn and Ni, the metal MB is at least one selected from the group consisting of W, Mo, Zr and Ta, the metal MD is at least one selected from the group consisting of Cu and Ag, the metal ME is Nb, the contents of the metal MA, the metal MB and the metal ME satisfy the relationship of 0.30≤a1/(b1+e1)≤0.41 (where, a1: atomic ratio [atomic %] of the metal MA with respect to a total amount of the metal MA, the metal MB, the metal MD and the metal ME, b1: atomic ratio [atomic %] of the metal MB with respect to a total amount of the metal MA, the metal MB, the metal MD and the metal ME, and e1: atomic ratio [atomic %] of the metal ME with respect to a total amount of the metal MA, the metal MB, the metal MD and the metal ME), and the atomic ratio e1 of the metal ME with respect to a total amount of the metal MA, the metal MB, the metal MD and the metal ME is 5 atomic % or more and 18 atomic % or less.

    METAL OXIDE-METAL COMPOSITE SPUTTERING TARGET
    5.
    发明申请
    METAL OXIDE-METAL COMPOSITE SPUTTERING TARGET 审中-公开
    金属氧化物金属复合溅射靶

    公开(公告)号：US20120181172A1

    公开(公告)日：2012-07-19

    申请号：US13496899

    申请日：2010-09-15

    申请人： Hitoshi Matsuzaki ,  Katsutoshi Takagi ,  Norihiro Jiko ,  Masaya Ehira

    发明人： Hitoshi Matsuzaki ,  Katsutoshi Takagi ,  Norihiro Jiko ,  Masaya Ehira

    IPC分类号： C23C14/34 ,  C23C14/08

    CPC分类号： G11B7/266 ,  C23C14/3414 ,  G11B2007/24302 ,  G11B2007/2432

    摘要： Disclosed is a metal oxide-metal composite sputtering target which is useful for the formation of a recording layer for an optical information recording medium, said recording layer containing a metal oxide and a metal. Specifically disclosed is a composite sputtering target containing a metal oxide (A) and a metal (B), wherein the maximum value of the circle-equivalent diameter of the metal oxide (A) is controlled to 200 μm or less.

    摘要翻译： 公开了一种金属氧化物 - 金属复合溅射靶，其用于形成用于光学信息记录介质的记录层，所述记录层含有金属氧化物和金属。 具体公开了包含金属氧化物（A）和金属（B）的复合溅射靶，其中金属氧化物（A）的圆当量直径的最大值被控制在200μm以下。