Foreign matter removing apparatus, substrate treating apparatus, and substrate treating method
    1.
    发明申请
    Foreign matter removing apparatus, substrate treating apparatus, and substrate treating method 审中-公开
    异物去除装置,基板处理装置和基板处理方法

    公开(公告)号:US20040261817A1

    公开(公告)日:2004-12-30

    申请号:US10873017

    申请日:2004-06-21

    CPC classification number: H01L21/67051

    Abstract: A foreign matter removing apparatus for removing foreign matter from a surface of a substrate. The apparatus is provided with: a substrate rotating mechanism which holds and rotates the substrate; and a fluid mixture supplying mechanism which generates a fluid mixture by mixing a treatment liquid and a gas, and supplies the fluid mixture onto the surface of the substrate held by the substrate rotating mechanism. The treatment liquid may be deionized water or a resist removing liquid. Examples of the foreign matter to be removed include a resist film formed on the substrate and a residue remaining on the surface of the substrate after ashing of the resist film.

    Abstract translation: 一种用于从基板的表面去除异物的异物去除装置。 该装置设置有:保持并旋转基板的基板旋转机构; 以及流体混合物供给机构,其通过混合处理液体和气体而产生流体混合物,并将流体混合物供给到由基板旋转机构保持的基板的表面上。 处理液体可以是去离子水或抗蚀剂去除液体。 待除去的异物的实例包括形成在基板上的抗蚀剂膜和在抗蚀剂膜灰化之后剩余在基板表面上的残余物。

    Liquid-assisted cryogenic cleaning
    3.
    发明申请
    Liquid-assisted cryogenic cleaning 有权
    液体辅助低温清洗

    公开(公告)号:US20040255984A1

    公开(公告)日:2004-12-23

    申请号:US10886251

    申请日:2004-07-07

    Abstract: The present invention is directed to the use of a high vapor pressure liquid prior to or simultaneous with cryogenic cleaning to remove contaminants from the surface of substrates requiring precision cleaning such as semiconductors, metal films, or dielectric films. A liquid suitable for use in the present invention preferably has a vapor pressure above 5 kPa and a freezing point below null50null C.

    Abstract translation: 本发明涉及在低温清洗之前或同时进行高蒸气压液体的使用,以从需要精密清洗的基板表面去除污染物,例如半导体,金属膜或电介质膜。 适用于本发明的液体优选具有高于5kPa的蒸气压和低于-50℃的凝固点。

    Apparatus for cleaning eggs by conveying thereof upon multiple conveyors through washers which are vertically tiered
    4.
    发明申请
    Apparatus for cleaning eggs by conveying thereof upon multiple conveyors through washers which are vertically tiered 有权
    用于通过在多个输送机上通过垂直分层的垫圈将其输送来清洗鸡蛋的装置

    公开(公告)号:US20040238017A1

    公开(公告)日:2004-12-02

    申请号:US10877671

    申请日:2004-06-25

    Inventor: Jeffrey B. Kuhl

    CPC classification number: A01K43/005

    Abstract: A method and apparatus is disclosed for washing of eggs including a housing with a first feed conveyor for receiving eggs through the housing inlet and conveying these eggs to a second conveyor. The second conveyor transports the eggs through an intermediate egg washing means which can include cylindrical brushes, flat brushes or end brushes for cleaning of eggs therebelow and includes a means dispensing cleaning solution onto the egg surfaces. The eggs are then transferred from the second conveying means to a third conveying means which are transported through a brush and cleaning solution lower washing station for final cleaning thereof. The eggs then exit through an outlet for sanitizing and/or drying as may be necessary. The three conveyors utilized in this invention are vertically tiered and preferably the second conveyor will move in a direction immediately below and opposite relative to the first conveyor and the third conveyor will move in the direction similar to the first conveyor but below the second conveyor. In this manner a three tiered arranging of conveyors is provided. The first conveyor can include a pre-washing station for minimizing dirt retention on the egg surfaces by extending the time period upon which the cleaning is in contact with the exterior surface of the eggs.

    Abstract translation: 公开了一种用于洗涤蛋的方法和装置,其包括具有第一进料输送器的壳体,所述第一进料输送器用于通过壳体入口接收蛋,并将这些蛋输送到第二输送器。 第二输送机通过中间蛋清装置输送蛋,该装置可以包括圆柱形刷子,平面刷子或用于清洗下面的蛋的末端刷子,并且包括将清洁溶液分配到蛋表面上的装置。 然后将鸡蛋从第二输送装置转移到第三输送装置,该第三输送装置通过刷子和清洁溶液下部洗涤站运输,以进行最终清洁。 鸡蛋然后通过出口排出,以进行消毒和/或干燥(根据需要)。 本发明中使用的三个输送机是垂直分层的,并且优选地,第二输送机将沿着相对于第一输送机的下方和相对的方向移动,并且第三输送机将沿与第一输送机相似的方向移动但在第二输送机下方移动。 以这种方式提供输送机的三层排列。 第一输送机可以包括预清洗站,用于通过延长清洁与蛋的外表面接触的时间段来最小化蛋表面上的污垢保留。

    SAND REMOVAL SYSTEM
    6.
    发明申请
    SAND REMOVAL SYSTEM 审中-公开
    SAND拆除系统

    公开(公告)号:US20040226587A1

    公开(公告)日:2004-11-18

    申请号:US10249912

    申请日:2003-05-16

    CPC classification number: B08B9/093 B08B9/0933

    Abstract: A sand removal system for an oil storage tank includes an upper and lower pipe ring each having multiple nozzles for spraying a wash fluid. The nozzles are aimed to create a vortex or spiral motion within the tank and suspend the sand. A suction pipe with a centrally located inlet removes the wash fluid and suspended sand.

    Abstract translation: 用于储油箱的除砂系统包括具有用于喷射洗涤流体的多个喷嘴的上下管环。 这些喷嘴旨在在罐内产生涡流或螺旋运动并悬挂沙子。 具有中心位置的入口的吸入管去除洗涤液和悬浮砂。

    Method and system for cleaning a semiconductor wafer
    7.
    发明申请
    Method and system for cleaning a semiconductor wafer 审中-公开
    用于清洁半导体晶片的方法和系统

    公开(公告)号:US20040216764A1

    公开(公告)日:2004-11-04

    申请号:US10766733

    申请日:2004-01-27

    CPC classification number: H01L21/67051 H01L21/67046

    Abstract: A method and a system are provided for cleaning a surface of a wafer. The method starts by scrubbing the surface of the wafer with a cleaning brush that applies a chemical solution to the surface of the wafer. In one example, the cleaning brush implements a through the brush (TTB) technique to apply the chemicals. The scrubbing is generally performed in a brush box, with a top cleaning brush and a bottom cleaning brush. The top cleaning brush is then removed from contact with the surface of the wafer. The chemical concentration in the top brush may be maintained at substantially the same concentration that was in the brush during the scrubbing operation. Next, a flow of water (preferably de-ionized water) is delivered to the surface of the wafer. The delivery of water is preferably configured to remove substantially all of the chemical solution from the surface of the wafer before proceeding to a next cleaning operation.

    Abstract translation: 提供了一种用于清洁晶片表面的方法和系统。 该方法首先用清洁刷擦洗晶片的表面,该清洁刷将化学溶液施加到晶片的表面。 在一个示例中,清洁刷实现了通过刷(TTB)技术来施加化学品。 洗刷通常在刷盒中进行,顶部清洁刷和底部清洁刷。 然后将顶部清洁刷除去与晶片表面的接触。 在洗刷操作期间,顶刷中的化学浓度可以保持在与刷中基本相同的浓度。 接下来,将水流(优选去离子水)输送到晶片的表面。 水的输送优选构造成在进行下一次清洁操作之前从晶片表面去除基本上所有的化学溶液。

    Static charge neutralizer
    8.
    发明申请
    Static charge neutralizer 有权
    静电电荷中和剂

    公开(公告)号:US20040212945A1

    公开(公告)日:2004-10-28

    申请号:US10814491

    申请日:2004-03-31

    CPC classification number: B01D29/15 B01D2201/50

    Abstract: A passive device to neutralize electrostatic charging of transient hydrocarbon fluid when it exits a filter monitor cartridge is described. Filter cartridges containing filter media generate electrostatic charges which flow with the transient hydrocarbon fluid as it exits the filter cartridge using corona discharge.

    Abstract translation: 描述了当其离开过滤器监视器盒时中和暂时烃流体静电充电的被动装置。 含有过滤介质的过滤器滤芯产生静电电荷,当电流离开滤芯时,瞬态碳氢化合物流体会流动。

    Methods of and apparatus for washing high-density microplates
    9.
    发明申请
    Methods of and apparatus for washing high-density microplates 失效
    洗涤高密度微孔板的方法和设备

    公开(公告)号:US20040200509A1

    公开(公告)日:2004-10-14

    申请号:US10408108

    申请日:2003-04-08

    Abstract: Methods of and apparatus for washing an array of sites in high-density microplates or similar assay plates wherein the microplates or assay plates are washed in an inverted or nearly inverted position, rather than in an upright position. Preferably, the wash liquid is dispensed upwardly in the form of a sheet from a nozzle mounted on a spray bar as the spray bar moves relative to the microplate or assay plate. After washing, the microplate or assay plate is dried with a stream of gas such as air, also preferably blown upwardly in the form of a sheet.

    Abstract translation: 在高密度微孔板或类似测定板中洗涤位点阵列的方法和装置,其中微孔板或测定板以颠倒或接近倒置的位置而不是直立位置洗涤。 优选地,当喷雾杆相对于微板或测定板移动时,洗涤液体以安装在喷雾杆上的喷嘴从片材的形式向上分配。 洗涤后,用气流例如空气干燥微板或测定板,最好以片状向上吹。

    Method and device for producing turbulences and the distribution thereof
    10.
    发明申请
    Method and device for producing turbulences and the distribution thereof 失效
    产生湍流的方法和装置及其分布

    公开(公告)号:US20040182426A1

    公开(公告)日:2004-09-23

    申请号:US10483547

    申请日:2004-01-09

    CPC classification number: B08B9/0933 B01F5/0206 B01F2003/125 B01F2005/0025

    Abstract: Each immersed jet creates turbulences as a result of the resistance of the medium in which it is immersed and at the end of its effective range the complete introduced energy is broken down into turbulent flows. These turbulent flows observed as a whole are local, thus are small-scale. It is however indeed these small-scale turbulences which have a strong eroding effect and it is the object of the invention to produced as high a number as possible of small-scale turbulences and to distribute these over a large volume. Large volume is to be understood as for example 3000-4000 m3 on a surface of 2000 m2 and a height of 2 m as is the case with a storage tank of 50 m diameter and a liquid column of 3 m. The problem thus lies in the optimal distribution of the introduced energy.

    Abstract translation: 每个浸入式喷射器由于浸入其中的介质的电阻而产生湍流,并且在其有效范围的最后,完全引入的能量被分解成湍流。 观察到的这些湍流是局部的,因此是小规模的。 然而,这些小型湍流确实具有很强的侵蚀作用,本发明的目的是产生尽可能多的小型湍流并将其分布在大体积上。 在2000m 2的表面上,体积应该被理解为例如3000-4000m 3,高度为2m,如直径为50μm的储罐和3m的液柱 。 因此,问题在于引入能量的最佳分布。

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