Abstract:
A foreign matter removing apparatus for removing foreign matter from a surface of a substrate. The apparatus is provided with: a substrate rotating mechanism which holds and rotates the substrate; and a fluid mixture supplying mechanism which generates a fluid mixture by mixing a treatment liquid and a gas, and supplies the fluid mixture onto the surface of the substrate held by the substrate rotating mechanism. The treatment liquid may be deionized water or a resist removing liquid. Examples of the foreign matter to be removed include a resist film formed on the substrate and a residue remaining on the surface of the substrate after ashing of the resist film.
Abstract:
A dishwasher includes a water inlet connectable to a water source. A dishwasher element is operable on water received through the inlet. A flow sensor is in fluid communication with the inlet and is operable to generate a control signal indicative of water flow through the inlet. A control apparatus is connected between the dishwasher element and the flow sensor and is operable to inhibit operation of the dishwasher element in response to the control signal.
Abstract:
The present invention is directed to the use of a high vapor pressure liquid prior to or simultaneous with cryogenic cleaning to remove contaminants from the surface of substrates requiring precision cleaning such as semiconductors, metal films, or dielectric films. A liquid suitable for use in the present invention preferably has a vapor pressure above 5 kPa and a freezing point below null50null C.
Abstract:
A method and apparatus is disclosed for washing of eggs including a housing with a first feed conveyor for receiving eggs through the housing inlet and conveying these eggs to a second conveyor. The second conveyor transports the eggs through an intermediate egg washing means which can include cylindrical brushes, flat brushes or end brushes for cleaning of eggs therebelow and includes a means dispensing cleaning solution onto the egg surfaces. The eggs are then transferred from the second conveying means to a third conveying means which are transported through a brush and cleaning solution lower washing station for final cleaning thereof. The eggs then exit through an outlet for sanitizing and/or drying as may be necessary. The three conveyors utilized in this invention are vertically tiered and preferably the second conveyor will move in a direction immediately below and opposite relative to the first conveyor and the third conveyor will move in the direction similar to the first conveyor but below the second conveyor. In this manner a three tiered arranging of conveyors is provided. The first conveyor can include a pre-washing station for minimizing dirt retention on the egg surfaces by extending the time period upon which the cleaning is in contact with the exterior surface of the eggs.
Abstract:
An ionic surfactant-based protomicroemulsion or microemulsion composition contains, by weight, at least about 20% of an ionic surfactant system, from about 0.1% to about 50% of a low water-soluble compound, and from about 5% to about 79% of a solvent, and is substantially free of low water-soluble oils. The protomicroemulsion forms a microemulsion when diluted from about 10% to about 99% with water.
Abstract:
A sand removal system for an oil storage tank includes an upper and lower pipe ring each having multiple nozzles for spraying a wash fluid. The nozzles are aimed to create a vortex or spiral motion within the tank and suspend the sand. A suction pipe with a centrally located inlet removes the wash fluid and suspended sand.
Abstract:
A method and a system are provided for cleaning a surface of a wafer. The method starts by scrubbing the surface of the wafer with a cleaning brush that applies a chemical solution to the surface of the wafer. In one example, the cleaning brush implements a through the brush (TTB) technique to apply the chemicals. The scrubbing is generally performed in a brush box, with a top cleaning brush and a bottom cleaning brush. The top cleaning brush is then removed from contact with the surface of the wafer. The chemical concentration in the top brush may be maintained at substantially the same concentration that was in the brush during the scrubbing operation. Next, a flow of water (preferably de-ionized water) is delivered to the surface of the wafer. The delivery of water is preferably configured to remove substantially all of the chemical solution from the surface of the wafer before proceeding to a next cleaning operation.
Abstract:
A passive device to neutralize electrostatic charging of transient hydrocarbon fluid when it exits a filter monitor cartridge is described. Filter cartridges containing filter media generate electrostatic charges which flow with the transient hydrocarbon fluid as it exits the filter cartridge using corona discharge.
Abstract:
Methods of and apparatus for washing an array of sites in high-density microplates or similar assay plates wherein the microplates or assay plates are washed in an inverted or nearly inverted position, rather than in an upright position. Preferably, the wash liquid is dispensed upwardly in the form of a sheet from a nozzle mounted on a spray bar as the spray bar moves relative to the microplate or assay plate. After washing, the microplate or assay plate is dried with a stream of gas such as air, also preferably blown upwardly in the form of a sheet.
Abstract:
Each immersed jet creates turbulences as a result of the resistance of the medium in which it is immersed and at the end of its effective range the complete introduced energy is broken down into turbulent flows. These turbulent flows observed as a whole are local, thus are small-scale. It is however indeed these small-scale turbulences which have a strong eroding effect and it is the object of the invention to produced as high a number as possible of small-scale turbulences and to distribute these over a large volume. Large volume is to be understood as for example 3000-4000 m3 on a surface of 2000 m2 and a height of 2 m as is the case with a storage tank of 50 m diameter and a liquid column of 3 m. The problem thus lies in the optimal distribution of the introduced energy.