公开(公告)号：US20110312254A1

公开(公告)日：2011-12-22

申请号：US13164081

申请日：2011-06-20

申请人： Harumichi KOYAMA

发明人： Harumichi KOYAMA

IPC分类号： B24B53/10 ,  B24B53/12 ,  B24B1/00

CPC分类号： B24B37/08 ,  B24B53/017

摘要： The method of the present invention are capable of stabilizing a polishing rate, reducing number of times of performing dressing operations, improving work efficiency and extending a span of life of the polishing pad. The method for dressing a polishing pad, which has been used to polish a surface of a work by pressing the work onto the polishing pad fixed on a polishing plate with supplying slurry thereto, by using a grind stone, comprises the steps of: cleaning the polishing pad by supplying high-pressure cleaning water to the polishing pad; and dressing the polishing pad by moving a dressing grind stone, in the radial direction of the polishing pad, along a surface profile thereof, while performing the cleaning step.

摘要翻译： 本发明的方法能够稳定抛光速度，减少进行修整操作的次数，提高工作效率并延长抛光垫的使用寿命。 通过使用磨石将已经用于将工件压在固定在研磨板上的抛光垫上的抛光垫上的用于抛光工件表面的抛光垫的方法包括以下步骤：清洁 抛光垫，通过向抛光垫提供高压清洗水; 并且在执行清洁步骤的同时沿着抛光垫的径向移动修整研磨石沿其表面轮廓来修整抛光垫。

公开(公告)号：US5167667A

公开(公告)日：1992-12-01

申请号：US533479

申请日：1990-06-05

申请人： Helene Prigge ,  Josef Lang

发明人： Helene Prigge ,  Josef Lang

IPC分类号： B24B53/10 ,  B24B53/00 ,  B24B53/007 ,  B24B53/017

CPC分类号： B24B53/017

摘要： In the chemo-mechanical polishing, in particular, of semiconductor wafers,he abrasion and the geometrical quality of the wafers decreases with increasing service life of the polishing cloth. This can be prevented by treating the polishing cloth in each case after the polishing operation in a manner such that a pressure field is impressed, essentially without mechanical stress, on the polishing cloth, which pressure field causes a treatment liquid to flow through the interior of the polishing cloth and in this process the residues produced during polishing are rendered mobile and removed. A baseplate placed transversely across the polishing cloth and having a flat working surface provided with exit openings for the treatment liquid is suitable for carrying out the process. In the treatment, the treatment liquid is forced beneath the baseplate into the moving polishing cloth so that the latter is gradually traversed by the zone through which flow takes place.

摘要翻译： 在化学机械抛光中，特别是半导体晶片的研磨，晶片的磨损和几何质量随着抛光布的使用寿命的增加而减小。 这可以通过在抛光操作之后的每种情况下处理抛光布以这样的方式来防止，即在抛光布上施加压力场（基本上没有机械应力），该压力场使得处理液体流过内部 抛光布，并且在该过程中，在抛光期间产生的残余物被移动并移除。 横置于抛光布上的基板具有设置有用于处理液体的出口的平坦工作表面，适用于进行该过程。 在处理中，将处理液体强制在基板下方进入移动的抛光布中，使得后者逐渐穿过流过的区域。

公开(公告)号：US4720939A

公开(公告)日：1988-01-26

申请号：US867331

申请日：1986-05-23

申请人： Steven C. Simpson ,  Ronald D. Witt ,  Gregory E. Volkland

发明人： Steven C. Simpson ,  Ronald D. Witt ,  Gregory E. Volkland

IPC分类号： B24B53/10

CPC分类号： B24B53/10

摘要： A device for cleaning abrasive surfaces used in wood sanding operations includes a frame attached to the frame of a belt sanding machine. A retainer assembly is carried by the frame and receives a block of natural or synthetic rubber cleaning material. The retainer assembly and associated block are selectively moved into position whereby abrasive contact of the block with a running belt for cleaning is achieved. The movement of the cartridge assembly is controlled by a fluid cylinder arrangement. Hydraulic withdrawal cylinders at either end of the frame are set to lift the cartridge assembly and block in an upward direction out of a contact position with the sanding belt. A central fluid projection cylinder is used to overcome the upward force of the two outer cylinders, for forcing the block into operative contact with the belt when desired. Controls are provided for regulating contact time with the belt depending on operating conditions. Alternative controls may also be used to adjust the pressure in the cylinders to compensate for the changing weight of the block as it is worn away during use.

摘要翻译： 用于清洁用于木材打磨操作中的研磨表面的装置包括附接到带式砂光机的框架上的框架。 保持器组件由框架承载并接收一块天然或合成橡胶清洁材料。 保持器组件和相关联的块被选择性地移动到位，由此实现块与用于清洁的行进带的磨料接触。 墨盒组件的运动由流体气缸装置控制。 设置框架任一端的液压取出缸将提升盒组件并向上方向阻止与砂带的接触位置。 使用中央液体喷射筒来克服两个外部气缸的向上的力，以便在需要时迫使气囊与皮带接触。 根据操作条件，提供控制以调节与皮带的接触时间。 也可以使用替代控制来调节气缸中的压力，以补偿块在使用过程中磨损时的重量变化。

公开(公告)号：US6036589A

公开(公告)日：2000-03-14

申请号：US179384

申请日：1998-10-27

申请人： Cliff Reilly ,  James T Kelly

发明人： Cliff Reilly ,  James T Kelly

IPC分类号： B24B23/06 ,  B24B53/10

CPC分类号： B24B53/10 ,  B24B23/06

摘要： A cleaner for a belt sander comprising a mounting plate pivotally coupled to a supporting plate having a cleaning block mounted thereon. The mounting plate is adapted to be mounted to the cover of a belt sander. When the two plates are pivoted closed, the cleaning block is facing away from the abrasive belt of the belt sander so that the sander can be used for sanding. When it is desired to clean the belt, the plates are pivoted open, so that the cleaning block rests against the belt and can clean the belt as it rotates through the sander. The cleaner is especially adapted for use on portable belt sanders.

摘要翻译： 一种用于带式打磨机的清洁器，包括可枢转地联接到其上安装有清洁块的支撑板的安装板。 安装板适于安装在带式砂磨机的盖上。 当两个板旋转关闭时，清洁块面向远离带式砂磨机的砂带，使砂磨机可用于打磨。 当需要清洁皮带时，打印板枢转打开，使得清洁块抵靠皮带，并且可以在皮带旋转穿过打磨机时清洁皮带。 清洁剂特别适用于便携式砂带机。

公开(公告)号：US5628672A

公开(公告)日：1997-05-13

申请号：US584344

申请日：1996-01-11

申请人： Jurgen Heesemann

发明人： Jurgen Heesemann

IPC分类号： B08B5/02 ,  B23Q1/34 ,  B24B53/10 ,  B24B21/18 ,  B24B21/00

CPC分类号： B24B53/10 ,  B08B5/026 ,  B23Q1/34

摘要： A blowing device for a belt grinding machine has a nozzle arrangement having nozzles positioned relative to its grinding belt for blowing cleaning air jets onto the circulating grinding belt. The device further has an oscillating drive to oscillate the nozzle arrangement in the longitudinal direction thereof. A pair of elastic members suspend the nozzle arrangement, which is oscillated in the longitudinal direction by using a magnetic field. A ferromagnetic member is connected to the nozzle arrangement and is positioned within the magnetic field produced by an electric coil. By varying the magnetic field, the nozzle arrangement can be moved in the longitudinal direction, the spring providing an elastic restoring force to move the nozzle arrangement is the opposite direction when the magnetic field is turned off.

摘要翻译： 用于皮带磨床的吹风装置具有喷嘴装置，其具有相对于其研磨带定位的喷嘴，用于将清洁空气射流吹送到循环研磨带上。 该装置还具有振荡驱动器，以使喷嘴装置在其纵向方向上振荡。 一对弹性构件使通过使用磁场沿长度方向摆动的喷嘴装置悬挂。 铁磁构件连接到喷嘴装置并且位于由电线圈产生的磁场内。 通过改变磁场，喷嘴装置能够在纵向方向上移动，当磁场被关闭时，弹簧提供弹性恢复力以使喷嘴装置移动是相反的方向。

公开(公告)号：US5484323A

公开(公告)日：1996-01-16

申请号：US185793

申请日：1994-05-05

申请人： Robert K. Smith

发明人： Robert K. Smith

IPC分类号： B24B53/10

CPC分类号： B24B53/10

摘要： A cleaner for attachment to a wide belt sander, the cleaner being mounted adjacent the top roller of the belt sander. The cleaner is applied to the sanding belt only during operation of the sander.

摘要翻译： PCT No.PCT / AU92 / 00373 Sec。 371日期：1994年5月5日 102（e）日期1994年5月5日PCT提交1992年7月22日PCT公布。 出版物WO93 / 01896 日期1993年2月4日。一种用于连接到宽带砂光机的清洁剂，清洁器安装在带式砂磨机的顶辊附近。 清洁剂仅在砂光机操作期间应用于砂带。

公开(公告)号：US4815238A

公开(公告)日：1989-03-28

申请号：US179070

申请日：1988-04-08

申请人： Steven C. Simpson ,  Ronald D. Witt

发明人： Steven C. Simpson ,  Ronald D. Witt

IPC分类号： B24B53/10 ,  B24B21/18

CPC分类号： B24B53/10

摘要： A debris collector for wide belt sanders and the like including an upper assembly. A plurality of posts include upper ends connected to the upper assembly and lower ends connected to a lower assembly. A bag assembly extends between the upper and lower assemblies and is shaped to receive debris.

摘要翻译： 用于宽带式砂磨机等的碎屑收集器包括上部组件。 多个柱包括连接到上组件的上端和连接到下组件的下端。 袋组件在上部和下部组件之间延伸并且被成形为接收碎屑。

公开(公告)号：US3596413A

公开(公告)日：1971-08-03

申请号：US3596413D

申请日：1969-11-26

申请人： DONALD R STEWART

发明人： STEWART DONALD R

IPC分类号： B24B53/007 ,  B24B53/10 ,  B24B55/00 ,  B24B55/04

CPC分类号： B24B53/007 ,  B24B53/10

摘要： A system for removing metal chips from a driven endless abrading tool to prolong the useful life of the tool. A magnet is provided to extract loosely clinging chips from the abrasive surface to remove the chips of the tool before the chips are ironed into such abrading tool by further abrading contact with a workpiece. A wind tunnel is provided and is in part formed by the magnet, and the abrasive surface of the tool, and an air stream passing through the tunnel exerts a force greater than the magnetically attractive force of the magnet to preclude the accumulation of chips on the magnet.

公开(公告)号：US6162113A

公开(公告)日：2000-12-19

申请号：US918078

申请日：1997-08-25

申请人： Jay T. Armstrong

发明人： Jay T. Armstrong

IPC分类号： B24B53/10 ,  B24B1/00

CPC分类号： B24B53/10

摘要： Featured is a method and system for cleaning abrasive sanding and/or planing media, for example sandpaper, wide belt sanding belts, planers, grinding wheels or other abrasive surfaces while the media is either in-situ in the sanding, planing, grinding equipment or when removed. Additionally, the cleaning featured method and system can clean the media while the abrasive media is being used as well as when the abrasive media is not being used. In the cleaning method dry ice (CO.sub.2, solid carbon dioxide) particles are propelled towards the abrasive surface at a high velocity so the dry ice particles impact on the surface of the abrasive media at a high velocity. Additionally, the dry ice (CO.sub.2, solid carbon dioxide) particles are propelled as to impact the abrasive surface at varying angles and locations as necessary to effectively clean the abrasive surface. Further, the dry ice particles are propelled towards the abrasive media when it is in motion, for example rotating, so the dry ice particles impact the abrasive media at different locations of the media. The method and system allow the abrasive media to be cleaned while the abrasive media is being used for its' intended purpose. Thereby reducing equipment downtime usually associated with cleaning and/or changing the abrasive media due to becoming dirty and/or worn.

摘要翻译： 特别是用于清洁研磨砂光和/或刨削介质的方法和系统，例如砂纸，宽带砂带，刨床，砂轮或其他研磨表面，同时介质在砂磨，刨削，研磨设备或原位 何时删除 此外，清洁特征的方法和系统可以在使用研磨介质以及不使用研磨介质时清洁介质。 在清洁方法中，干冰（CO2，固体二氧化碳）颗粒以高速推向研磨表面，因此干冰颗粒以高速度冲击研磨介质的表面。 此外，干冰（CO 2，固体二氧化碳）颗粒被推进，以便根据需要以不同的角度和位置冲击研磨表面，以有效地清洁研磨表面。 此外，当干冰颗粒运动时，例如旋转，干冰颗粒被推向研磨介质，因此干冰颗粒在介质的不同位置冲击研磨介质。 该方法和系统允许在研磨介质用于其预期目的时清洁研磨介质。 从而减少了由于变脏和/或磨损而清洗和/或更换研磨介质而造成的设备停机时间。

公开(公告)号：US5622526A

公开(公告)日：1997-04-22

申请号：US218427

申请日：1994-03-28

申请人： James D. Phillips

发明人： James D. Phillips

IPC分类号： B24B53/00 ,  B24B53/10 ,  B24B53/12 ,  B24B7/00

CPC分类号： B24B53/12 ,  B24B53/10

摘要： A trueing wheel for trueing an abrasive belt or wheel having cubic boron nitride abrasive particles. The trueing wheel has a radially outer peripheral surface which slopes at an acute angle with respect to its axis of rotation. Diamond particles, preferably about 0.150 mm in diameter, are bonded to the sloping radially outer peripheral surface in a single layer.

摘要翻译： 用于制造具有立方氮化硼磨料颗粒的研磨带或轮的真实轮。 制动轮具有相对于其旋转轴线以锐角倾斜的径向外周表面。 优选直径约0.150mm的金刚石颗粒以单层结合到倾斜的径向外周表面。