公开(公告)号：US06472079B2

公开(公告)日：2002-10-29

申请号：US09829954

申请日：2001-04-11

申请人： Eiji Hayashi ,  Michinori Nishikawa ,  Kinji Yamada

发明人： Eiji Hayashi ,  Michinori Nishikawa ,  Kinji Yamada

IPC分类号： B32B9041

CPC分类号： H01L21/02126 ,  C08G77/06 ,  C08G77/08 ,  C08G77/50 ,  C09D183/04 ,  C09D183/14 ,  H01L21/02282 ,  H01L21/312 ,  Y10T428/31663

摘要： A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1) RaSi(OR1)4-a  (1) (A-2) compounds represented by the following formula (2) Si(OR2)4  (2) and (A-3) compounds represented by the following formula (3) R3b(R4O)3-bSi—(R7)d—Si(OR5)3-cR6c  (3) (B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and (C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.

摘要翻译： 一种成膜用组合物，其特征在于，含有：（A）水解缩合产物，其通过水解和缩合选自（A-1）由下式（1）表示的化合物（A-2） ）由下式（2）和（A-3）表示的化合物，由下式（3）（B）表示的化合物中的至少一种选自由周期表中第IA和IIA族中的金属的化合物组成的组中的至少一种 表; 和（C）有机溶剂。 还公开了使用该组合物和通过该方法获得的二氧化硅基膜的成膜方法。