Method for manufacturing resonant device
    1.
    发明授权
    Method for manufacturing resonant device 失效
    制造谐振装置的方法

    公开(公告)号:US07083740B2

    公开(公告)日:2006-08-01

    申请号:US10494640

    申请日:2003-08-20

    IPC分类号: B34C1/22

    摘要: A piezoelectric member and an electrode are formed over a silicon substrate. The piezoelectric member and the electrode are patterned by photolithography. The silicon substrate is etched to form a body. A protective film is formed on at least one surface of the body. Another surface having no protective film thereon is etched to obtain a resonant device. The body is etched in its thickness direction accurately while a resonance frequency of the body is measured. The manufacturing processes allow the resonance frequency and a gap frequency of the resonant device to be adjusted to predetermined values.

    摘要翻译: 在硅衬底上形成压电元件和电极。 压电元件和电极通过光刻图案化。 硅衬底被蚀刻以形成体。 在身体的至少一个表面上形成保护膜。 在其上没有保护膜的另一表面被蚀刻以获得谐振装置。 在测量身体的共振频率的同时,精确地蚀刻身体的厚度方向。 制造过程允许共振频率和谐振装置的间隙频率被调节到预定值。