公开(公告)号：US06419754B1

公开(公告)日：2002-07-16

申请号：US09376426

申请日：1999-08-18

申请人： Simon Chooi ,  Mei Sheng Zhou

发明人： Simon Chooi ,  Mei Sheng Zhou

IPC分类号： C23G116

CPC分类号： G01N21/31 ,  C23F1/00 ,  G01N21/85 ,  H01L21/32134 ,  H01L22/26 ,  Y10T436/12

摘要： An endpoint detection system for copper stripping using a colorimetric analysis of the change in concentration of a component is described. Wet copper stripping chemicals are used to strip copper from a wafer whereby an eluent is produced. The eluent is continuously analyzed by colorimetric analysis for the presence of copper. The copper stripping process is stopped when the presence of copper is no longer detected. Also novel compounds or chemicals for use in an endpoint detection system for copper stripping using a colorimetric analysis of the change in concentration of the novel compounds or chemicals are described. A composition of matter that serves as an indicator of the presence of copper by colorimetric analysis comprises: 1) Fast Sulphon Black F indicator and an ammonium ion-containing solution or 2) a complexing agent, comprising a diamine, an amine macrocycle, or a monoamine.

摘要翻译： 描述了使用对组分浓度变化的比色分析进行铜剥离的端点检测系统。 湿铜剥离化学品用于从晶片剥离铜，从而产生洗脱液。 通过比色分析连续分析洗脱液是否存在铜。 当不再检测到铜的存在时，铜剥离过程停止。 还描述了用于铜剥离终点检测系统的新型化合物或化学品，其使用对新化合物或化学品的浓度变化的比色分析。 通过比色分析作为铜存在指标的物质组成包括：1）快速磺化黑F指示剂和含铵离子的溶液或2）络合剂，其包含二胺，胺大环化合物或 单胺