公开(公告)号：US07039161B2

公开(公告)日：2006-05-02

申请号：US10967246

申请日：2004-10-19

申请人： Yoshiyasu Ito ,  Kazuhiko Omote

发明人： Yoshiyasu Ito ,  Kazuhiko Omote

IPC分类号： G01N23/001 ,  G01N23/20 ,  G01B15/02

CPC分类号： G01N23/201

摘要： A method and apparatus for analyzing a film structure analyze particle or pore size distribution with high accuracy and evaluate a shape of a surface or interface even in the case where the absolute amount of particles or pores in the thin film is small. The method includes fitting a simulated X-ray scattering curve obtained by simulation calculation to a measured X-ray scattering intensity curve obtained by emitting an X-ray onto a surface of a film specimen having a single layer or multi-layer structure at an angle in the vicinity of the critical angle to the surface, by varying at least one parameter characterizing a physical property of the specimen, and obtaining optimum values of parameters providing the minimum difference between the measured X-ray scattering curve and the simulated X-ray scattering curve, so as to determine the structure of the film specimen, in which plural combinations of incident angle and outgoing angle relative to the surface of the film specimen are set so that there is no correlation between the incident angle and the outgoing angle, and the simulated X-ray scattering curve is fitted to the X-ray scattering curve that is obtained by measuring X-ray intensity for the respective combinations of incident angle and outgoing angle.

摘要翻译： 用于分析胶片结构的方法和装置以高精度分析颗粒或孔径分布，并且即使在薄膜中的颗粒或孔的绝对量小的情况下也可评估表面或界面的形状。 该方法包括将通过模拟计算获得的模拟X射线散射曲线拟合到通过将X射线发射到具有单层或多层结构的膜试样的表面上获得的测量的X射线散射强度曲线 在与表面临界角附近，通过改变至少一个表征样本的物理性质的参数，并获得提供所测量的X射线散射曲线和模拟X射线散射之间的最小差的参数的最佳值 曲线，以确定膜试样的结构，其中入射角和出射角相对于膜试样的表面的多个组合被设置为使得入射角和出射角之间没有相关性，并且 模拟的X射线散射曲线拟合到通过测量入射的各个组合的X射线强度而获得的X射线散射曲线 gle和出射角度。