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1.发明授权Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom 失效分离苯酚甲醛缩合物和由其制备的光致抗蚀剂组合物
公开(公告)号：US5693749A
公开(公告)日：1997-12-02
申请号：US530648
申请日：1995-09-20
CPC分类号： G03F7/0236 , C08G8/08
摘要： A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin fraction having a low metal ion content, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a photoresist compositions containing such a novolak resin, and a method for producing a semiconductor device using such a photoresist composition.
摘要翻译： 通过分解苯酚甲醛缩合产物制备具有低金属离子含量的水不溶性水溶性成膜酚醛清漆树脂级分的方法，制备含有这种酚醛清漆树脂的光致抗蚀剂组合物的方法和 使用这种光致抗蚀剂组合物的半导体器件的制造方法。
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2.发明授权
公开(公告)号：US5739265A
公开(公告)日：1998-04-14
申请号：US530847
申请日：1995-09-20
CPC分类号： C08G8/08 , G03F7/0236
摘要： A process for producing a water insoluble, aqueous alkali soluble, film forming novolak resin having low metal ions, made by the fractionation of a phenol formaldehyde condensation product, a process for producing a resin a photoresist composition of superior quality containing such novolak resin, and a method for producing a semiconductor device using such photoresist composition.
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