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公开(公告)号：US11705304B2
公开(公告)日：2023-07-18
申请号：US17373716
申请日：2021-07-12
Applicant: ASML Netherlands B.V.
Inventor： Shuai Li , Weiming Ren , Xuedong Liu , Juying Dou , Xuerang Hu , Zhongwei Chen
IPC: H01J37/28 , H01J37/10 , H01J37/20 , H01J37/244
CPC classification number: H01J37/28 , H01J37/10 , H01J37/20 , H01J37/244 , H01J2237/0453 , H01J2237/0492 , H01J2237/04924 , H01J2237/04926 , H01J2237/04928 , H01J2237/1205 , H01J2237/1501 , H01J2237/1502 , H01J2237/2446 , H01J2237/2448 , H01J2237/2806 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput and in flexibly varying observing conditions is proposed. The apparatus uses a movable collimating lens to flexibly vary the currents of the plural probe spots without influencing the intervals thereof, a new source-conversion unit to form the plural images of the single electron source and compensate off-axis aberrations of the plural probe spots with respect to observing conditions, and a pre-beamlet-forming means to reduce the strong Coulomb effect due to the primary-electron beam.
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公开(公告)号：US11670477B2
公开(公告)日：2023-06-06
申请号：US16753285
申请日：2018-10-02
Applicant: ASML Netherlands B.V.
Inventor： Xuerang Hu , Xuedong Liu , Weiming Ren , Zhong-wei Chen
IPC: H01J37/09 , H01J37/12 , H01J37/14 , H01J37/147 , H01J37/153 , H01J37/28
CPC classification number: H01J37/09 , H01J37/12 , H01J37/1472 , H01J37/153 , H01J37/28 , H01J2237/0453 , H01J2237/1205 , H01J2237/1534 , H01J2237/24592 , H01J2237/2817
Abstract: A multi-beam apparatus for multi-beam inspection with an improved source conversion unit providing more beamlets with high electric safety, mechanical availability and mechanical stabilization has been disclosed. The source-conversion unit comprises an image-forming element array having a plurality of image-forming elements, an aberration compensator array having a plurality of micro-compensators, and a pre-bending element array with a plurality of pre-bending micro-deflectors. In each of the arrays, adjacent elements are placed in different layers, and one element may comprise two or more sub-elements placed in different layers. The sub-elements of a micro-compensator may have different functions such as micro-lens and micro-stigmators.
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公开(公告)号：US20180330911A1
公开(公告)日：2018-11-15
申请号：US16036663
申请日：2018-07-16
Applicant: Frederick A. Flitsch
Inventor： Frederick A. Flitsch
IPC: H01J37/06 , H01J37/317 , H01J37/20 , H01J37/08 , H01J37/244 , H01J9/02
CPC classification number: H01J37/06 , G03F7/0002 , G03F9/00 , H01J9/022 , H01J37/08 , H01J37/20 , H01J37/244 , H01J37/248 , H01J37/317 , H01J37/3177 , H01J2237/1205 , H01J2237/20 , H01J2237/303 , H01J2237/304 , H01J2237/3174 , H01J2237/31759 , H01J2237/31798 , Y10T29/49004
Abstract: The present invention provides apparatus for an imaging system comprising a multitude of chemical emitting elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system of chemical emitters are disclosed.
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公开(公告)号：US09691588B2
公开(公告)日：2017-06-27
申请号：US15065342
申请日：2016-03-09
Applicant: Hermes Microvision, Inc.
Inventor： Weiming Ren , Shuai Li , Xuedong Liu , Zhongwei Chen
IPC: H01J37/28 , H01J37/147
CPC classification number: H01J37/28 , H01J37/12 , H01J37/1472 , H01J2237/04924 , H01J2237/083 , H01J2237/1205 , H01J2237/1516 , H01J2237/2817
Abstract: A multi-beam apparatus for observing a sample with high resolution and high throughput is proposed. In the apparatus, a source-conversion unit changes a single electron source into a virtual multi-source array, a primary projection imaging system projects the array to form plural probe spots on the sample, and a condenser lens adjusts the currents of the plural probe spots. In the source-conversion unit, the image-forming means is on the upstream of the beamlet-limit means, and thereby generating less scattered electrons. The image-forming means not only forms the virtual multi-source array, but also compensates the off-axis aberrations of the plurality of probe spots.
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公开(公告)号：US09536702B2
公开(公告)日：2017-01-03
申请号：US14724541
申请日：2015-05-28
Applicant: Carl Zeiss Microscopy GmbH
Inventor： Uwe Lang , Christian Crueger , Nico Kaemmer , Christof Riedesel
IPC: H01J37/26 , H01J37/00 , H01J37/22 , H01J37/28 , H01J37/244
CPC classification number: H01J37/261 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/1205 , H01J2237/22 , H01J2237/221 , H01J2237/226 , H01J2237/2443 , H01J2237/2447 , H01J2237/2448 , H01J2237/2806
Abstract: A multi-beam particle microscope includes first particle optics in order to direct particle beams onto an object, a detector with detection regions, with a transducer being assigned to each detection region, and a data acquisition system, which has a control computer system, image recording computer systems and a screen. The image recording computer systems receive electrical signals from the transducers and generates a first file, which represents a high resolution image, and a second file, which represents a low resolution image. The control computer system maintains a data structure which represents an assignment of transducers to two-dimensional spatial vectors and depicts the images on the screen, wherein a reference point in each image is arranged on the screen in a coordinate system of the screen at a location which is defined by a sum of a leading vector, which is the same for all images, and the spatial vector.
Abstract translation: 多光束粒子显微镜包括第一粒子光学器件，用于将粒子束引导到物体上，检测器具有检测区域，传感器被分配给每个检测区域，以及数据采集系统，其具有控制计算机系统，图像 录制计算机系统和屏幕。 图像记录计算机系统从换能器接收电信号并产生代表高分辨率图像的第一文件和表示低分辨率图像的第二文件。 控制计算机系统保持数据结构，其表示将换能器分配给二维空间矢量并且描绘屏幕上的图像，其中每个图像中的参考点被布置在屏幕的坐标系中的屏幕的位置 其由对于所有图像相同的前导向量和空间矢量的和来定义。
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Patent Agency Ranking
公开(公告)号：US20160358742A1
公开(公告)日：2016-12-08
申请号：US14052610
申请日：2013-10-11
Applicant: William M. Tong , Alan D. Brodie , Jeffrey Elam , Anil Mane
Inventor： William M. Tong , Alan D. Brodie , Jeffrey Elam , Anil Mane
IPC: H01J37/06 , H01J37/12 , C23C16/32 , C23C16/40 , C23C16/34 , H01J37/317 , C23C16/455
CPC classification number: C23C16/45529 , B81B3/0008 , C23C16/32 , C23C16/34 , C23C16/40 , C23C16/402 , C23C16/403 , C23C16/405 , H01J37/026 , H01J37/06 , H01J37/12 , H01J37/3174 , H01J2237/1205 , H01J2237/31794
Abstract: A system and method associated with a charge drain coating are disclosed. The charge drain coating may be applied to surfaces of an electron-optical device to drain electrons that come into contact with the charge drain coating so that the performance of the electron-optical device will not be hindered by electron charge build-up. The charge drain coating may include a doping material that coalesces into clusters that are embedded within a high dielectric insulating material. The charge drain coating may be deposited onto the inner surfaces of lenslets of the electron-optical device.
Abstract translation: 公开了一种与电荷放电涂层相关的系统和方法。 可以将电荷漏极涂层施加到电子 - 光学器件的表面以排出与电荷漏极涂层接触的电子，使得电子 - 电子器件的性能不会受到电子电荷积聚的阻碍。 电荷漏极涂层可以包括聚集成嵌入高介电绝缘材料中的簇的掺杂材料。 电荷漏极涂层可以沉积到电子 - 光学器件的小透镜的内表面上。
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公开(公告)号：US20150348749A1
公开(公告)日：2015-12-03
申请号：US14724541
申请日：2015-05-28
Applicant: Carl Zeiss Microscopy GmbH
Inventor： Uwe Lang , Christian Crueger , Nico Kaemmer , Christof Riedesel
CPC classification number: H01J37/261 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/0453 , H01J2237/063 , H01J2237/1205 , H01J2237/22 , H01J2237/221 , H01J2237/226 , H01J2237/2443 , H01J2237/2447 , H01J2237/2448 , H01J2237/2806
Abstract: A multi-beam particle microscope includes first particle optics in order to direct particle beams onto an object, a detector with detection regions, with a transducer being assigned to each detection region, and a data acquisition system, which has a control computer system, image recording computer systems and a screen. The image recording computer systems receive electrical signals from the transducers and generates a first file, which represents a high resolution image, and a second file, which represents a low resolution image. The control computer system maintains a data structure which represents an assignment of transducers to two-dimensional spatial vectors and depicts the images on the screen, wherein a reference point in each image is arranged on the screen in a coordinate system of the screen at a location which is defined by a sum of a leading vector, which is the same for all images, and the spatial vector.
Abstract translation: 多光束粒子显微镜包括第一粒子光学器件，用于将粒子束引导到物体上，检测器具有检测区域，传感器被分配给每个检测区域，以及数据采集系统，其具有控制计算机系统，图像 录制计算机系统和屏幕。 图像记录计算机系统从换能器接收电信号并产生代表高分辨率图像的第一文件和表示低分辨率图像的第二文件。 控制计算机系统保持数据结构，其表示将换能器分配给二维空间矢量并且描绘屏幕上的图像，其中每个图像中的参考点被布置在屏幕的坐标系中的屏幕的位置 其由对于所有图像相同的前导向量和空间矢量的和来定义。
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公开(公告)号：US20150200072A1
公开(公告)日：2015-07-16
申请号：US14594335
申请日：2015-01-12
Applicant: Frederick A. Flitsch
Inventor： Frederick A. Flitsch
IPC: H01J37/317 , H05K3/32 , H01J37/20
CPC classification number: H01J37/317 , G03F7/70391 , H01J37/06 , H01J37/08 , H01J37/20 , H01J37/3177 , H01J2237/1205 , H01J2237/2007 , H01J2237/303 , H01J2237/304 , H01J2237/317 , H01J2237/31759 , H01J2237/31798 , H05K3/32 , Y10T29/49004
Abstract: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.
Abstract translation: 本发明提供一种用于成像系统的装置，其包括在基板上的多个成像元件。 在一些实施例中，基底可以近似圆形，半径约为一英寸。 讨论了与使用和产生成像系统有关的各种方法。
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公开(公告)号：US20150155134A1
公开(公告)日：2015-06-04
申请号：US14174651
申请日：2014-02-06
Inventor： Jürgen FROSIEN , Dieter WINKLER , Benjamin John COOK
IPC: H01J37/28 , H01J37/244 , H01J37/147
CPC classification number: H01J37/28 , H01J37/05 , H01J37/09 , H01J37/1472 , H01J37/1474 , H01J37/244 , H01J2237/0453 , H01J2237/0475 , H01J2237/1205 , H01J2237/21 , H01J2237/2448 , H01J2237/24592 , H01J2237/2806 , H01J2237/2817
Abstract: A scanning charged particle beam device configured to image a specimen is described. The scanning charged particle beam device includes a source of charged particles, a condenser lens for influencing the charged particles, an aperture plate having at least two aperture openings to generate at least two primary beamlets of charged particles, at least two deflectors, wherein the at least two deflectors are multi-pole deflectors, a multi-pole deflector with an order of poles of 8 or higher, an objective lens, wherein the objective lens is a retarding field compound lens, a beam separator configured to separate the at least two primary beamlets from at least two signal beamlets, a beam bender, or a deflector or a mirror configured to deflect the at least two signal beamlets, wherein the beam bender is a hemispherical beam bender or beam bender having at least two curved electrodes, and at least two detector elements.
Abstract translation: 描述了构造成对样本进行成像的扫描带电粒子束装置。 扫描带电粒子束装置包括带电粒子源，用于影响带电粒子的聚光透镜，具有至少两个孔径孔的孔板，以产生至少两个带电粒子的主子束，至少两个偏转器，其中， 至少两个偏转器是多极偏转器，具有8或更高的极数的多极偏转器，物镜，其中物镜是延迟场复合透镜，梁分离器，被配置为将至少两个初级 来自至少两个信号子束的子束，光束弯曲器或被配置为偏转所述至少两个信号子束的偏转器或反射镜，其中所述光束弯曲器是具有至少两个弯曲电极的半球形光束弯曲器或光束弯曲器，并且至少 两个检测元件。
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公开(公告)号：US08921807B2
公开(公告)日：2014-12-30
申请号：US13462013
申请日：2012-05-02
Applicant: Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
Inventor： Hiromitsu Takase , Ichiro Tanaka , Akira Miyake
IPC: H01J37/30 , B08B5/00 , H01J37/317
CPC classification number: H01J37/3177 , B08B5/00 , B82Y10/00 , B82Y40/00 , G03F7/70925 , H01J2237/022 , H01J2237/03 , H01J2237/0435 , H01J2237/0453 , H01J2237/1205
Abstract: A lithographic apparatus which performs drawing on a substrate with a charged-particle beam, includes an optical system having an aperture plate in which a first number of apertures are formed to pass a first number of charged-particle beams to perform the drawing, a substrate holder, a cleaning unit configured to clean the aperture plate, and a chamber containing the optical system and the substrate holder. The cleaning unit includes a case having an emitting hole plate in which a second number of emitting holes are formed, the second number being smaller than the first number, an active species source configured to generate active species in the case, and a driving mechanism configured to move the case.
Abstract translation: 在带有带电粒子束的基板上进行拉伸的光刻设备包括具有孔板的光学系统，其中形成有第一数量的孔以通过第一数量的带电粒子束以进行绘图;基板 配置为清洁孔板的清洁单元和容纳光学系统和基板保持器的室。 清洁单元包括具有发射孔板的壳体，其中形成有第二数量的发射孔，第二数量小于第一数量，被配置为在壳体中产生活性物种的活性物质源和被配置为 移动案件。
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