公开(公告)号：US09822443B1

公开(公告)日：2017-11-21

申请号：US15010653

申请日：2016-01-29

Applicant: Multibeam Corporation

Inventor： Michael C. Smayling ,  Kevin M. Monahan ,  David K. Lam ,  Theodore A. Prescop

IPC: H01J37/30 ,  C23C14/48

CPC classification number: H01L21/3065 ,  B81C1/00373 ,  B81C2201/0143 ,  B81C2201/0188 ,  C23C14/48 ,  C23C16/047 ,  C23C16/48 ,  C23C16/486 ,  C23C16/487 ,  H01J37/05 ,  H01J37/06 ,  H01J37/08 ,  H01J37/228 ,  H01J37/244 ,  H01J37/30 ,  H01J37/304 ,  H01J37/305 ,  H01J37/3053 ,  H01J37/3056 ,  H01J37/3172 ,  H01J37/3174 ,  H01J37/3177 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0635 ,  H01J2237/1501 ,  H01J2237/24592 ,  H01J2237/30466 ,  H01J2237/30472 ,  H01J2237/31708 ,  H01J2237/31732 ,  H01J2237/31735 ,  H01J2237/31737 ,  H01J2237/3174 ,  H01J2237/31749 ,  H01L21/0228 ,  H01L21/0262 ,  H01L21/26 ,  H01L21/308 ,  H01L21/3085 ,  H01L22/12 ,  H01L22/20 ,  H01L22/26

Abstract: Methods, devices and systems for targeted, maskless modification of material on or in a substrate using charged particle beams. Electrostatically-deflected charged particle beam columns can be targeted in direct dependence on the design layout database to perform direct and knock-on ion implantation, producing patterned material modifications with selected chemical and 3D-structural profiles. The number of required process steps is reduced, reducing manufacturing cycle time and increasing yield by lowering the probability of defect introduction. Local gas and photon injectors and detectors are local to corresponding individual columns, and support superior, highly-configurable process execution and control. Targeted implantation can be used to prepare the substrate for patterned blanket etch; patterned ALD can be used to prepare the substrate for patterned blanket deposition; neither process requiring photomasks or resist. Arrays of highly configurable beam columns can also be used to perform both positive and negative tone lithography in a single pass.

公开(公告)号：US20160005566A1

公开(公告)日：2016-01-07

申请号：US14745122

申请日：2015-06-19

Applicant: CALIFORNIA INSTITUTE OF TECHNOLOGY

Inventor： Ahmed H. Zewail ,  John Spencer Baskin ,  Haihua Liu

IPC: H01J37/073 ,  H01J37/244 ,  H01J37/20 ,  H01J37/26

CPC classification number: G01N23/2055 ,  G01N21/00 ,  G01N23/04 ,  G01N23/20058 ,  G01N23/20083 ,  H01J37/228 ,  H01J37/26 ,  H01J2237/06333 ,  H01J2237/0635 ,  H01J2237/2482 ,  H01J2237/2617 ,  H01J2237/2626

Abstract: An electron microscope system includes a laser system operable to generate an optical pulse and a pump pulse and a microscope column. The microscope column includes a multiple cathode structure having a plurality of spatially separated cathode regions. Each of the cathode regions are operable to generate an electron pulse. The microscope column also includes an electron acceleration region adjacent the multiple cathode structure, a specimen region operable to support a specimen, and a detector.

Abstract translation: 电子显微镜系统包括可操作以产生光脉冲和泵脉冲和显微镜柱的激光系统。 显微镜柱包括具有多个空间分离的阴极区域的多阴极结构。 每个阴极区域可操作以产生电子脉冲。 显微镜柱还包括与多个阴极结构相邻的电子加速区域，可操作以支撑样本的样本区域和检测器。

公开(公告)号：US07888642B2

公开(公告)日：2011-02-15

申请号：US12188567

申请日：2008-08-08

Applicant: Mamoru Nakasuji ,  Nabuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

Inventor： Mamoru Nakasuji ,  Nabuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC: H01J49/48 ,  G21K5/04

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Abstract translation: 本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。 在电子束装置中，电子枪具有用于发射一次电子束的阴极。 阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。 多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

公开(公告)号：US20090166557A1

公开(公告)日：2009-07-02

申请号：US11338843

申请日：2006-01-25

Applicant: Hiroshi Makino ,  Zhaohui Cheng ,  Kenji Tanimoto ,  Hideo Todokoro

Inventor： Hiroshi Makino ,  Zhaohui Cheng ,  Kenji Tanimoto ,  Hideo Todokoro

IPC: G21K5/10 ,  G01N23/00

CPC classification number: H01J37/073 ,  H01J37/026 ,  H01J37/28 ,  H01J2237/0048 ,  H01J2237/0635 ,  H01J2237/24564 ,  H01J2237/2594

Abstract: The invention solves charge nonuniformity of a specimen surface resulting from emission variation of a carbon nanotube electron source and individual difference of emission characteristics. During charge control processing, charge of the specimen surface is measured in real time. As means for solving charge nonuniformity resulting from nonuniformity of electron illumination density, electrons illuminating the specimen and the specimen are moved relatively to average electron illumination density. Moreover, an absorption current flowing into the specimen and the numbers of secondary electrons emitted from the specimen and of backscattered electrons are measured as means for monitoring charge of the specimen surface in real time.

Abstract translation: 本发明解决了由碳纳米管电子源的发射变化引起的样品表面的电荷不均匀性和发射特性的个体差异。 在充电控制处理期间，实时测量样品表面的电荷。 作为解决由电子照射密度不均匀引起的电荷不均匀的手段，照射样品和样品的电子相对于平均电子照射密度移动。 此外，测量流入样本的吸收电流和从样本和背散射电子发射的二次电子的数量作为用于实时监测样品表面的电荷的装置。

公开(公告)号：US07423267B2

公开(公告)日：2008-09-09

申请号：US11528673

申请日：2006-09-28

Applicant: Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

Inventor： Mamoru Nakasuji ,  Nobuharu Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC: G01N23/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Abstract translation: 本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。 在电子束装置中，电子枪具有用于发射一次电子束的阴极。 阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。 多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

公开(公告)号：US07220971B1

公开(公告)日：2007-05-22

申请号：US11320515

申请日：2005-12-28

Applicant: Sha X. Chang ,  Otto Z. Zhou

Inventor： Sha X. Chang ,  Otto Z. Zhou

IPC: G01K1/08

CPC classification number: H01J37/304 ,  G21K5/04 ,  H01J33/02 ,  H01J33/04 ,  H01J37/302 ,  H01J37/317 ,  H01J2201/30469 ,  H01J2237/0635 ,  H01J2237/2004 ,  H01J2237/2006 ,  H01J2237/316

Abstract: Multi-pixel electron microbeam irradiator systems and methods are provided with particular applicability for selectively irradiating predetermined cells or cell locations. A multi-pixel electron microbeam irradiator system can include a plurality of individually addressable electron field emitters sealed in a vacuum. The multi-pixel electron microbeam irradiator system can include an anode comprising one or more electron permeable portions corresponding to the plurality of electron field emitters. Further, the multi-pixel electron microbeam irradiator system can include a controller operable to individually control electron extraction from each of the electron field emitters for selectively irradiating predetermined locations such as cells or cell locations.

Abstract translation: 提供了多像素电子微束照射器系统和方法，其特别适用于选择性地照射预定的细胞或细胞位置。 多像素电子微束照射器系统可以包括在真空中密封的多个可单独寻址的电子场发射器。 多像素电子微束照射器系统可以包括阳极，该阳极包括对应于多个电子场发射体的一个或多个电子透过部分。 此外，多像素电子微束照射器系统可以包括控制器，其可操作以单独地控制来自每个电子场发射器的电子提取，以选择性地照射诸如单元或单元位置的预定位置。

公开(公告)号：US20070018101A1

公开(公告)日：2007-01-25

申请号：US11528673

申请日：2006-09-28

Applicant: Mamoru Nakasuji ,  Nobuhara Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

Inventor： Mamoru Nakasuji ,  Nobuhara Noji ,  Tohru Satake ,  Masahiro Hatakeyama ,  Kenji Watanabe ,  Takao Kato ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima

IPC: G21K7/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G01N23/225 ,  H01J37/06 ,  H01J37/063 ,  H01J37/073 ,  H01J37/185 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0435 ,  H01J2237/0635 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/2446 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

Abstract: The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals.

Abstract translation: 本发明提供了一种用于用一次电子束照射样品的电子束装置，以通过用于评估样品表面的照射来检测从样品表面产生的二次电子束。 在电子束装置中，电子枪具有用于发射一次电子束的阴极。 阴极包括用于发射一次电子束的多个发射器，其以在主电光系统的光轴为中心的圆周彼此分开布置。 多个发射器被布置成使得当多个发射器投射到与一次电子束扫描的方向平行的直线上时，直线上的所得点以相等的间隔隔开。

公开(公告)号：US06930313B2

公开(公告)日：2005-08-16

申请号：US10636701

申请日：2003-08-08

Applicant: Tadashi Fujieda ,  Kishio Hidaka ,  Mitsuo Hayashibara ,  Shuichi Suzuki ,  Yoshimichi Numata ,  Toshiaki Horiuchi

Inventor： Tadashi Fujieda ,  Kishio Hidaka ,  Mitsuo Hayashibara ,  Shuichi Suzuki ,  Yoshimichi Numata ,  Toshiaki Horiuchi

IPC: G03F7/20 ,  B82B3/00 ,  G01Q70/12 ,  H01J1/304 ,  H01J9/02 ,  H01J37/06 ,  H01J37/073 ,  H01J37/26 ,  H01L21/027

CPC classification number: H01J1/304 ,  B82Y10/00 ,  B82Y30/00 ,  H01J37/073 ,  H01J2201/30469 ,  H01J2237/0635 ,  Y10S977/876 ,  Y10S977/939

Abstract: A high reliability emission source is constructed to secure the ohmic contact between a carbon nanotube and an electrically conductive base material, so as to ensure sufficient joining strength, and to provide for easy beam shaft adjustment. An electron microscope for realizing high resolution, high brightness, a reduction in sample damage due to a reduction in acceleration voltage, a reduction in cost and compactness, and an electron beam drawing device for realizing high definition, high efficiency, a reduction in cost and compactness in comparison with the conventional device, is achieved by using this high reliability emission source. In the emission source, the carbon nanotube is attached to the tip central portion of the electrically conductive base material through an electrically conductive joining material or an organic material by carbonization-processing the organic material by heat treatment, or by diffusive joining.

Abstract translation: 构建高可靠性发射源以确保碳纳米管和导电基材之间的欧姆接触，以确保足够的接合强度，并提供容易的梁轴调节。 用于实现高分辨率，高亮度，由于加速电压降低而导致的样品损伤降低，成本降低和紧凑性的电子显微镜，以及用于实现高清晰度，高效率，降低成本的电子束引出装置 通过使用这种高可靠性的发射源来实现与常规装置相比的紧凑性。 在发光源中，碳纳米管通过导电性接合材料或有机材料通过热处理对该有机材料进行碳化处理或通过扩散接合而附着到导电性基材的顶端中心部。

公开(公告)号：US20040140437A1

公开(公告)日：2004-07-22

申请号：US10348658

申请日：2003-01-21

Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventor： Scott Josef Bukofsky ,  Bomy Able Chen ,  Sara Jennifer Eames ,  Qiang Wu

IPC: G21G005/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/0635 ,  H01J2237/30433

Abstract: An e-beam system generates a set of massively parallel beams of order of magnitude 1,000 by employing a flash eprom to store calibration data and to receive on/off signals directed through the address system of the memory array, the individual electron sources being mounted above the memory array in a geometric array that tracks the structure of the memory array.

Abstract translation: 电子束系统通过使用闪光eprom存储校准数据并且接收通过存储器阵列的地址系统引导的接通/断开信号，生成一组数量级为1000的大规模并行光束，各个电子源被安装在 跟踪存储器阵列结构的几何数组中的存储器阵列。

公开(公告)号：US20040067602A1

公开(公告)日：2004-04-08

申请号：US10643183

申请日：2003-08-18

Inventor： Sungho Jin

IPC: H01L021/00

CPC classification number: B82Y10/00 ,  H01J1/304 ,  H01J3/022 ,  H01J9/025 ,  H01J2201/30469 ,  H01J2237/0635 ,  H01J2329/00 ,  Y10S977/939

Abstract: This invention provides novel methods of fabricating novel gated field emission structures that include aligned nanowire electron emitters (individually or in small groups) localized in central regions within gate apertures. It also provides novel devices using nanoscale emitters for microwave amplifiers, electron-beam lithography, field emission displays and x-ray sources. The new emission structures are particularly useful in the new devices

Abstract translation: 本发明提供了制造新型门控场发射结构的新方法，其包括定位在门孔内的中心区域中的排列的纳米线电子发射体（单独地或小组）。 它还提供了使用微波放大器，电子束光刻，场发射显示器和x射线源的纳米尺度发射器的新型器件。 新的发射结构在新器件中特别有用