公开(公告)号：US06528799B1

公开(公告)日：2003-03-04

申请号：US09692150

申请日：2000-10-20

Applicant: Victor Katsap ,  James A. Liddle ,  Masis Mkrtchyan ,  Stuart T. Stanton

Inventor： Victor Katsap ,  James A. Liddle ,  Masis Mkrtchyan ,  Stuart T. Stanton

IPC: H01J37063

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/065 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/0656 ,  Y10S977/881 ,  Y10S977/887

Abstract: An electron beam lithographic apparatus has an electron gun providing a beam of accelerated electrons, a mask stage adapted to hold a mask in a path of the beam of accelerated electrons, and a workpiece stage adapted to hold a workpiece in a path of electrons that have passed through the mask. The electron gun has a cathode having an electron emission surface, an anode adapted to be connected to a high-voltage power supply to provide an electric field between the cathode and the anode to accelerate electrons emitted from the cathode toward the anode, and a current-density-profile control grid disposed between the anode and the cathode. The current-density-profile control grid is configured to provide an electron gun that produces an electron beam having a non-uniform current density profile. A method of producing a micro-device includes generating a beam of charged particles having a non-uniform charged-particle current density, illuminating a mask with the beam of charged particles, and exposing a workpiece with charged particles from the beam of charged particles.

Abstract translation: 电子束光刻设备具有提供加速电子束的电子枪，适于将加速电子束的路径中的掩模保持的掩模台，以及适于将工件保持在具有 穿过面具。 电子枪具有具有电子发射表面的阴极，适于连接到高压电源的阳极，以在阴极和阳极之间提供电场，以加速从阴极向阳极发射的电子，以及电流 设置在阳极和阴极之间的密度分布控制网格。 电流密度分布控制网格被配置为提供产生具有不均匀电流密度分布的电子束的电子枪。 微型器件的制造方法包括：生成具有不均匀带电粒子电流密度的带电粒子束，用带电粒子束照射掩模，以及从带电粒子束带电的带电粒子露出工件。