公开(公告)号：WO2017102255A1

公开(公告)日：2017-06-22

申请号：PCT/EP2016/078335

申请日：2016-11-21

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  BLOKS, Ruud, Hendrikus, Martinus, Johannes ,  NAKIBOGLU, Günes ,  REMIE, Marinus, Jan ,  KUNNEN, Johan, Gertrudis, Cornelis

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/70933

Abstract: The present invention relates to an apparatus and method for controlling temperature of a patterning device in a lithographic apparatus, by flowing gas across a surface of the patterning device. The present invention includes a patterning apparatus (5) for a lithographic apparatus comprising: a patterning device support structure (13) configured to support a patterning device (14); a patterning device conditioning system comprising at least one first gas outlet (10A) configured to provide a gas flow (12A) over a surface of the patterning device and at least one second gas outlet (10B) configured to provide a gas flow (12B) over a part of a surface of the patterning device support structure not supporting the patterning device; and a control system. The control system may be configured to separately control the temperature of the gas exiting the first gas outlet and the temperature of the gas exiting the second gas outlet such that the temperature of the gas exiting the second gas outlet is at a higher temperature than the gas exiting the first gas outlet. The control system may be configured to control the temperature and gas flow rate of the gas exiting the first gas outlet and separately to control the temperature and gas flow rate of the gas exiting the second gas outlet.

Abstract translation: 本发明涉及一种通过使气体流过图案形成装置的表面来控制光刻设备中的图案形成装置的温度的装置和方法。 本发明包括用于光刻设备的图案形成装置（5），其包括：图案形成装置支撑结构（13），其被配置为支撑图案形成装置（14）; 图案形成装置调节系统，其包括构造成在图案形成装置的表面上提供气流（12A）的至少一个第一气体出口（10A）和构造成提供气流（12B）的至少一个第二气体出口（10B） 在图案形成装置支撑结构的不支撑图案形成装置的表面的一部分上; 和一个控制系统。 控制系统可以被配置成单独控制离开第一气体出口的气体的温度和离开第二气体出口的气体的温度，使得离开第二气体出口的气体的温度处于比气体高的温度 离开第一气体出口。 控制系统可以被配置为控制离开第一气体出口的气体的温度和气体流量，并且分别控制离开第二气体出口的气体的温度和气体流量。

公开(公告)号：WO2022184375A1

公开(公告)日：2022-09-09

申请号：PCT/EP2022/052618

申请日：2022-02-03

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VAN GOCH, Bram, Paul, Theodoor ,  KUNNEN, Johan, Gertrudis, Cornelis ,  NA, Sae Na

IPC: G03F1/84 ,  G03F7/20

Abstract: A method includes detecting data associated with a patterning device and/or a lithographic apparatus, performing an evaluation test based on the data, determining whether to proceed with exposing a substrate based on the evaluation test, selecting an action from a plurality of actions when a determination not to proceed is made, and performing the action on the patterning device and/or a lithographic apparatus.

公开(公告)号：WO2017008996A1

公开(公告)日：2017-01-19

申请号：PCT/EP2016/063984

申请日：2016-06-17

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： VAN BOKHOVEN, Laurentius, Johannes, Adrianus ,  WARD, Christopher, Charles ,  VAN DER GAAG, Marc, Léon ,  KUNNEN, Johan, Gertrudis, Cornelis

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70733 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70891

Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.

Abstract translation: 光刻设备（100）包括构造成支撑图案形成装置（110）的图案形成装置支撑结构（104），配置成提供穿过图案形成装置的表面的气流（114）的气体入口（116） 温度调节装置（134），其被配置为基于设定点来调节气体流量的温度。 该装置还包括传感器（132），其被配置为测量指示添加到图案形成装置中的至少一个的热量的参数和图案形成装置与投影系统的透镜（124）之间的体积（126） 106）在光刻系统的操作使用期间。 此外，该设备包括可操作地耦合到传感器并且被配置为基于由传感器测量的参数来调整设定点以控制图案形成装置的温度的控制器（130）。

公开(公告)号：WO2020064240A1

公开(公告)日：2020-04-02

申请号：PCT/EP2019/072680

申请日：2019-08-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： BLOKS, Ruud, Hendrikus, Martinus, Johannes ,  KUNNEN, Johan, Gertrudis, Cornelis ,  ZAAL, Oxana ,  LYONS, Joseph, Harry ,  SRIVASTAVA, Sudhir

IPC: G03F9/00 ,  G01B13/12 ,  G03F7/20 ,  G01B13/06

Abstract: A level sensor system having a pneumatic sensor, a temperature sensor and a controller. The pneumatic sensor (10) has a reference outlet (100) for forming a reference gap (GR) with a reference surface (R) and a measurement outlet (200) for forming a measurement gap (GM) with a measurement surface, wherein the pneumatic sensor is configured to make a pneumatic sensor measurement indicative of a difference between a flow of gas out of the reference outlet and a flow of gas out of the measurement outlet. The temperature sensor (510a, b) is configured to make a temperature measurement indicative of a temperature of the reference surface and/or a temperature of the measurement surface. The controller (700) is configured to adjust the pneumatic sensor measurement based on the temperature measurement to generate a signal indicative of a difference in height between the reference gap and the measurement gap.

公开(公告)号：WO2016020170A1

公开(公告)日：2016-02-11

申请号：PCT/EP2015/066314

申请日：2015-07-16

Applicant: ASML NETHERLANDS B.V.

Inventor： KOEVOETS, Adrianus, Hendrik ,  BERENDSEN, Christianus, Wilhelmus, Johannes ,  CORTIE, Rogier, Hendrikus, Magdalena ,  OVERKAMP, Jim, Vincent ,  NEEFS, Patricius, Jacobus ,  SAPUTRA, Putra ,  BLOKS, Ruud, Hendricus, Martinus, Johannes ,  RENDERS, Michael, Johannes, Hendrika, Wilhelmina ,  KUNNEN, Johan, Gertrudis, Cornelis ,  LAURENT, Thibault, Simon, Mathieu

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70341 ,  G03F7/70783 ,  G03F7/70875

Abstract: A lithographic apparatus comprising an object table which carries an object. The lithographic apparatus may further comprise at least one sensor as part of a measurement system to measure a characteristic of the object table, the environment surrounding the lithographic apparatus or another component of the lithographic apparatus. The measured characteristic may be used to estimate the deformation of the object due to varying loads during operation of the lithographic apparatus, for example varying loads induced by a two- phase flow in a channel formed within the object table. Additionally, or alternatively, the lithographic apparatus comprises a predictor to estimate the deformation of the object based on a model. The positioning of the object table carrying the object can be controlled based on the estimated deformation. The positioning of a projection beam, used to pattern a substrate, can be controlled relative to the object, to alter the position of the pattern and/or the projection beam on the substrate, based on the estimated deformation.

Abstract translation: 一种光刻设备，包括承载物体的物体台。 光刻设备还可以包括至少一个传感器作为测量系统的一部分，以测量物体表的特征，光刻设备周围的环境或光刻设备的另一部件。 测量的特性可以用于估计由于在光刻设备的操作期间变化的负载的物体的变形，例如由形成在物体表内的通道中的两相流引起的变化的负载。 另外或替代地，光刻设备包括基于模型来估计物体的变形的预测器。 可以基于估计的变形来控制携带物体的物体台的定位。 基于估计的变形，可以相对于物体来控制用于图案化基板的投影光束的定位，以改变图案和/或投影光束在基板上的位置。

公开(公告)号：WO2021228595A1

公开(公告)日：2021-11-18

申请号：PCT/EP2021/061503

申请日：2021-05-03

Applicant: ASML NETHERLANDS B.V.

Inventor： GILIJAMSE, Rogier, Sebastiaan ,  KUNNEN, Johan, Gertrudis, Cornelis ,  VAN DEN HEUVEL, Marco, Adrianus, Peter ,  ZOO, Boogyeong

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/687 ,  G03F7/70533 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/7085 ,  H01L21/67259 ,  H01L21/6838 ,  H01L21/68742

Abstract: A substrate support system is provided, comprising: a support part, the support part configured to support a bottom surface of a substrate on a support plane; a moveable part, the moveable part moveable between a retracted position, in which a top end of the moveable part is below the support plane, and an extended position, in which the top end of the moveable part is above the support plane, such that the top end supports the bottom surface of the substrate above the support plane in the extended position; and a measurement system configured to measure a time taken for the moveable part to move from the retracted position to the extended position, to compare the measured time with a reference time, and to generate a signal when the measured time deviates from the reference time by more than a predetermined amount.

公开(公告)号：WO2020156769A1

公开(公告)日：2020-08-06

申请号：PCT/EP2020/050354

申请日：2020-01-09

Applicant: ASML NETHERLANDS B.V.

Inventor： HUBAUX, Arnaud ,  BECKERS, Johan, Franciscus, Maria ,  DAVIES, Dylan John David ,  KUNNEN, Johan, Gertrudis, Cornelis ,  PONGERS, Willem, Richard ,  DAWARE, Ajinkya, Ravindra ,  LI, Chung-Hsun ,  TSIROGIANNIS, Georgios ,  BORGER, Hendrik, Cornelis, Anton ,  DE JONG, Frederik Eduard ,  GONZALEZ HUESCA, Juan Manuel ,  HLOD, Andriy, Vasyliovich ,  PISARENCO, Maxim

IPC: G03F7/20 ,  G05B23/02 ,  G05B19/418

Abstract: Described is a method for categorizing a substrate subject to a semiconductor manufacturing process comprising multiple operations, the method comprising: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model comprising one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.