公开(公告)号：WO2012046133A3

公开(公告)日：2012-08-02

申请号：PCT/IB2011002365

申请日：2011-10-07

Applicant: GIGAPHOTON INC ,  KAMEDA HIDENOBU ,  WAKABAYASHI OSAMU

Inventor： KAMEDA HIDENOBU ,  WAKABAYASHI OSAMU

IPC: G02B7/18 ,  G03F7/20 ,  G21K1/06

CPC classification number: G02B7/1815 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: A mirror includes a mirror base provided with a flow channel through which a heat medium passes for cooling the mirror. The flow channel includes a buffer tank, portion for adjusting a flow rate of the heat medium in the flow channel. A reflective film is provided on the mirror base.

Abstract translation: 反射镜包括设置有流动通道的反射镜基座，热介质通过该流动通道用于冷却反射镜。 流路包括缓冲罐，用于调节流路中的热介质的流量的部分。 反射膜设在镜底座上。

公开(公告)号：WO2011102534A3

公开(公告)日：2011-10-13

申请号：PCT/JP2011053881

申请日：2011-02-16

Applicant: GIGAPHOTON INC ,  YAMANOUCHI YOHICHI ,  SUGANUMA TAKASHI ,  FUJIMOTO JUNICHI ,  WAKABAYASHI OSAMU ,  NAKARAI HIROAKI ,  KAMEDA HIDENOBU ,  OGA HITOSHI

Inventor： YAMANOUCHI YOHICHI ,  SUGANUMA TAKASHI ,  FUJIMOTO JUNICHI ,  WAKABAYASHI OSAMU ,  NAKARAI HIROAKI ,  KAMEDA HIDENOBU ,  OGA HITOSHI

IPC: G03F7/20 ,  H01S3/03 ,  H01S3/223 ,  H01S3/23

CPC classification number: G03F7/70975 ,  G03F7/70033 ,  H01S3/0071 ,  H01S3/03

Abstract: Provided is a laser device (1) which is installed within a predetermined space and on a predetermined floor area, the laser device includes: a master oscillator (11); at least one amplifier unit (MA) that amplifies a laser beam outputted from the master oscillator; at least one power source (D4, D5) unit that supplies excitation energy to the at least one amplifier unit; and a movement mechanism which enables at least one among the at least one amplifier unit and the at least one power source unit to be moved in a direction parallel with a floor surface.

Abstract translation: 提供一种激光装置（1），其安装在预定空间内并在预定的楼层区域上，所述激光装置包括：主振荡器（11）; 至少一个放大单元（MA），放大从主振荡器输出的激光束; 至少一个电源（D4，D5）单元，其向所述至少一个放大器单元提供激励能量; 以及使所述至少一个放大器单元和所述至少一个电源单元中的至少一个能够在与地板表面平行的方向上移动的移动机构。

公开(公告)号：WO2012131452A8

公开(公告)日：2013-02-21

申请号：PCT/IB2012000409

申请日：2012-03-05

Applicant: GIGAPHOTON INC ,  NAKARAI HIROAKI ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

Inventor： NAKARAI HIROAKI ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

IPC: H01S3/131 ,  H01S3/107 ,  H01S3/13 ,  H01S3/134 ,  H01S3/23 ,  H05G2/00

CPC classification number: H01S3/0057 ,  H01S3/107 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S3/2391 ,  H05G2/008

Abstract: A laser apparatus may include a seed laser device configured to output a pulse laser beam, a pulse energy adjusting unit configured to vary pulse energy of the pulse laser beam, at least one amplifier for amplifying the pulse laser beam, at least one power source for varying an excitation intensity in the at least one amplifier, and a controller configured to control the pulse energy adjusting unit on a pulse-to-pulse basis for the pulse laser beam passing therethrough and to control the at least one power source for a group of multiple pulses of the pulse laser beam.

Abstract translation: 激光装置可以包括配置为输出脉冲激光束的种子激光装置，被配置为改变脉冲激光束的脉冲能量的脉冲能量调节单元，至少一个用于放大脉冲激光束的放大器，至少一个用于 改变所述至少一个放大器中的激发强度，以及控制器，被配置为基于脉冲对脉冲基准控制所述脉冲能量调节单元，以使所述脉冲激光束通过其中并且控制所述至少一个电源 多脉冲脉冲激光束。

公开(公告)号：WO2012085638A8

公开(公告)日：2012-09-07

申请号：PCT/IB2011003068

申请日：2011-12-15

Applicant: GIGAPHOTON INC ,  NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

Inventor： NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU ,  HOSHINO HIDEO

IPC: H01S3/23

CPC classification number: H01S3/0085 ,  H01S3/0064 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S2301/02 ,  H05G2/008

Abstract: A laser apparatus may include: a master oscillator configured to output a pulsed laser beam at a repetition rate; at least one amplifier disposed on a beam path of the pulsed laser beam; at least one optical shutter disposed on the beam path of the pulsed laser beam; and a controller configured to switch the at least one optical shutter.

Abstract translation: 激光装置可以包括：主振荡器，被配置为以重复频率输出脉冲激光束; 设置在所述脉冲激光束的光束路径上的至少一个放大器; 设置在脉冲激光束的光束路径上的至少一个光学快门; 以及控制器，被配置为切换所述至少一个光学快门。

公开(公告)号：WO2012173166A3

公开(公告)日：2013-03-28

申请号：PCT/JP2012065179

申请日：2012-06-07

Applicant: GIGAPHOTON INC ,  HORI TSUKASA ,  KAKIZAKI KOUJI ,  YANAGIDA TATSUYA ,  WAKABAYASHI OSAMU

Inventor： HORI TSUKASA ,  KAKIZAKI KOUJI ,  YANAGIDA TATSUYA ,  WAKABAYASHI OSAMU

IPC: H05G2/00

CPC classification number: H05G2/008 ,  F21K2/00

Abstract: A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

Abstract translation: 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的束强度和输出定时;以及靶 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。

公开(公告)号：WO2012073086A1

公开(公告)日：2012-06-07

申请号：PCT/IB2011002794

申请日：2011-11-23

Applicant: GIGAPHOTON INC ,  MIZOGUCHI HAKARU ,  WAKABAYASHI OSAMU

Inventor： MIZOGUCHI HAKARU ,  WAKABAYASHI OSAMU

IPC: G02B5/00 ,  G02B17/08 ,  G02B27/09 ,  G03F7/20 ,  H01L21/027 ,  H01S3/00 ,  H05G2/00

CPC classification number: F21V5/04 ,  F21V7/00 ,  F21V7/06 ,  F21V11/02 ,  G01N21/55 ,  G02B5/001 ,  G02B19/0028 ,  G02B19/0052 ,  G02B19/0095 ,  G02B27/0927 ,  G02B27/0955 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/008

Abstract: An optical device may include: a first beam shaping unit configured to transform a first laser beam incident thereon into a second laser beam having an annular cross section; and a first focusing optical element for focusing the second laser beam in a first predetermined location so as to generate a Bessel beam.

Abstract translation: 光学装置可以包括：第一光束整形单元，被配置为将入射到其上的第一激光束变换成具有环形横截面的第二激光束; 以及第一聚焦光学元件，用于将第二激光束聚焦在第一预定位置以便产生贝塞尔光束。

公开(公告)号：WO2013144691A3

公开(公告)日：2014-02-06

申请号：PCT/IB2013000181

申请日：2013-02-13

Applicant: GIGAPHOTON INC ,  WAKABAYASHI OSAMU ,  NOWAK KRZYSZTOF

Inventor： WAKABAYASHI OSAMU ,  NOWAK KRZYSZTOF

IPC: H01S3/23 ,  G02B26/08 ,  G02B27/09 ,  H01S3/00 ,  H01S3/034 ,  H01S3/083 ,  H01S3/223

CPC classification number: H01S3/2316 ,  G02B17/023 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/034 ,  H01S3/2232

Abstract: An amplifier PAkappa including a plurality of discharge tubes and a MOPA laser apparatus including a master oscillator as a seed laser configured to output a pulsed laser beam, at least one of said amplifier PAkappa comprising a plurality of discharge tubes provided on a designated path of the pulsed laser beam, and an optical system comprising mirrors arranged between said discharge tubes and/or said at least one amplifiers when more than one, to steer the seed laser beam so that it travels along the designed path.

Abstract translation: 包括多个放电管的放大器PAkappa和MOPA激光装置，其包括配置成输出脉冲激光束的种子激光器的主振荡器，所述放大器PAkappa中的至少一个包括多个放电管， 脉冲激光束，以及包括在多于一个放电管和/或所述至少一个放大器之间布置的反射镜的光学系统，以引导种子激光束使其沿着设计的路径行进。

公开(公告)号：WO2012107815A3

公开(公告)日：2012-12-13

申请号：PCT/IB2012000113

申请日：2012-01-25

Applicant: GIGAPHOTON INC ,  NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU

Inventor： NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU

IPC: H01S5/062 ,  G03F7/20 ,  H01S3/13 ,  H01S3/223 ,  H01S3/23 ,  H01S5/06 ,  H01S5/065 ,  H01S5/14 ,  H01S5/34 ,  H01S5/40 ,  H05G2/00

CPC classification number: H01S5/06 ,  B82Y20/00 ,  G03F7/70025 ,  G03F7/70033 ,  H01S3/1305 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/235 ,  H01S3/2375 ,  H01S5/0612 ,  H01S5/06216 ,  H01S5/0622 ,  H01S5/0653 ,  H01S5/0654 ,  H01S5/141 ,  H01S5/3402 ,  H01S5/4025 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: A laser apparatus may include : a master oscillator configured to output a pulsed laser beam at a repetition rate, the master oscillator including at least one semiconductor laser apparatus; at least one amplifier configured to amplify the pulsed laser beam from the master oscillator, the at least one amplifier being configured to include at least one gain bandwidth; and a controller for controlling a parameter affecting an output wavelength of the pulsed laser beam from the master oscillator such that a wavelength chirping range of the pulsed laser beam from the master oscillator overlaps at least a part of the at least one gain bandwidth.

Abstract translation: 激光装置可以包括：主振荡器，其被配置为以重复频率输出脉冲激光束，所述主振荡器包括至少一个半导体激光装置; 至少一个放大器被配置为放大来自所述主振荡器的所述脉冲激光束，所述至少一个放大器被配置为包括至少一个增益带宽; 以及控制器，用于控制影响来自主振荡器的脉冲激光束的输出波长的参数，使得来自主振荡器的脉冲激光束的波长线性调频范围与至少一个增益带宽的至少一部分重叠。

公开(公告)号：WO2013144692A3

公开(公告)日：2014-02-20

申请号：PCT/IB2013000184

申请日：2013-02-13

Applicant: GIGAPHOTON INC ,  NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU

Inventor： NOWAK KRZYSZTOF ,  WAKABAYASHI OSAMU

IPC: H01S3/23 ,  H01S3/00 ,  H01S3/10 ,  H01S3/223

CPC classification number: H01S3/0064 ,  G02F1/0316 ,  G02F1/0322 ,  H01S3/0315 ,  H01S3/04 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/11 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2325 ,  H05G2/008

Abstract: A MOPA laser apparatus 3 including a master oscillator 110 configured to output a pulsed laser beam, at least one amplifier 130i provided on the path of the pulsed laser beam output from the master oscillator, and at least one first optical beam shutter 120i (also called here isolator) provided on the path of the pulsed laser beam, said first optical beam shutter (also called here isolator) including two polarisation splitters and a Pockels cell located in- between including an electro-optical crystal being one of a GaAs crystal and a CdTe crystal.

Abstract translation: 一种MOPA激光装置3，包括被配置为输出脉冲激光束的主振荡器110，设置在从主振荡器输出的脉冲激光束的路径上的至少一个放大器130i和至少一个第一光束闸门120i（也称为 这里隔离器）设置在脉冲激光束的路径上，所述第一光束快门（也称为隔离器）包括两个偏振分离器和位于两者之间的普克尔斯单元，其中包括作为GaAs晶体和 CdTe晶体。

公开(公告)号：WO2012114178A3

公开(公告)日：2012-11-01

申请号：PCT/IB2012000295

申请日：2012-02-17

Applicant: GIGAPHOTON INC ,  MIZOGUCHI HAKARU ,  SUGANUMA TAKASHI ,  HOSHINO HIDEO ,  WAKABAYASHI OSAMU

Inventor： MIZOGUCHI HAKARU ,  SUGANUMA TAKASHI ,  HOSHINO HIDEO ,  WAKABAYASHI OSAMU

IPC: H05G2/00

CPC classification number: H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

Abstract: An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Abstract translation: 一种光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 光束调节单元，设置在光束传送路径中用于调节激光束的光束传送路径; 测量单元，其设置在光束传送路径中用于检测光束传送路径; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。