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    LASER DEVICE
    7.
    发明申请
    LASER DEVICE 审中-公开
    激光装置

    公开(公告)号：WO1998020586A1

    公开(公告)日：1998-05-14

    申请号：PCT/JP1997004022

    申请日：1997-11-05

    Applicant: KOMATSU LTD. ,  WAKABAYASHI, Osamu ,  ARIGA, Tatsuya ,  IGARASHI, Toru ,  SAKANISHI, Shoichi ,  TAKAHASHI, Tomokazu

    Inventor： KOMATSU LTD.

    IPC: H01S03/103

    CPC classification number: H01S3/131 ,  H01S3/134 ,  H01S5/06216

    Abstract: A laser device, which repeats a cycle of burst-mode operation in each of which continuous oscillating operations for continuously pulsatively oscillating laser light by a prescribed number of times and stopping operations for pausing the pulsative oscillation for a prescribed oscillation pausing time are alternately executed, controls the power supply voltage of the laser device so that each output energy of the pulsative oscillation can become coincident with a target value, finds the difference between the ouput value of each pulse and the target value at every pulse and, for a pulse for which the difference exceeds tolerance limits, corrects the updates the power supply voltage value stored in the voltage data table means corresponding to the pulse number of the pulse and the measured oscillation pausing time by using the control gain of a control gain setting means set in the block corresponding to the pulse number and the measured oscillation pausing time and the difference, so as to always make the pulse energy of all pulses for the continous pulsative oscillation constant and further improve the accuracy of optical machining.

    Abstract translation: 交替地执行激光装置，该激光装置重复每个脉冲串操作的周期，其中连续振荡操作用于连续脉动地振荡激光规定次数，并且在规定的振荡暂停时间内暂停脉动振荡的停止操作， 控制激光装置的电源电压，使得脉动振荡的每个输出能量可以与目标值一致，找出每个脉冲的输出值与目标值在每个脉冲之间的差异，对于其脉冲 该差超过公差极限，通过使用在该块中设定的控制增益设定单元的控制增益来更新存储在与脉冲的脉冲数相对应的电压数据表装置中的电源电压值和测量的振荡暂停时间 对应于脉冲数和测量的振荡暂停时间和差值，因此 始终使所有脉冲的脉冲能量持续脉动振荡恒定，进一步提高光学加工精度。

    NARROW-BAND OSCILLATION EXCIMER LASER
    8.
    发明申请
    NARROW-BAND OSCILLATION EXCIMER LASER 审中-公开
    窄带振荡激光激光

    公开(公告)号：WO1990014704A1

    公开(公告)日：1990-11-29

    申请号：PCT/JP1990000639

    申请日：1990-05-18

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  WAKABAYASHI, Osamu; ,  KOWAKA, Masahiko; ,  KOBAYASHI, Yukio;

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: H01S03/1055

    CPC classification number: G03F7/70025 ,  H01S3/08009 ,  H01S3/1055 ,  H01S3/225

    Abstract: A narrow-band oscillation excimer laser employing a diffraction grating as a wavelength selecting element, which is particularly suited for a light source of a reduction type projection aligner. The grating used in the narrow-band oscillation excimer laser of the invention is so disposed that the direction of grating lines is nearly perpendicular to the direction of laser discharge. When a beam expander is used to expand laser beam falling on the beam expander is so disposed that the direction of beam expansion is nearly perpendicular to that of discharge of the laser. Further, when an aperture is to be used in the optical resonator, the aperture is placed so that the longitudinal direction may be parallel to the direction of laser discharge. Moreover, the front mirror of the optical resonator is a cylindrical one, whose mechanical axis is in parallel with the direction of laser discharge. This makes it possible to provide a narrow-band oscillation excimer laser having very high efficiency and excellent durability.

    METHOD AND APPARATUS FOR CONTROLLING NARROW-BAND OSCILLATION EXCIMER LASER
    9.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING NARROW-BAND OSCILLATION EXCIMER LASER 审中-公开
    控制窄带振荡激光器的方法和装置

    公开(公告)号：WO1989007353A1

    公开(公告)日：1989-08-10

    申请号：PCT/JP1989000080

    申请日：1989-01-27

    Applicant: KABUSHIKI KAISHA KOMATSU SEISAKUSHO ,  WAKABAYASHI, Osamu ,  KOWAKA, Masahiko

    Inventor： KABUSHIKI KAISHA KOMATSU SEISAKUSHO

    IPC: H01S03/134

    CPC classification number: H01S3/134 ,  H01S3/104 ,  H01S3/1062 ,  H01S3/136 ,  H01S3/137 ,  H01S3/225

    Abstract: A method and a device for controlling a narrow-band oscillation excimer laser used as a source of light for a reduced-scale projection exposure device. The laser oscillator contains at least two wavelength select elements. There are carried out the center wavelength control for bringing the oscillation center wavelength determined by these wavelength select elements into agreement with a desired wavelength, the superpose control for superposing the wavelengths that have transmitted through these wavelength select elements, and the power control that controls the laser output by controlling a voltage applied to the electrodes in the laser chamber. The gas is replaced partly as a voltage applied to the electrodes in the laser chamber is increased. After the gas is partly replaced, the control period is set to be nearly the same for the superpose control and for the power control, or the superpose control is inhibited while the power control is being carried out. When the laser is energized, the superpose control is executed first, and then the center wavelength control is executed.

    Abstract translation: 一种用于控制用作缩小尺寸投影曝光装置的光源的窄带振荡准分子激光器的方法和装置。 激光振荡器包含至少两个波长选择元件。 执行中心波长控制，以使由这些波长选择元件确定的振荡中心波长与期望波长一致，叠加控制用于叠加通过这些波长选择元件传输的波长，以及控制该波长选择元件的功率控制 通过控制施加到激光室中的电极的电压来激光输出。 部分地替换气体，因为施加到激光室中的电极的电压增加。 在气体被部分替换之后，对于重叠控制和功率控制，控制周期被设置为几乎相同，或者在执行功率控制时禁止叠加控制。 当激光器通电时，首先执行叠加控制，然后执行中心波长控制。

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